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1Optical Laser Microlithography VIII

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Book's cover

“Optical Laser Microlithography VIII” Metadata:

  • Title: ➤  Optical Laser Microlithography VIII
  • Author:
  • Language: English
  • Number of Pages: Median: 948
  • Publisher: ➤  SPIE - Society of Photo Optical
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Optical Laser Microlithography VIII” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1995
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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2Optical Laser Microlithography Vii/V2197

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Book's cover

“Optical Laser Microlithography Vii/V2197” Metadata:

  • Title: ➤  Optical Laser Microlithography Vii/V2197
  • Author:
  • Language: English
  • Number of Pages: Median: 1008
  • Publisher: ➤  SPIE--the International Society for Optical Engineering - Society of Photo Optical
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Optical Laser Microlithography Vii/V2197” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1994
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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310th annual Symposium on Microlithography

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Book's cover

“10th annual Symposium on Microlithography” Metadata:

  • Title: ➤  10th annual Symposium on Microlithography
  • Author: ➤  
  • Language: English
  • Number of Pages: Median: 315
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“10th annual Symposium on Microlithography” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1991
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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4Dividing, ruling, and mask-making

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Book's cover

“Dividing, ruling, and mask-making” Metadata:

  • Title: ➤  Dividing, ruling, and mask-making
  • Author:
  • Language: English
  • Number of Pages: Median: 315
  • Publisher: Hilger - Crane, Russak
  • Publish Date:
  • Publish Location: New York - London

“Dividing, ruling, and mask-making” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1974
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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516th European Conference on Mask Technology for Integrated Circuits and Microcomponents

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“16th European Conference on Mask Technology for Integrated Circuits and Microcomponents” Metadata:

  • Title: ➤  16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
  • Author: ➤  
  • Language: English
  • Number of Pages: Median: 252
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“16th European Conference on Mask Technology for Integrated Circuits and Microcomponents” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2000
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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620th Annual BACUS Symposium on Photomask Technology

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Book's cover

“20th Annual BACUS Symposium on Photomask Technology” Metadata:

  • Title: ➤  20th Annual BACUS Symposium on Photomask Technology
  • Author: ➤  
  • Language: English
  • Number of Pages: Median: 938
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Washington

“20th Annual BACUS Symposium on Photomask Technology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2001
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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721st Annual BACUS Symposium on Photomask Technology

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“21st Annual BACUS Symposium on Photomask Technology” Metadata:

  • Title: ➤  21st Annual BACUS Symposium on Photomask Technology
  • Author: ➤  
  • Language: English
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“21st Annual BACUS Symposium on Photomask Technology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2002
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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8Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II

Book's cover

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II
  • Language: English
  • Number of Pages: Median: 488
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1992
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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9Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV

Book's cover

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV
  • Language: English
  • Number of Pages: Median: 420
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1994
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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10Emerging lithographic technologies V

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“Emerging lithographic technologies V” Metadata:

  • Title: ➤  Emerging lithographic technologies V
  • Author:
  • Language: English
  • Number of Pages: Median: 818
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies V” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2001
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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11Emerging lithographic technologies II

Book's cover

“Emerging lithographic technologies II” Metadata:

  • Title: ➤  Emerging lithographic technologies II
  • Language: English
  • Number of Pages: Median: 702
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies II” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1998
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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12Emerging lithographic technologies VIII

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“Emerging lithographic technologies VIII” Metadata:

  • Title: ➤  Emerging lithographic technologies VIII
  • Author:
  • Language: English
  • Number of Pages: Median: 1110
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Emerging lithographic technologies VIII” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2004
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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13Photomask and next-generation lithography mask technology XI

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Book's cover

“Photomask and next-generation lithography mask technology XI” Metadata:

  • Title: ➤  Photomask and next-generation lithography mask technology XI
  • Author:
  • Language: English
  • Number of Pages: Median: 984
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Photomask and next-generation lithography mask technology XI” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2004
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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14Emerging lithographic technologies

Book's cover

“Emerging lithographic technologies” Metadata:

  • Title: ➤  Emerging lithographic technologies
  • Language: English
  • Number of Pages: Median: 412
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1997
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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15Emerging Lithographic Technologies for Nanopatterning

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“Emerging Lithographic Technologies for Nanopatterning” Metadata:

  • Title: ➤  Emerging Lithographic Technologies for Nanopatterning
  • Authors:
  • Language: English
  • Number of Pages: Median: 700
  • Publisher: Taylor & Francis Group - CRC
  • Publish Date:

“Emerging Lithographic Technologies for Nanopatterning” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2008
  • Is Full Text Available: No
  • Is The Book Public: No
  • Access Status: No_ebook

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    16Federal statutory protection for mask works

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    “Federal statutory protection for mask works” Metadata:

    • Title: ➤  Federal statutory protection for mask works
    • Author: ➤  
    • Language: English
    • Publisher: ➤  [Library of Congress, Copyright Office] - Copyright Office, Library of Congress - U.S. Copyright Office
    • Publish Date:
    • Publish Location: ➤  [Washington, DC] (101 Independence Ave., SE, Washington 20559-6000) - [Washington, D.C.] (101 Independence Ave., SE, Washington 20559-6000) - Washington, D.C

    “Federal statutory protection for mask works” Subjects and Themes:

    Edition Identifiers:

    Access and General Info:

    • First Year Published: 1984
    • Is Full Text Available: No
    • Is The Book Public: No
    • Access Status: No_ebook

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    17Materials Development for Direct Write Technologies

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    “Materials Development for Direct Write Technologies” Metadata:

    • Title: ➤  Materials Development for Direct Write Technologies
    • Author:
    • Language: English
    • Number of Pages: Median: 293
    • Publisher: ➤  Materials Research Society - University of Cambridge ESOL Examinations
    • Publish Date:

    “Materials Development for Direct Write Technologies” Subjects and Themes:

    Edition Identifiers:

    Access and General Info:

    • First Year Published: 2000
    • Is Full Text Available: No
    • Is The Book Public: No
    • Access Status: No_ebook

    Online Access

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      18Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI

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      “Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI” Metadata:

      • Title: ➤  Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI
      • Author: ➤  
      • Language: English
      • Number of Pages: Median: 382
      • Publisher: Electrochemical Society
      • Publish Date:
      • Publish Location: Pennington, NJ

      “Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI” Subjects and Themes:

      Edition Identifiers:

      Access and General Info:

      • First Year Published: 1992
      • Is Full Text Available: No
      • Is The Book Public: No
      • Access Status: No_ebook

      Online Access

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        19Emerging lithographic technologies XI

        “Emerging lithographic technologies XI” Metadata:

        • Title: ➤  Emerging lithographic technologies XI
        • Language: English
        • Publisher: SPIE
        • Publish Date:
        • Publish Location: Bellingham, Wash

        “Emerging lithographic technologies XI” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 2007
        • Is Full Text Available: No
        • Is The Book Public: No
        • Access Status: No_ebook

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        20Etching in microsystem technology

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        Book's cover

        “Etching in microsystem technology” Metadata:

        • Title: ➤  Etching in microsystem technology
        • Author:
        • Language: English
        • Number of Pages: Median: 368
        • Publisher: Wiley-VCH
        • Publish Date:
        • Publish Location: Weinheim - New York

        “Etching in microsystem technology” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 1999
        • Is Full Text Available: No
        • Is The Book Public: No
        • Access Status: No_ebook

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        21Photomask fabrication technology

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        “Photomask fabrication technology” Metadata:

        • Title: ➤  Photomask fabrication technology
        • Authors:
        • Language: English
        • Number of Pages: Median: 500
        • Publisher: McGraw-Hill Professional
        • Publish Date:

        “Photomask fabrication technology” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 2005
        • Is Full Text Available: No
        • Is The Book Public: No
        • Access Status: No_ebook

        Online Access

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          22Proceedings

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          “Proceedings” Metadata:

          • Title: Proceedings
          • Author: ➤  
          • Language: English
          • Number of Pages: Median: 62
          • Publisher: ➤  Graphics Markets Division, Eastman Kodak Co.
          • Publish Date:
          • Publish Location: [Rochester, N.Y

          “Proceedings” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1973
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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          23Handbook of Photomask Manufacturing Technology

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          “Handbook of Photomask Manufacturing Technology” Metadata:

          • Title: ➤  Handbook of Photomask Manufacturing Technology
          • Author:
          • Language: English
          • Number of Pages: Median: 704
          • Publisher: CRC
          • Publish Date:

          “Handbook of Photomask Manufacturing Technology” Subjects and Themes:

          Edition Identifiers:

          First Setence:

          "A mask can be defined in simplest terms as a pattern transfer artifact, wherein exists a patterned surface on a substrate material."

          Access and General Info:

          • First Year Published: 2005
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: Unclassified

          Online Access

          Downloads Are Not Available:

          The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.

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            24Emerging Lithographic Techniques VI

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            “Emerging Lithographic Techniques VI” Metadata:

            • Title: ➤  Emerging Lithographic Techniques VI
            • Author:
            • Number of Pages: Median: 508
            • Publisher: ➤  SPIE Society of Photo-Optical Instrumentation Engi
            • Publish Date:

            “Emerging Lithographic Techniques VI” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 2002
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

            Online Access

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              25Emerging Lithographic Technologies 9

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              Book's cover

              “Emerging Lithographic Technologies 9” Metadata:

              • Title: ➤  Emerging Lithographic Technologies 9
              • Author:
              • Language: English
              • Number of Pages: Median: 1286
              • Publisher: ➤  SPIE-International Society for Optical Engine
              • Publish Date:

              “Emerging Lithographic Technologies 9” Subjects and Themes:

              Edition Identifiers:

              Access and General Info:

              • First Year Published: 2005
              • Is Full Text Available: No
              • Is The Book Public: No
              • Access Status: No_ebook

              Online Access

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                26Photomask And Next-generation Lithography Mask Technology XII

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                Book's cover

                “Photomask And Next-generation Lithography Mask Technology XII” Metadata:

                • Title: ➤  Photomask And Next-generation Lithography Mask Technology XII
                • Author:
                • Language: English
                • Number of Pages: Median: 1048
                • Publisher: ➤  SPIE-International Society for Optical Engine
                • Publish Date:

                “Photomask And Next-generation Lithography Mask Technology XII” Subjects and Themes:

                Edition Identifiers:

                Access and General Info:

                • First Year Published: 2005
                • Is Full Text Available: No
                • Is The Book Public: No
                • Access Status: No_ebook

                Online Access

                Downloads Are Not Available:

                The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.

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                  27Simulation and design of microsystems and microstructures

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                  Book's cover

                  “Simulation and design of microsystems and microstructures” Metadata:

                  • Title: ➤  Simulation and design of microsystems and microstructures
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 337
                  • Publisher: ➤  Computational Mechanics Publications
                  • Publish Date:
                  • Publish Location: Southampton - Boston

                  “Simulation and design of microsystems and microstructures” Subjects and Themes:

                  Edition Identifiers:

                  Access and General Info:

                  • First Year Published: 1995
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  28Alternative Lithographic Technologies VIII

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                  “Alternative Lithographic Technologies VIII” Metadata:

                  • Title: ➤  Alternative Lithographic Technologies VIII
                  • Author:
                  • Language: English
                  • Publisher: SPIE
                  • Publish Date:

                  “Alternative Lithographic Technologies VIII” Subjects and Themes:

                  Edition Identifiers:

                  Access and General Info:

                  • First Year Published: 2016
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  29Proceedings of the Second International Symposium on Electrochemical Microfabrication

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                  Book's cover

                  “Proceedings of the Second International Symposium on Electrochemical Microfabrication” Metadata:

                  • Title: ➤  Proceedings of the Second International Symposium on Electrochemical Microfabrication
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 412
                  • Publisher: Electrochemical Society
                  • Publish Date:
                  • Publish Location: Pennington, NJ

                  “Proceedings of the Second International Symposium on Electrochemical Microfabrication” Subjects and Themes:

                  Edition Identifiers:

                  Access and General Info:

                  • First Year Published: 1995
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  30Proceedings of the Symposium on Patterning Science and Technology

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                  “Proceedings of the Symposium on Patterning Science and Technology” Metadata:

                  • Title: ➤  Proceedings of the Symposium on Patterning Science and Technology
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 248
                  • Publisher: Electrochemical Society
                  • Publish Date:
                  • Publish Location: ➤  Pennington, NJ (10 S. Main St., Pennington 08534-2896)

                  “Proceedings of the Symposium on Patterning Science and Technology” Subjects and Themes:

                  Edition Identifiers:

                  • The Open Library ID: OL1895639M
                  • Online Computer Library Center (OCLC) ID: 21409932
                  • Library of Congress Control Number (LCCN): 90080468

                  Access and General Info:

                  • First Year Published: 1990
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  31Proceedings of the First International Symposium on Electrochemical Microfabrication

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                  “Proceedings of the First International Symposium on Electrochemical Microfabrication” Metadata:

                  • Title: ➤  Proceedings of the First International Symposium on Electrochemical Microfabrication
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 393
                  • Publisher: Electrochemical Society
                  • Publish Date:
                  • Publish Location: Pennington, NJ

                  “Proceedings of the First International Symposium on Electrochemical Microfabrication” Subjects and Themes:

                  Edition Identifiers:

                  Access and General Info:

                  • First Year Published: 1992
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  32Diazonaphthoquinone-based resists

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                  Book's cover

                  “Diazonaphthoquinone-based resists” Metadata:

                  • Title: ➤  Diazonaphthoquinone-based resists
                  • Author:
                  • Language: English
                  • Number of Pages: Median: 203
                  • Publisher: SPIE Optical Engineering Press
                  • Publish Date:
                  • Publish Location: Bellingham, Wash., USA

                  “Diazonaphthoquinone-based resists” Subjects and Themes:

                  Edition Identifiers:

                  Access and General Info:

                  • First Year Published: 1993
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  33Patterning of material layers in submicron region

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                  “Patterning of material layers in submicron region” Metadata:

                  • Title: ➤  Patterning of material layers in submicron region
                  • Author:
                  • Language: English
                  • Number of Pages: Median: 183
                  • Publisher: J. Wiley
                  • Publish Date:
                  • Publish Location: New York

                  “Patterning of material layers in submicron region” Subjects and Themes:

                  Edition Identifiers:

                  Access and General Info:

                  • First Year Published: 1993
                  • Is Full Text Available: Yes
                  • Is The Book Public: No
                  • Access Status: Printdisabled

                  Online Access

                  Downloads Are Not Available:

                  The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.

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                    34Photomasks, scales, and gratings

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                    “Photomasks, scales, and gratings” Metadata:

                    • Title: ➤  Photomasks, scales, and gratings
                    • Author:
                    • Language: English
                    • Number of Pages: Median: 206
                    • Publisher: A. Hilger
                    • Publish Date:
                    • Publish Location: Bristol

                    “Photomasks, scales, and gratings” Subjects and Themes:

                    Edition Identifiers:

                    Access and General Info:

                    • First Year Published: 1983
                    • Is Full Text Available: No
                    • Is The Book Public: No
                    • Access Status: No_ebook

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                    35Generatory izobrazheniĭ v proizvodstve integralʹnykh mikroskhem

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                    “Generatory izobrazheniĭ v proizvodstve integralʹnykh mikroskhem” Metadata:

                    • Title: ➤  Generatory izobrazheniĭ v proizvodstve integralʹnykh mikroskhem
                    • Author:
                    • Language: rus
                    • Number of Pages: Median: 144
                    • Publisher: "Nauka i tekhnika"
                    • Publish Date:
                    • Publish Location: Minsk

                    “Generatory izobrazheniĭ v proizvodstve integralʹnykh mikroskhem” Subjects and Themes:

                    Edition Identifiers:

                    Access and General Info:

                    • First Year Published: 1981
                    • Is Full Text Available: No
                    • Is The Book Public: No
                    • Access Status: No_ebook

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                    3622nd Annual BACUS Symposium on Photomask Technology

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                    Book's cover

                    “22nd Annual BACUS Symposium on Photomask Technology” Metadata:

                    • Title: ➤  22nd Annual BACUS Symposium on Photomask Technology
                    • Author: ➤  
                    • Language: English
                    • Publisher: SPIE
                    • Publish Date:
                    • Publish Location: Bellingham, Wash

                    “22nd Annual BACUS Symposium on Photomask Technology” Subjects and Themes:

                    Edition Identifiers:

                    Access and General Info:

                    • First Year Published: 2002
                    • Is Full Text Available: Yes
                    • Is The Book Public: No
                    • Access Status: Printdisabled

                    Online Access

                    Downloads Are Not Available:

                    The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.

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                      37Technological advances in micro and submicro photofabrication imagery

                      “Technological advances in micro and submicro photofabrication imagery” Metadata:

                      • Title: ➤  Technological advances in micro and submicro photofabrication imagery
                      • Language: English
                      • Number of Pages: Median: 136
                      • Publisher: ➤  Society of Photo-optical Instrumentation Engineers
                      • Publish Date:
                      • Publish Location: Palos Verdes Estates, Calif

                      “Technological advances in micro and submicro photofabrication imagery” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 1975
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      38Alternative lithographic technologies IV

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                      “Alternative lithographic technologies IV” Metadata:

                      • Title: ➤  Alternative lithographic technologies IV
                      • Authors:
                      • Language: English
                      • Publisher: SPIE
                      • Publish Date:
                      • Publish Location: Bellingham, Washington

                      “Alternative lithographic technologies IV” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 2012
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      39Technologies for microlithography manufacturing

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                      “Technologies for microlithography manufacturing” Metadata:

                      • Title: ➤  Technologies for microlithography manufacturing
                      • Author:
                      • Language: English
                      • Number of Pages: Median: 224
                      • Publisher: ➤  The Society - Semiconductor Equipment and Materials International
                      • Publish Date:
                      • Publish Location: ➤  Bellingham, Wash - Mountain View, Calif., USA

                      “Technologies for microlithography manufacturing” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 1995
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      40Photomask and next-generation lithography mask technology XVI

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                      “Photomask and next-generation lithography mask technology XVI” Metadata:

                      • Title: ➤  Photomask and next-generation lithography mask technology XVI
                      • Author:
                      • Language: English
                      • Publisher: SPIE
                      • Publish Date:
                      • Publish Location: Bellingham, Wash

                      “Photomask and next-generation lithography mask technology XVI” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 2009
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      41Lithography Asia 2008

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                      “Lithography Asia 2008” Metadata:

                      • Title: Lithography Asia 2008
                      • Authors:
                      • Language: English
                      • Publisher: SPIE
                      • Publish Date:
                      • Publish Location: Bellingham, Wash

                      “Lithography Asia 2008” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 2008
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      42Photomask technology 2010

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                      “Photomask technology 2010” Metadata:

                      • Title: Photomask technology 2010
                      • Authors:
                      • Language: English
                      • Publisher: ➤  Society of Photo-optical Instrumentation Engineers
                      • Publish Date:
                      • Publish Location: Bellingham, Wash

                      “Photomask technology 2010” Subjects and Themes:

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                      • First Year Published: 2010
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      43Emerging lithographic technologies X

                      “Emerging lithographic technologies X” Metadata:

                      • Title: ➤  Emerging lithographic technologies X
                      • Language: English
                      • Publisher: SPIE
                      • Publish Date:
                      • Publish Location: Bellingham, Wash

                      “Emerging lithographic technologies X” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 2006
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      44Photomask and next-generation lithography mask technology XIV

                      “Photomask and next-generation lithography mask technology XIV” Metadata:

                      • Title: ➤  Photomask and next-generation lithography mask technology XIV
                      • Language: English
                      • Publisher: SPIE
                      • Publish Date:
                      • Publish Location: Bellingham, Wash

                      “Photomask and next-generation lithography mask technology XIV” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 2007
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      45Selected papers on optical microlithography

                      “Selected papers on optical microlithography” Metadata:

                      • Title: ➤  Selected papers on optical microlithography
                      • Language: English
                      • Number of Pages: Median: 676
                      • Publisher: SPIE Optical Engineering Press
                      • Publish Date:
                      • Publish Location: Bellingham, Wash

                      “Selected papers on optical microlithography” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 1992
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      46Early emission line stars

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                      “Early emission line stars” Metadata:

                      • Title: Early emission line stars
                      • Author:
                      • Language: English
                      • Number of Pages: Median: 182
                      • Publisher: A. Hilger
                      • Publish Date:
                      • Publish Location: Bristol, Avon

                      “Early emission line stars” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 1982
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      47Photomask and next-generation lithography mask technology XIII

                      “Photomask and next-generation lithography mask technology XIII” Metadata:

                      • Title: ➤  Photomask and next-generation lithography mask technology XIII
                      • Language: English
                      • Publisher: SPIE
                      • Publish Date:
                      • Publish Location: Bellingham, Wash

                      “Photomask and next-generation lithography mask technology XIII” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 2006
                      • Is Full Text Available: No
                      • Is The Book Public: No
                      • Access Status: No_ebook

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                      48Emerging lithographic technologies IV

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                      Book's cover

                      “Emerging lithographic technologies IV” Metadata:

                      • Title: ➤  Emerging lithographic technologies IV
                      • Author:
                      • Language: English
                      • Number of Pages: Median: 900
                      • Publisher: SPIE
                      • Publish Date:
                      • Publish Location: Bellingham, Wash

                      “Emerging lithographic technologies IV” Subjects and Themes:

                      Edition Identifiers:

                      Access and General Info:

                      • First Year Published: 2000
                      • Is Full Text Available: Yes
                      • Is The Book Public: No
                      • Access Status: Printdisabled

                      Online Access

                      Downloads Are Not Available:

                      The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.

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                        49Photomask technology 2011

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                        “Photomask technology 2011” Metadata:

                        • Title: Photomask technology 2011
                        • Authors:
                        • Language: English
                        • Publisher: SPIE
                        • Publish Date:
                        • Publish Location: Bellingham, Wash

                        “Photomask technology 2011” Subjects and Themes:

                        Edition Identifiers:

                        Access and General Info:

                        • First Year Published: 2011
                        • Is Full Text Available: No
                        • Is The Book Public: No
                        • Access Status: No_ebook

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                        50Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III

                        Book's cover

                        “Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Metadata:

                        • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III
                        • Language: English
                        • Number of Pages: Median: 470
                        • Publisher: The Society
                        • Publish Date:
                        • Publish Location: Bellingham, Wash

                        “Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Subjects and Themes:

                        Edition Identifiers:

                        Access and General Info:

                        • First Year Published: 1993
                        • Is Full Text Available: No
                        • Is The Book Public: No
                        • Access Status: No_ebook

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