Explore: Microlithography
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Books Results
Source: The Open Library
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Search results from The Open Library
1Functional nanostructured materials through multiscale assembly and novel patterning techniques
By Steven C. Moss
“Functional nanostructured materials through multiscale assembly and novel patterning techniques” Metadata:
- Title: ➤ Functional nanostructured materials through multiscale assembly and novel patterning techniques
- Author: Steven C. Moss
- Language: English
- Number of Pages: Median: 250
- Publisher: ➤ Materials Research Society - University of Cambridge ESOL Examinations
- Publish Date: 2002 - 2014
- Publish Location: Warrendale, Pennsylvania
“Functional nanostructured materials through multiscale assembly and novel patterning techniques” Subjects and Themes:
- Subjects: Nanostructures - Congresses - Nanotechnology - Microlithography
Edition Identifiers:
- The Open Library ID: OL8609108M - OL3700679M - OL29205957M
- Online Computer Library Center (OCLC) ID: 51174363
- Library of Congress Control Number (LCCN): 2003266581
- All ISBNs: 9781558996649 - 1558996648 - 1107411866 - 9781107411869
Access and General Info:
- First Year Published: 2002
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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2Principles of lithography
By Harry J. Levinson
“Principles of lithography” Metadata:
- Title: Principles of lithography
- Author: Harry J. Levinson
- Language: English
- Number of Pages: Median: 398
- Publisher: SPIE Press - SPIE
- Publish Date: 2001 - 2005 - 2019
- Publish Location: ➤ Bellingham, Wash - Bellingham, WA
“Principles of lithography” Subjects and Themes:
- Subjects: ➤ Microlithography - Integrated circuits - Design and construction - Circuits intégrés - Conception et construction - Microlithographie
Edition Identifiers:
- The Open Library ID: OL18729846M - OL31597110M - OL35846431M
- Online Computer Library Center (OCLC) ID: 45493267 - 1083675292
- Library of Congress Control Number (LCCN): 2004025977 - 00067126 - 2019003004
- All ISBNs: ➤ 9780819456601 - 9781510627604 - 9780819440457 - 0819440450 - 0819456608 - 151062760X
Access and General Info:
- First Year Published: 2001
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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3Optical Laser Microlithography VIII
By Brunner
“Optical Laser Microlithography VIII” Metadata:
- Title: ➤ Optical Laser Microlithography VIII
- Author: Brunner
- Language: English
- Number of Pages: Median: 948
- Publisher: ➤ SPIE - Society of Photo Optical
- Publish Date: 1995
- Publish Location: Bellingham, Wash
“Optical Laser Microlithography VIII” Subjects and Themes:
- Subjects: ➤ Computer simulation - Congresses - Photoresists - Masks (Electronics) - Microlithography - Lenses - Design and construction
Edition Identifiers:
- The Open Library ID: OL15376058M - OL11392955M
- Online Computer Library Center (OCLC) ID: 32689495
- Library of Congress Control Number (LCCN): 94069903
- All ISBNs: 9780819417886 - 0819417882
Access and General Info:
- First Year Published: 1995
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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4Optical Laser Microlithography Vii/V2197
By Brunner
“Optical Laser Microlithography Vii/V2197” Metadata:
- Title: ➤ Optical Laser Microlithography Vii/V2197
- Author: Brunner
- Language: English
- Number of Pages: Median: 1008
- Publisher: ➤ SPIE--the International Society for Optical Engineering - Society of Photo Optical
- Publish Date: 1994
- Publish Location: Bellingham, Wash
“Optical Laser Microlithography Vii/V2197” Subjects and Themes:
- Subjects: ➤ Microlithography - Congresses - Optical instruments - Lasers - Industrial applications - Masks (Electronics)
Edition Identifiers:
- The Open Library ID: OL11392899M - OL15358645M
- Online Computer Library Center (OCLC) ID: 30602250
- Library of Congress Control Number (LCCN): 94065792
- All ISBNs: 0819414921 - 9780819414922
Access and General Info:
- First Year Published: 1994
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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510th annual Symposium on Microlithography
By Symposium on Microlithography (10th 1990 Sunnyvale, Calif.)
“10th annual Symposium on Microlithography” Metadata:
- Title: ➤ 10th annual Symposium on Microlithography
- Author: ➤ Symposium on Microlithography (10th 1990 Sunnyvale, Calif.)
- Language: English
- Number of Pages: Median: 315
- Publisher: ➤ SPIE--the International Society for Optical Engineering
- Publish Date: 1991
- Publish Location: Bellingham, Wash., USA
“10th annual Symposium on Microlithography” Subjects and Themes:
- Subjects: Congresses - Masks (Electronics) - Microlithography - Semiconductors
Edition Identifiers:
- The Open Library ID: OL15305954M - OL1568980M
- Online Computer Library Center (OCLC) ID: 507136390
- Library of Congress Control Number (LCCN): 91006046 - 91060046
- All ISBNs: 0819406058 - 9780819406057
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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6Handbook of microlithography, micromachining, and microfabrication
By P. Rai-Choudhury
“Handbook of microlithography, micromachining, and microfabrication” Metadata:
- Title: ➤ Handbook of microlithography, micromachining, and microfabrication
- Author: P. Rai-Choudhury
- Language: English
- Number of Pages: Median: 768
- Publisher: ➤ Society of Photo-Optical Instrumentation Engineers - Brand: Society of Photo-Optical Instrumentation Engineers - SPIE Optical Engineering Press - Institution of Electrical Engineers
- Publish Date: 1997
- Publish Location: ➤ Bellingham, Wash., USA - London, UK
“Handbook of microlithography, micromachining, and microfabrication” Subjects and Themes:
- Subjects: Micromachining - Microfabrication - Microlithography
Edition Identifiers:
- The Open Library ID: OL1001272M
- Online Computer Library Center (OCLC) ID: 36126447
- Library of Congress Control Number (LCCN): 96040237
- All ISBNs: 9780819423795 - 0819423785 - 0819423793 - 9780819423788
Access and General Info:
- First Year Published: 1997
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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7Sub-half-micron lithography for ULSIs
By Shinji Matsui
“Sub-half-micron lithography for ULSIs” Metadata:
- Title: ➤ Sub-half-micron lithography for ULSIs
- Author: Shinji Matsui
- Language: English
- Number of Pages: Median: 333
- Publisher: Cambridge University Press
- Publish Date: 2000
- Publish Location: Cambridge - New York
“Sub-half-micron lithography for ULSIs” Subjects and Themes:
- Subjects: Integrated circuits - Ultra large scale integration - Microlithography - Printed circuits - Design and construction
Edition Identifiers:
- The Open Library ID: OL7746801M - OL18111053M
- Library of Congress Control Number (LCCN): 99013558
- All ISBNs: 0521570808 - 9780521570800
First Setence:
"The first commercial 0.25- m technology was distributed to users in 1997, and is now widely used in advanced ULSIs (e.g. 64-Mb and 256-Mb DRAMs, high-end microprocessors, and ASICs)."
Access and General Info:
- First Year Published: 2000
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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8Dry etch technology
“Dry etch technology” Metadata:
- Title: Dry etch technology
- Language: English
- Number of Pages: Median: 222
- Publisher: ➤ SPIE--The International Societyfor Optical Engineering - SPIE
- Publish Date: 1991 - 1992
- Publish Location: Bellingham, Wash
“Dry etch technology” Subjects and Themes:
- Subjects: ➤ Materials - Congresses - Etching - Plasma etching - Semiconductors - Microelectronics - Microlithography - Integrated circuits - Design and construction
Edition Identifiers:
- The Open Library ID: OL1572304M - OL21092123M
- Online Computer Library Center (OCLC) ID: 25541402
- Library of Congress Control Number (LCCN): 89067546 - 91067546
- All ISBNs: 9780819407245 - 0819407240
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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9Lithography process control
By Harry J. Levinson
“Lithography process control” Metadata:
- Title: Lithography process control
- Author: Harry J. Levinson
- Language: English
- Number of Pages: Median: 190
- Publisher: ➤ SPIE Optical Engineering Press - SPIE
- Publish Date: 1999
- Publish Location: Bellingham, Wash
“Lithography process control” Subjects and Themes:
- Subjects: ➤ Semiconductors - Quality control - Etching - Microlithography - Semi-conducteurs - Attaque chimique - Microlithographie - Qualité - Contrôle - TECHNOLOGY & ENGINEERING - Mechanical - Lithografie - Statistische Prozesslenkung - Commande de processus - Semiconducteurs - Lithographie (Halbleitertechnologie) - Semiconductors -- Etching - Microlithography -- Quality control
Edition Identifiers:
- The Open Library ID: OL382069M - OL46593856M
- Online Computer Library Center (OCLC) ID: 697188897
- Library of Congress Control Number (LCCN): 98044433
- All ISBNs: 9780819478559 - 9780819430526 - 0819430528 - 0819478555
Access and General Info:
- First Year Published: 1999
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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10Resolution enhancement techniques in optical lithography
By Alfred Kwok-Kit Wong
“Resolution enhancement techniques in optical lithography” Metadata:
- Title: ➤ Resolution enhancement techniques in optical lithography
- Author: Alfred Kwok-Kit Wong
- Language: English
- Number of Pages: Median: 214
- Publisher: ➤ SPIE - SPIE Press - SPIE Optical Engineering Press - SPIE Publications - Brand: SPIE Publications
- Publish Date: 2001
- Publish Location: Bellingham, WA
“Resolution enhancement techniques in optical lithography” Subjects and Themes:
- Subjects: Design and construcition - Integrated circuits - Microlithography - Design and construction
Edition Identifiers:
- The Open Library ID: OL17599045M - OL46602469M
- Online Computer Library Center (OCLC) ID: 45879722
- Library of Congress Control Number (LCCN): 2001020028
- All ISBNs: 9780819439956 - 0819478814 - 0819439959 - 9780819478818
Access and General Info:
- First Year Published: 2001
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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11Fundamental Principles of Optical Lithography
By Chris Mack
“Fundamental Principles of Optical Lithography” Metadata:
- Title: ➤ Fundamental Principles of Optical Lithography
- Author: Chris Mack
- Language: English
- Number of Pages: Median: 534
- Publisher: ➤ Wiley & Sons, Incorporated, John - Wiley-Interscience - Wiley & Sons, Limited, John - Wiley
- Publish Date: 2008 - 2011
“Fundamental Principles of Optical Lithography” Subjects and Themes:
- Subjects: ➤ Integrated circuits - Microlithography - Photolithography - Semiconductors - Design and construction - Industrial applications - Circuits intégrés - Conception et construction - Microlithographie - Applications industrielles
Edition Identifiers:
- The Open Library ID: ➤ OL10296141M - OL29002679M - OL29087277M - OL10278254M - OL29087278M - OL33352675M
- Online Computer Library Center (OCLC) ID: 180190870
- Library of Congress Control Number (LCCN): 2007044548
- All ISBNs: ➤ 0470727306 - 111996508X - 1119965071 - 9780470723869 - 9781119965077 - 9780470727300 - 0470723874 - 9780470018934 - 9781119965084 - 0470723866 - 9780470723876 - 0470018933
Access and General Info:
- First Year Published: 2008
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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12Microlithography
By James R. Sheats, Bruce W. Smith and Kazuaki Suzuki
“Microlithography” Metadata:
- Title: Microlithography
- Authors: James R. SheatsBruce W. SmithKazuaki Suzuki
- Language: English
- Number of Pages: Median: 857
- Publisher: ➤ Taylor & Francis Group - Marcel Dekker - CRC Press LLC
- Publish Date: ➤ 1998 - 2007 - 2010 - 2018 - 2024
- Publish Location: New York
“Microlithography” Subjects and Themes:
- Subjects: ➤ Complementary Metal oxide semiconductors - Integrated circuits - Manufacturing processes - Microlithography - Industrial applications - Masks - Design and construction - Metal oxide semiconductors, complementary
Edition Identifiers:
- The Open Library ID: ➤ OL53271678M - OL50667861M - OL33785368M - OL33482782M - OL356842M - OL33785358M - OL33785367M
- Online Computer Library Center (OCLC) ID: 38765112
- Library of Congress Control Number (LCCN): 98016713
- All ISBNs: ➤ 1032836733 - 9781280809637 - 1429470607 - 0824799534 - 1351826751 - 9781429470605 - 1315219557 - 9781351835442 - 9781351826754 - 9780824799533 - 1280809639 - 1351835440 - 9781315219554 - 9781032836737
Access and General Info:
- First Year Published: 1998
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
Online Access
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13Microlithography
By Kazuaki Suzuki and Bruce W. Smith
“Microlithography” Metadata:
- Title: Microlithography
- Authors: Kazuaki SuzukiBruce W. Smith
- Language: English
- Number of Pages: Median: 864
- Publisher: Taylor & Francis Group
- Publish Date: 2020
“Microlithography” Subjects and Themes:
- Subjects: ➤ Microlithography - Integrated circuits - Metal oxide semiconductors, complementary - Manufacturing processes - Industrial applications - Masks - Complementary Metal oxide semiconductors - Design and construction - Microlithographie - Applications industrielles - Circuits intégrés - Masques - Fabrication - Manufacturing - TECHNOLOGY - Lasers - Electronics - Microelectronics
Edition Identifiers:
- The Open Library ID: OL28055607M - OL28060756M - OL28055605M - OL28043698M - OL28060691M
- Online Computer Library Center (OCLC) ID: 1154017316
- All ISBNs: ➤ 9781439876756 - 1315117177 - 1351643444 - 9781439876763 - 1439876762 - 9781315117171 - 9781351643443 - 9781351633949 - 1439876754 - 1351633945
Access and General Info:
- First Year Published: 2020
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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14Nano-lithography
By Stefan Landis
“Nano-lithography” Metadata:
- Title: Nano-lithography
- Author: Stefan Landis
- Language: English
- Number of Pages: Median: 320
- Publisher: ➤ Wiley & Sons, Incorporated, John - ISTE - Wiley
- Publish Date: 2011 - 2013
- Publish Location: Hoboken, NJ - London, UK
“Nano-lithography” Subjects and Themes:
- Subjects: Nanotechnology - Microlithography - Nanolithography - Lithography
Edition Identifiers:
- The Open Library ID: ➤ OL39895644M - OL24881665M - OL29149468M - OL39900793M - OL29149510M - OL29149474M
- Online Computer Library Center (OCLC) ID: 642840091 - 876268808
- Library of Congress Control Number (LCCN): 2010046516
- All ISBNs: ➤ 9781299315587 - 1118622588 - 9781118621622 - 1299315585 - 9781118622636 - 1118621700 - 1848212119 - 9781118621707 - 9781118622582 - 1118622634 - 111862162X - 9781848212114
Access and General Info:
- First Year Published: 2011
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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15Lithography
By Stefan Landis
“Lithography” Metadata:
- Title: Lithography
- Author: Stefan Landis
- Language: English
- Number of Pages: Median: 320
- Publisher: ➤ ISTE - Wiley & Sons, Incorporated, John - Wiley
- Publish Date: 2010 - 2011 - 2013
- Publish Location: London - Hoboken, NJ
“Lithography” Subjects and Themes:
- Subjects: ➤ Microlithography - Lithography - TECHNOLOGY & ENGINEERING / Material Science
Edition Identifiers:
- The Open Library ID: ➤ OL39885612M - OL39883208M - OL29149454M - OL29149460M - OL29149456M - OL25030341M
- Online Computer Library Center (OCLC) ID: 500823606
- Library of Congress Control Number (LCCN): 2010040731
- All ISBNs: ➤ 9781848212022 - 184821202X - 1118557662 - 1299315526 - 1118621182 - 9781118621233 - 1118621239 - 9781299315525 - 1118621212 - 9781118621189 - 9781118621219 - 9781118557662
Access and General Info:
- First Year Published: 2010
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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16Computational Lithography
By Xu Ma and Gonzalo R. Arce
“Computational Lithography” Metadata:
- Title: Computational Lithography
- Authors: Xu MaGonzalo R. Arce
- Language: English
- Number of Pages: Median: 226
- Publisher: ➤ Wiley & Sons, Incorporated, John
- Publish Date: 2010 - 2011
“Computational Lithography” Subjects and Themes:
- Subjects: Integrated circuits - Microlithography - Photolithography - Semiconductors
Edition Identifiers:
- The Open Library ID: OL38022110M - OL39891890M - OL29074705M - OL29062629M - OL29006914M
- All ISBNs: ➤ 9780470618936 - 111804357X - 0470618949 - 9781282755963 - 1118125525 - 0470618930 - 9781118043578 - 9780470618943 - 9781118125526 - 128275596X
Access and General Info:
- First Year Published: 2010
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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17Laser microfabrication
By Daniel J. Ehrlich and Jeffrey Y. Tsao
“Laser microfabrication” Metadata:
- Title: Laser microfabrication
- Authors: Daniel J. EhrlichJeffrey Y. Tsao
- Language: English
- Number of Pages: Median: 587
- Publisher: ➤ Academic Press - Elsevier Science & Technology Books
- Publish Date: 1989
- Publish Location: Boston
“Laser microfabrication” Subjects and Themes:
- Subjects: ➤ Thin film devices - Microfabrication - Lasers - Microlithography - Industrial applications - Design and construction - Lasers, industrial applications - Thin films
Edition Identifiers:
- The Open Library ID: OL2047026M - OL9281275M - OL33471153M - OL7326627M
- Library of Congress Control Number (LCCN): 88024215
- All ISBNs: 9780122334306 - 9780080918020 - 0080918026 - 0122334302
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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18Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology
By Saburo Nonogaki, Ueno Takumi and Toshio Ito
“Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology” Metadata:
- Title: ➤ Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology
- Authors: Saburo NonogakiUeno TakumiToshio Ito
- Language: English
- Number of Pages: Median: 336
- Publisher: Taylor & Francis Group
- Publish Date: 2018
“Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology” Subjects and Themes:
- Subjects: Semiconductors - Microlithography - Manufacturing processes
Edition Identifiers:
- The Open Library ID: OL33757128M - OL33504425M - OL33677611M - OL33677558M
- All ISBNs: ➤ 1351830716 - 9781351822022 - 1351822020 - 9781351830713 - 9781315214825 - 1482273764 - 1315214822 - 9781482273762
Access and General Info:
- First Year Published: 2018
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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19Advance in Resist Technology and Processing XIII
By Roderick R. Kunz
“Advance in Resist Technology and Processing XIII” Metadata:
- Title: ➤ Advance in Resist Technology and Processing XIII
- Author: Roderick R. Kunz
- Language: English
- Number of Pages: Median: 774
- Publisher: ➤ International Society for Optical Engineering - SPIE Society of Photo-Optical Instrumentation Engi - Society of Photo-Optical Instrumentation Engineers (SPIE)
- Publish Date: 1996 - 1997
- Publish Location: Bellingham, Wash., USA
“Advance in Resist Technology and Processing XIII” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography
Edition Identifiers:
- The Open Library ID: OL19567846M - OL20738182M - OL11392986M
- Online Computer Library Center (OCLC) ID: 35108651
- Library of Congress Control Number (LCCN): 91061057
- All ISBNs: 0819421006 - 9780819421005
Access and General Info:
- First Year Published: 1996
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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20Optical Microlithography XV
By Anthony Yen
“Optical Microlithography XV” Metadata:
- Title: Optical Microlithography XV
- Author: Anthony Yen
- Language: English
- Publisher: ➤ SPIE Society of Photo-Optical Instrumentation Engi
- Publish Date: 2002
- Publish Location: Bellingham, Washington SPIE
“Optical Microlithography XV” Subjects and Themes:
- Subjects: ➤ Integrated circuits - Congresses - Masks - X-ray lithography - Microlithography - Manufacturing processes
Edition Identifiers:
- The Open Library ID: OL23933673M - OL11393347M - OL23942524M
- Online Computer Library Center (OCLC) ID: 50597859
- Library of Congress Control Number (LCCN): 2003268660
- All ISBNs: 9780819444370 - 0819444375
Access and General Info:
- First Year Published: 2002
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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21Scanning probe lithography
By Hyongsok T. Soh, Kathryn Wilder Guarini and Calvin F. Quate
“Scanning probe lithography” Metadata:
- Title: Scanning probe lithography
- Authors: Hyongsok T. SohKathryn Wilder GuariniCalvin F. Quate
- Language: English
- Number of Pages: Median: 195
- Publisher: ➤ Kluwer Academic Publishers - Springer
- Publish Date: 2001
- Publish Location: Boston
“Scanning probe lithography” Subjects and Themes:
- Subjects: ➤ Design and construction - Integrated circuits - Microlithography - Scanning probe microscopy - Semi-conductors & super-conductors - Engineering - Electrical & Electronic - Technology - Microelectronics - Technology & Industrial Arts - Science/Mathematics - Electronics - Circuits - Printed - Material Science - Technology / Electronics / Circuits / General - Technology / Electronics / Circuits / Printed - Technology : Engineering - Electrical & Electronic - Technology : Material Science - Electronics - Circuits - Integrated - Electronics - Microelectronics - Microscopy
Edition Identifiers:
- The Open Library ID: OL7809627M - OL20643796M - OL18885727M
- Online Computer Library Center (OCLC) ID: 46866288
- Library of Congress Control Number (LCCN): 2001029782
- All ISBNs: 0792373618 - 9780792373612
First Setence:
"Semiconductor lithography is the patterning process used to define the structures that make up integrated circuits (ICs)."
Access and General Info:
- First Year Published: 2001
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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22Nanolithography and Patterning Techniques in Microelectronics (Woodhead Publishing in Materials)
By David G. Bucknall
“Nanolithography and Patterning Techniques in Microelectronics (Woodhead Publishing in Materials)” Metadata:
- Title: ➤ Nanolithography and Patterning Techniques in Microelectronics (Woodhead Publishing in Materials)
- Author: David G. Bucknall
- Language: English
- Number of Pages: Median: 409
- Publisher: CRC - Woodhead Publishing,
- Publish Date: 2005
“Nanolithography and Patterning Techniques in Microelectronics (Woodhead Publishing in Materials)” Subjects and Themes:
- Subjects: Nanotechnology - Nanolithography - Microlithography - Nanotecnologia - Lithography
Edition Identifiers:
- The Open Library ID: OL9577086M - OL8260102M - OL9582139M
- Library of Congress Control Number (LCCN): 2006365086
- All ISBNs: ➤ 9780849334474 - 9781845690908 - 1845690907 - 9781855739314 - 0849334470 - 1855739313
Access and General Info:
- First Year Published: 2005
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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23Microlithography
By Kazuaki Suzuki and Bruce W. Smith
“Microlithography” Metadata:
- Title: Microlithography
- Authors: Kazuaki SuzukiBruce W. Smith
- Language: English
- Number of Pages: Median: 864
- Publisher: ➤ CRC - Taylor & Francis Group - CRC Press
- Publish Date: 2007 - 2018
- Publish Location: Boca Raton
“Microlithography” Subjects and Themes:
- Subjects: ➤ Complementary Metal oxide semiconductors - Integrated circuits - Manufacturing processes - Microlithography - Industrial applications - Masks - Design and construction - Corrosion and anti-corrosives - Protective coatings - Microlithographie - Applications industrielles - Circuits intégrés - Masques - MOS complémentaires - Conception et construction - Fabrication - Manufacturing - TECHNOLOGY & ENGINEERING - Electronics - Circuits - General - Lithografie - Lithographie (Halbleitertechnologie)
Edition Identifiers:
- The Open Library ID: OL29046476M - OL18288544M - OL8160615M
- Online Computer Library Center (OCLC) ID: 71581976 - 137293053
- Library of Congress Control Number (LCCN): 2006031516
- All ISBNs: 1420051539 - 0824790243 - 9781420051537 - 9780824790240
Access and General Info:
- First Year Published: 2007
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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24Microlithography: High Integration in Microelectronics
By Aldo Craievich
“Microlithography: High Integration in Microelectronics” Metadata:
- Title: ➤ Microlithography: High Integration in Microelectronics
- Author: Aldo Craievich
- Language: English
- Number of Pages: Median: 207
- Publisher: ➤ World Scientific - World Scientific Pub Co Inc
- Publish Date: 1990
- Publish Location: Singapore - Teaneck, NJ
“Microlithography: High Integration in Microelectronics” Subjects and Themes:
- Subjects: Congresses - Microlithography - Microelectronics
Edition Identifiers:
- The Open Library ID: OL13167366M - OL18666711M
- Online Computer Library Center (OCLC) ID: 22292726
- All ISBNs: 9789810201371 - 9810201370
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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25Microlithography 1999: Advances in Resist Technology and Processing XVI
By Will Conley
“Microlithography 1999: Advances in Resist Technology and Processing XVI” Metadata:
- Title: ➤ Microlithography 1999: Advances in Resist Technology and Processing XVI
- Author: Will Conley
- Language: English
- Number of Pages: Median: 1402
- Publisher: ➤ SPIE - Society of Photo Optical
- Publish Date: 1999
- Publish Location: Bellingham, Wash
“Microlithography 1999: Advances in Resist Technology and Processing XVI” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography - Optics
Edition Identifiers:
- The Open Library ID: OL11393142M - OL19568077M
- Online Computer Library Center (OCLC) ID: 41792054
- All ISBNs: 0819431524 - 9780819431523
Access and General Info:
- First Year Published: 1999
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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26Advances in Resist Technology and Processing XVII (Advances in Resist Technology & Processing)
By Francis M. Houlihan
“Advances in Resist Technology and Processing XVII (Advances in Resist Technology & Processing)” Metadata:
- Title: ➤ Advances in Resist Technology and Processing XVII (Advances in Resist Technology & Processing)
- Author: Francis M. Houlihan
- Language: English
- Number of Pages: Median: 1252
- Publisher: ➤ SPIE - SPIE-International Society for Optical Engine
- Publish Date: 2000
- Publish Location: Bellingham, Washington
“Advances in Resist Technology and Processing XVII (Advances in Resist Technology & Processing)” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography - Optoelectronics
Edition Identifiers:
- The Open Library ID: OL19568161M - OL11393209M
- Online Computer Library Center (OCLC) ID: 44601328
- All ISBNs: 0819436178 - 9780819436177
Access and General Info:
- First Year Published: 2000
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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27Materials Development for Direct Write Technologies
By Douglas B. Chrisey
“Materials Development for Direct Write Technologies” Metadata:
- Title: ➤ Materials Development for Direct Write Technologies
- Author: Douglas B. Chrisey
- Language: English
- Number of Pages: Median: 293
- Publisher: ➤ Materials Research Society - University of Cambridge ESOL Examinations
- Publish Date: 2000 - 2014
“Materials Development for Direct Write Technologies” Subjects and Themes:
- Subjects: ➤ Microfabrication - Masks (Electronics) - Industrial applications - Materials - Congresses - Lasers - Electronics - Microlithography - Integrated circuits - Materials, research - Electronics, materials - Lasers, industrial applications - Manufacturing processes
Edition Identifiers:
- The Open Library ID: OL12091972M - OL29205902M
- Online Computer Library Center (OCLC) ID: 45329183
- Library of Congress Control Number (LCCN): 00066223
- All ISBNs: 1558995323 - 1107413036 - 9781558995321 - 9781107413030
Access and General Info:
- First Year Published: 2000
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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28Field guide to optical lithography
By Chris A. Mack
“Field guide to optical lithography” Metadata:
- Title: ➤ Field guide to optical lithography
- Author: Chris A. Mack
- Language: English
- Number of Pages: Median: 136
- Publisher: ➤ SPIE Publications - SPIE Press - SPIE
- Publish Date: 2006
- Publish Location: Bellingham, Wash
“Field guide to optical lithography” Subjects and Themes:
- Subjects: Design and construction - Integrated circuits - Microlithography
Edition Identifiers:
- The Open Library ID: OL3418242M - OL33026200M
- Library of Congress Control Number (LCCN): 2005034584
- All ISBNs: 9780819462077 - 0819462071
Access and General Info:
- First Year Published: 2006
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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29MicroProcess 89
By International Symposium on MicroProcess Conference (2nd 1989 Kōbe-shi, Japan)
“MicroProcess 89” Metadata:
- Title: MicroProcess 89
- Author: ➤ International Symposium on MicroProcess Conference (2nd 1989 Kōbe-shi, Japan)
- Language: English
- Number of Pages: Median: 385
- Publisher: ➤ Publication Office, Japanese Journal of Applied Physics
- Publish Date: 1989
- Publish Location: Tokyo, Japan
“MicroProcess 89” Subjects and Themes:
- Subjects: Congresses - Industrial applications - Lasers - Microelectronics - Microlithography
Edition Identifiers:
- The Open Library ID: OL1979488M - OL9038935M
- Library of Congress Control Number (LCCN): 90223568
- All ISBNs: 9784900526037 - 4900526037
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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30Semiconductor Lithography
By Wayne M. Moreau
“Semiconductor Lithography” Metadata:
- Title: Semiconductor Lithography
- Author: Wayne M. Moreau
- Language: English
- Number of Pages: Median: 942
- Publisher: Springer - Plenum Press
- Publish Date: 1987 - 1988
- Publish Location: New York
“Semiconductor Lithography” Subjects and Themes:
- Subjects: Microlithography - Photoresists - Semiconductors
Edition Identifiers:
- The Open Library ID: OL10323677M - OL2399079M
- Online Computer Library Center (OCLC) ID: 16871199
- Library of Congress Control Number (LCCN): 87029077
- All ISBNs: 9780306421853 - 0306421852
Access and General Info:
- First Year Published: 1987
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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31Excimer laser lithography
By Kanti Jain
“Excimer laser lithography” Metadata:
- Title: Excimer laser lithography
- Author: Kanti Jain
- Language: English
- Number of Pages: Median: 212
- Publisher: SPIE Optical Engineering Press
- Publish Date: 1990
- Publish Location: Bellingham, Wash., USA
“Excimer laser lithography” Subjects and Themes:
- Subjects: Excimer lasers - Industrial applications - Microlithography - Lasers, industrial applications
Edition Identifiers:
- The Open Library ID: OL2202506M
- Online Computer Library Center (OCLC) ID: 20492182
- Library of Congress Control Number (LCCN): 89024240
- All ISBNs: 0819402710 - 9780819402721 - 9780819402714 - 0819402729
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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32Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI
By International Symposium on Patterning Science and Technology (2nd 1991 Phoenix, Ariz.)
“Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI” Metadata:
- Title: ➤ Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI
- Author: ➤ International Symposium on Patterning Science and Technology (2nd 1991 Phoenix, Ariz.)
- Language: English
- Number of Pages: Median: 382
- Publisher: Electrochemical Society
- Publish Date: 1992
- Publish Location: Pennington, NJ
“Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI” Subjects and Themes:
- Subjects: ➤ Congresses - Design and construction - Integrated circuits - Lithography - Metallizing - Microelectronic packaging - Ultra large scale integration - Microelectronics - Microlithography - Photoresists - Masks (Electronics) - Large scale integration
Edition Identifiers:
- The Open Library ID: OL8670964M - OL1749210M
- Online Computer Library Center (OCLC) ID: 502605458
- Library of Congress Control Number (LCCN): 92071002
- All ISBNs: 9781566770071 - 1566770076
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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33MicroProcess 90
By International Symposium on MicroProcess Conference (3rd 1990 Chiba-shi, Japan)
“MicroProcess 90” Metadata:
- Title: MicroProcess 90
- Author: ➤ International Symposium on MicroProcess Conference (3rd 1990 Chiba-shi, Japan)
- Language: English
- Number of Pages: Median: 325
- Publisher: ➤ Publication Office, Japanese Journal of Applied Physics
- Publish Date: 1991
- Publish Location: Tokyo, Japan
“MicroProcess 90” Subjects and Themes:
- Subjects: ➤ Congresses - Industrial applications - Lasers - Microelectronics - Microlithography - Plasma engineering
Edition Identifiers:
- The Open Library ID: OL1648170M - OL9038936M
- Library of Congress Control Number (LCCN): 91205400
- All ISBNs: 9784900526044 - 4900526045
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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34Molecular theory of lithography
By Uzodinma Okoroanyanwu
“Molecular theory of lithography” Metadata:
- Title: ➤ Molecular theory of lithography
- Author: Uzodinma Okoroanyanwu
- Language: English
- Publisher: SPIE
- Publish Date: 2015
- Publish Location: Bellingham, Washington, USA
“Molecular theory of lithography” Subjects and Themes:
- Subjects: ➤ Microlithography - Industrial applications - Molecular theory - Molecular electronics - Integrated circuits - Masks
Edition Identifiers:
- The Open Library ID: OL46603918M - OL31056737M
- Library of Congress Control Number (LCCN): 2014043296
- All ISBNs: 9781628415513 - 1628415517 - 1628415525 - 9781628415520
Access and General Info:
- First Year Published: 2015
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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35Emerging lithographic technologies XI
“Emerging lithographic technologies XI” Metadata:
- Title: ➤ Emerging lithographic technologies XI
- Language: English
- Publisher: SPIE
- Publish Date: 2007
- Publish Location: Bellingham, Wash
“Emerging lithographic technologies XI” Subjects and Themes:
- Subjects: ➤ Electron beam Lithography - X-rays - X-ray lithography - Congresses - Masks (Electronics) - Industrial applications - Microlithography - Lithography - X-rays, industrial applications - Masks (electronics)
Edition Identifiers:
- The Open Library ID: OL24063275M - OL23945576M
- Library of Congress Control Number (LCCN): 2009284503
- All ISBNs: 9780819466365 - 0819466360
Access and General Info:
- First Year Published: 2007
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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36Lithographic and micromachining techniques for optical component fabrication II
By Hans Peter Herzig
“Lithographic and micromachining techniques for optical component fabrication II” Metadata:
- Title: ➤ Lithographic and micromachining techniques for optical component fabrication II
- Author: Hans Peter Herzig
- Language: English
- Number of Pages: Median: 208
- Publisher: SPIE
- Publish Date: 2003 - 2004
- Publish Location: ➤ Bellingham, Wash - Bellingham, WA
“Lithographic and micromachining techniques for optical component fabrication II” Subjects and Themes:
- Subjects: ➤ Congresses - Micromachining - Microlithography - Optical instruments - Lenses - Design and construction
Edition Identifiers:
- The Open Library ID: OL22569417M - OL3325286M
- Online Computer Library Center (OCLC) ID: 53843105
- Library of Congress Control Number (LCCN): 2004298721
- All ISBNs: 0819450561 - 9780819450562
Access and General Info:
- First Year Published: 2003
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
Online Access
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37Advances in resist materials and processing technology XXIV
By Qinghuang Lin
“Advances in resist materials and processing technology XXIV” Metadata:
- Title: ➤ Advances in resist materials and processing technology XXIV
- Author: Qinghuang Lin
- Language: English
- Number of Pages: Median: 1348
- Publisher: ➤ SPIE - Society of Photo Optical
- Publish Date: 2007
- Publish Location: Bellingham, Wash
“Advances in resist materials and processing technology XXIV” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography
Edition Identifiers:
- The Open Library ID: OL24063277M - OL23945578M
- Library of Congress Control Number (LCCN): 2009284505
- All ISBNs: 9780819466389 - 0819466387
Access and General Info:
- First Year Published: 2007
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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38Microcircuit engineering 91
By International Conference on Microlithography (1991 Rome, Italy), A. Tucciarone and A. Paoletti
“Microcircuit engineering 91” Metadata:
- Title: Microcircuit engineering 91
- Authors: ➤ International Conference on Microlithography (1991 Rome, Italy)A. TucciaroneA. Paoletti
- Language: English
- Number of Pages: Median: 582
- Publisher: ➤ Elsevier - Elsevier Science Publishing Company
- Publish Date: 1992
“Microcircuit engineering 91” Subjects and Themes:
- Subjects: ➤ Electronics - Microelectronics - Engineering - Electrical & Electronic - Logic Design - Circuits & components - Electronic devices & materials - Materials science - Electronic Circuits - Technology & Industrial Arts - Science/Mathematics - Integrated circuits - Very large scale integration - Design and construction - Congresses - Microlithography
Edition Identifiers:
- The Open Library ID: OL22178941M - OL10261308M
- Online Computer Library Center (OCLC) ID: 27013589
- Library of Congress Control Number (LCCN): 92223247
- All ISBNs: 9780444895097 - 0444895094
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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39Digest of papers
By International Microporcesses and Nanotechnology Conference (20th 2007 Kyoto, Japan)
“Digest of papers” Metadata:
- Title: Digest of papers
- Author: ➤ International Microporcesses and Nanotechnology Conference (20th 2007 Kyoto, Japan)
- Language: English
- Number of Pages: Median: 543
- Publisher: ➤ Japan Society of Applied Physics
- Publish Date: 2007
- Publish Location: Tokyo
“Digest of papers” Subjects and Themes:
- Subjects: Nanotechnology - Congresses - Microelectronics - Microlithography
Edition Identifiers:
- The Open Library ID: OL23629817M - OL23653128M
- Library of Congress Control Number (LCCN): 2008274639
- All ISBNs: 9784990247249 - 4990247248
Access and General Info:
- First Year Published: 2007
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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40Digest of papers
Microprocesses and nanotechnology 2007 : 2007 International Microprocesses and Nanotechnology Conference, November 5-8, 2007, Koyto International Conference Center, Kyoto, Japan
By International Microprocesses and Nanotechnology Conference (20th 2007 Kyoto, Japan)
“Digest of papers” Metadata:
- Title: Digest of papers
- Author: ➤ International Microprocesses and Nanotechnology Conference (20th 2007 Kyoto, Japan)
- Language: English
- Number of Pages: Median: 543
- Publisher: ➤ Japan Society of Applied Physics
- Publish Date: 2007
- Publish Location: Tokyo
“Digest of papers” Subjects and Themes:
- Subjects: Congresses - Nanotechnology - Microelectronics - Microlithography
Edition Identifiers:
- The Open Library ID: OL23723338M - OL23667206M
- Library of Congress Control Number (LCCN): 2008274639
- All ISBNs: 9784990247249 - 4990247248
Access and General Info:
- First Year Published: 2007
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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41Photomask technology 2006
By Symposium on Photomask Technology (26th 2006 Monterey, Calif.), Patrick M. Martin and Robert J. Naber
“Photomask technology 2006” Metadata:
- Title: Photomask technology 2006
- Authors: ➤ Symposium on Photomask Technology (26th 2006 Monterey, Calif.)Patrick M. MartinRobert J. Naber
- Language: English
- Publisher: ➤ The International Society for Optical Engineering - SPIE
- Publish Date: 2005 - 2006
- Publish Location: Bellingham, Wash
“Photomask technology 2006” Subjects and Themes:
- Subjects: Congresses - Integrated circuits - Masks - Microlithography - Applied optics
Edition Identifiers:
- The Open Library ID: OL17180031M - OL11393913M
- Library of Congress Control Number (LCCN): 2007271488
- All ISBNs: 0819464449 - 9780819464446
Access and General Info:
- First Year Published: 2005
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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42MicrocircuitEngineering 89
By Microcircuit Engineering 89 (1989 Cambridge, England), H. Ahmed, J. R. A. Cleaver, G. A. C. Jones, Richard A. McMahon and A. N. Broers
“MicrocircuitEngineering 89” Metadata:
- Title: MicrocircuitEngineering 89
- Authors: ➤ Microcircuit Engineering 89 (1989 Cambridge, England)H. AhmedJ. R. A. CleaverG. A. C. JonesRichard A. McMahonA. N. Broers
- Language: English
- Number of Pages: Median: 718
- Publisher: ➤ Distributors for the United States and Canada, Elsevier Science Pub. Co - Ohmsha - Elsevier - Elsevier Science Ltd
- Publish Date: 1990
- Publish Location: ➤ New York - Tokyo - Amsterdam - New York, N.Y., U.S.A
“MicrocircuitEngineering 89” Subjects and Themes:
- Subjects: Congresses - Microelectronics - Microlithography - Electronic Circuits - Science/Mathematics
Edition Identifiers:
- The Open Library ID: OL10261216M - OL21438666M
- All ISBNs: 9780444881823 - 0444881824
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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43Handbook of VLSI microlithography
By William B. Glendinning and John N. Helbert
“Handbook of VLSI microlithography” Metadata:
- Title: ➤ Handbook of VLSI microlithography
- Authors: William B. GlendinningJohn N. Helbert
- Language: English
- Number of Pages: Median: 649
- Publisher: Noyes Publications
- Publish Date: 1991 - 1992
- Publish Location: Park Ridge, N.J., U.S.A
“Handbook of VLSI microlithography” Subjects and Themes:
- Subjects: Very large scale integration - Microlithography - Integrated circuits - Integrated circuits, very large scale integration
Edition Identifiers:
- The Open Library ID: OL1865614M - OL8048780M
- Library of Congress Control Number (LCCN): 90023646
- All ISBNs: 9780815512813 - 0815512813
First Setence:
"Integrated Circuit (IC) fabrication requires performing a long sequence of many complex processes."
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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44Etching in microsystem technology
By J. M. Köhler
“Etching in microsystem technology” Metadata:
- Title: ➤ Etching in microsystem technology
- Author: J. M. Köhler
- Language: English
- Number of Pages: Median: 368
- Publisher: Wiley-VCH
- Publish Date: 1999
- Publish Location: Weinheim - New York
“Etching in microsystem technology” Subjects and Themes:
- Subjects: Masks (Electronics) - Microlithography - Plasma etching - Microcomputers, design and construction - Computer engineering
Edition Identifiers:
- The Open Library ID: OL112876M
- Online Computer Library Center (OCLC) ID: 40684553
- Library of Congress Control Number (LCCN): 99233639
- All ISBNs: 3527295615 - 9783527295616
Access and General Info:
- First Year Published: 1999
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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45Principles of Lithography, Third Edition (SPIE Press Monograph, Vol. PM198)
By Harry J. Levinson
“Principles of Lithography, Third Edition (SPIE Press Monograph, Vol. PM198)” Metadata:
- Title: ➤ Principles of Lithography, Third Edition (SPIE Press Monograph, Vol. PM198)
- Author: Harry J. Levinson
- Number of Pages: Median: 526
- Publisher: SPIE Press
- Publish Date: 2011
“Principles of Lithography, Third Edition (SPIE Press Monograph, Vol. PM198)” Subjects and Themes:
- Subjects: Microlithography - Integrated circuits - Design and construction
Edition Identifiers:
- The Open Library ID: OL26830180M
- Library of Congress Control Number (LCCN): 2010026775
- All ISBNs: 0819483249 - 9780819483249
Access and General Info:
- First Year Published: 2011
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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46Photomask fabrication technology
By Benjamin G. Eynon and Banqiu Wu
“Photomask fabrication technology” Metadata:
- Title: ➤ Photomask fabrication technology
- Authors: Benjamin G. EynonBanqiu Wu
- Language: English
- Number of Pages: Median: 500
- Publisher: McGraw-Hill Professional
- Publish Date: 2005
“Photomask fabrication technology” Subjects and Themes:
- Subjects: Masks (Electronics) - Integrated circuits - Masks - Microlithography - Masks (electronics)
Edition Identifiers:
- The Open Library ID: OL7300786M - OL9255463M
- Online Computer Library Center (OCLC) ID: 57638600
- Library of Congress Control Number (LCCN): 2005047886
- All ISBNs: 9780071445634 - 0071445633
Access and General Info:
- First Year Published: 2005
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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47Materials for microlithography
“Materials for microlithography” Metadata:
- Title: Materials for microlithography
- Language: English
- Number of Pages: Median: 494
- Publisher: ➤ The Society - Amer Chemical Society
- Publish Date: 1984 - 1985
- Publish Location: Washington, D.C
“Materials for microlithography” Subjects and Themes:
- Subjects: ➤ Materials - Congresses - Photoresists - Polymers - Microelectronics - Microlithography
Edition Identifiers:
- The Open Library ID: OL8226554M - OL2859045M
- Library of Congress Control Number (LCCN): 84021744
- All ISBNs: 9780841208711 - 0841208719
Access and General Info:
- First Year Published: 1984
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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48Microlithography/molecular imprinting
By Hiroshi Ito
“Microlithography/molecular imprinting” Metadata:
- Title: ➤ Microlithography/molecular imprinting
- Author: Hiroshi Ito
- Language: English
- Number of Pages: Median: 281
- Publisher: Springer
- Publish Date: 2005 - 2010
“Microlithography/molecular imprinting” Subjects and Themes:
- Subjects: ➤ Microlithografie - Molecular imprinting - Microlithography - Molecular recognition - Imprinted polymers - Lithographie <Halbleitertechnologie> - Photoresist - Molekulares Prägen
Edition Identifiers:
- The Open Library ID: OL28002007M - OL9417826M
- Online Computer Library Center (OCLC) ID: 60324571 - 55963260
- Library of Congress Control Number (LCCN): 2004115719
- All ISBNs: 3540218629 - 9783642060083 - 9783540218623 - 3642060080
First Setence:
"Molecular recognition is central to how biological systems work, especially at the cellular level (example Fig. 1)."
Access and General Info:
- First Year Published: 2005
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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49Polymers for high technology
By S. Richard Turner
“Polymers for high technology” Metadata:
- Title: Polymers for high technology
- Author: S. Richard Turner
- Language: English
- Number of Pages: Median: 630
- Publisher: ➤ The Society - American Chemical Society - An American Chemical Society Publication
- Publish Date: 1987
- Publish Location: Washington, DC
“Polymers for high technology” Subjects and Themes:
- Subjects: ➤ Materials - Congresses - Photoresists - Polymers - Microelectronics - Microlithography
Edition Identifiers:
- The Open Library ID: OL8226608M - OL2385636M
- Online Computer Library Center (OCLC) ID: 16131613
- Library of Congress Control Number (LCCN): 87014573
- All ISBNs: 9780841214064 - 0841214069
Access and General Info:
- First Year Published: 1987
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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50Polymers in microlithography
By Elsa Reichmanis
“Polymers in microlithography” Metadata:
- Title: Polymers in microlithography
- Author: Elsa Reichmanis
- Language: English
- Number of Pages: Median: 441
- Publisher: ➤ American Chemical Society - An American Chemical Society Publication
- Publish Date: 1989 - 1998
- Publish Location: Washington, DC
“Polymers in microlithography” Subjects and Themes:
- Subjects: ➤ Polymers - Materials - Congresses - Microlithography - Photoresists - Microelectronics
Edition Identifiers:
- The Open Library ID: OL8226667M - OL2198169M
- Library of Congress Control Number (LCCN): 89017931
- All ISBNs: 0841217017 - 9780841217010
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
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Wiki
Source: Wikipedia
Wikipedia Results
Search Results from Wikipedia
Microlithography
Microlithography is a general name for any manufacturing process that can create a minutely patterned thin film of protective materials over a substrate
Resolution enhancement technology
extensions for the future". Proc. SPIE 5377, Optical Microlithography XVII. Optical Microlithography XVII. 5377: 1. Bibcode:2004SPIE.5377....1S. doi:10
Photomask
phase-shifting masks". In Wiley, James N. (ed.). 10th Annual Symp on Microlithography. Vol. 1496. pp. 27–53. doi:10.1117/12.29750. S2CID 109009678. Eom,
Zerodur
and is used for high-precision applications in telescope optics, microlithography machines and inertial navigation systems. Zerodur is produced in a
FSI International
wet, cryogenic or other chemistry techniques. The company also sold microlithography systems using photoresist processes. The company provides upgrade,
Maskless lithography
substrate (e.g. wafer) by means of UV radiation or electron beam. In microlithography, typically UV radiation casts an image of a time constant mask onto
Electron-beam lithography
Rooks, M.J. (2000). "2. Electron beam lithography". Microlithography. SPIE Handbook of Microlithography, Micromachining and Microfabrication. Vol. 1. Archived
Roya Maboudian
and as associate editor of IEEE/SPIE Journal on Microfabrication, Microlithography and Microsystems. Maboudian obtained her B.S. in electrical engineering
Photolithography
extremely clean operating conditions. Photolithography is a subclass of microlithography, the general term for processes that generate patterned thin films
Photodiode
pixel sensors with a practical pixel size in the 1970s, due to limited microlithography technology at the time. Electronics Band gap Infrared Optoelectronics