Photomask Fabrication Technology (Professional Engineering) - Info and Reading Options
By Benjamin G. Eynon and Banqiu Wu
"Photomask Fabrication Technology (Professional Engineering)" is published by McGraw-Hill Professional in July 21, 2005, it has 500 pages and the language of the book is English.
“Photomask Fabrication Technology (Professional Engineering)” Metadata:
- Title: ➤ Photomask Fabrication Technology (Professional Engineering)
- Authors: Benjamin G. EynonBanqiu Wu
- Language: English
- Number of Pages: 500
- Publisher: McGraw-Hill Professional
- Publish Date: July 21, 2005
- Library of Congress Classification: TK7872.M3TK7872.M3 E99 2005
“Photomask Fabrication Technology (Professional Engineering)” Subjects and Themes:
- Subjects: Masks (Electronics) - Integrated circuits - Masks - Microlithography - Masks (electronics)
Edition Identifiers:
- The Open Library ID: OL7300786M - OL16981359W
- Online Computer Library Center (OCLC) ID: 57638600
- Library of Congress Control Number (LCCN): 2005047886
- ISBN-13: 9780071445634
- ISBN-10: 0071445633
- All ISBNs: 0071445633 - 9780071445634
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