Explore: Plasma Etching
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Books Results
Source: The Open Library
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1Papers from the International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces (BANPIS '97)
By International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces (1997 Tanabe-shi, Japan)
“Papers from the International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces (BANPIS '97)” Metadata:
- Title: ➤ Papers from the International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces (BANPIS '97)
- Author: ➤ International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces (1997 Tanabe-shi, Japan)
- Language: English
- Number of Pages: Median: 382
- Publisher: ➤ Published for the American Vacuum Society by the American Institute of Physics
- Publish Date: 1998
- Publish Location: New York
“Papers from the International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces (BANPIS '97)” Subjects and Themes:
- Subjects: ➤ Congresses - Plasma etching - Surfaces (Physics) - Nonequilibrium plasmas - Microelectronics - Surfaces (Technology)
Edition Identifiers:
- The Open Library ID: OL710734M - OL8646169M
- Online Computer Library Center (OCLC) ID: 38728791
- Library of Congress Control Number (LCCN): 97075227
- All ISBNs: 1563967693 - 9781563967696
Access and General Info:
- First Year Published: 1998
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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2Materials surface processing
By Symposium B on Laser, Lamp, and Synchrotron Assisted Materials Surface Processing (1992 Strasbourg, France), M. Stuke and Ernesto E. Marinero
“Materials surface processing” Metadata:
- Title: Materials surface processing
- Authors: ➤ Symposium B on Laser, Lamp, and Synchrotron Assisted Materials Surface Processing (1992 Strasbourg, France)M. StukeErnesto E. Marinero
- Language: English
- Number of Pages: Median: 450
- Publisher: North-Holland
- Publish Date: 1993
- Publish Location: New York - Amsterdam
“Materials surface processing” Subjects and Themes:
- Subjects: ➤ Congresses - Industrial applications - Lasers - Plasma etching - Surfaces (Technology) - Synchrotron radiation
Edition Identifiers:
- The Open Library ID: OL7534017M - OL1502326M
- Library of Congress Control Number (LCCN): 93180971
- All ISBNs: 9780444899064 - 0444899065
Access and General Info:
- First Year Published: 1993
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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3Dry etch technology
“Dry etch technology” Metadata:
- Title: Dry etch technology
- Language: English
- Number of Pages: Median: 222
- Publisher: ➤ SPIE--The International Societyfor Optical Engineering - SPIE
- Publish Date: 1991 - 1992
- Publish Location: Bellingham, Wash
“Dry etch technology” Subjects and Themes:
- Subjects: ➤ Materials - Congresses - Etching - Plasma etching - Semiconductors - Microelectronics - Microlithography - Integrated circuits - Design and construction
Edition Identifiers:
- The Open Library ID: OL1572304M - OL21092123M
- Online Computer Library Center (OCLC) ID: 25541402
- Library of Congress Control Number (LCCN): 89067546 - 91067546
- All ISBNs: 9780819407245 - 0819407240
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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4Glow discharge processes
By Brian N. Chapman
“Glow discharge processes” Metadata:
- Title: Glow discharge processes
- Author: Brian N. Chapman
- Language: English
- Number of Pages: Median: 406
- Publisher: Wiley
- Publish Date: 1980
- Publish Location: New York
“Glow discharge processes” Subjects and Themes:
- Subjects: Glow discharges - Plasma etching - Sputtering (Physics) - Plasma rockets
Edition Identifiers:
- The Open Library ID: OL4102510M
- Online Computer Library Center (OCLC) ID: 6379539
- Library of Congress Control Number (LCCN): 80017047
- All ISBNs: 9780471078289 - 047107828X
Access and General Info:
- First Year Published: 1980
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
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5Plasma deposition, treatment, and etching of polymers
By Orlando Auciello and Daniel L. Flamm
“Plasma deposition, treatment, and etching of polymers” Metadata:
- Title: ➤ Plasma deposition, treatment, and etching of polymers
- Authors: Orlando AucielloDaniel L. Flamm
- Language: English
- Number of Pages: Median: 544
- Publisher: ➤ Academic Press - Elsevier Science & Technology Books
- Publish Date: 1990 - 2012
- Publish Location: Boston
“Plasma deposition, treatment, and etching of polymers” Subjects and Themes:
- Subjects: Polymers - Plasma polymerization - Plasma etching - Plasma engineering - Plasma dynamics
Edition Identifiers:
- The Open Library ID: OL2198488M - OL9281088M - OL7326440M - OL34491545M
- Online Computer Library Center (OCLC) ID: 20627604
- Library of Congress Control Number (LCCN): 89018267
- All ISBNs: 0323139086 - 0122004302 - 9780323139083 - 9780122004308
First Setence:
"Plasma polymerization is a specific type of plasma chemistry and involves reactions between plasma species, between plasma and surface species and between surface species."
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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61997 2nd International Symposium on Plasma Process-Induced Damage
By International Symposium on Plasma Process-Induced Damage (2nd 1997 Monterey, Calif.), Calif.) International Symposium on Plasma Process-Induced Damage (2nd : 1997 : Monterey, Kin P. Cheung, Moritaka Nakamura and Calvin T. Gabriel
“1997 2nd International Symposium on Plasma Process-Induced Damage” Metadata:
- Title: ➤ 1997 2nd International Symposium on Plasma Process-Induced Damage
- Authors: ➤ International Symposium on Plasma Process-Induced Damage (2nd 1997 Monterey, Calif.)Calif.) International Symposium on Plasma Process-Induced Damage (2nd : 1997 : MontereyKin P. CheungMoritaka NakamuraCalvin T. Gabriel
- Language: English
- Number of Pages: Median: 259
- Publisher: ➤ Northern California Chapter of the American V - Northern California Chapter of the American Vacuum Society
- Publish Date: 1997 - 1998
- Publish Location: Sunnyvale, Calif
“1997 2nd International Symposium on Plasma Process-Induced Damage” Subjects and Themes:
- Subjects: ➤ Congresses - Semiconductor wafers - Plasma etching - Semiconductors - Effect of radiation on - Defects - Electronics - Semiconductors - Technology & Industrial Arts - Science/Mathematics - Plasma radiation
Edition Identifiers:
- The Open Library ID: OL8528792M - OL8083042M - OL705826M
- Online Computer Library Center (OCLC) ID: 37279184
- Library of Congress Control Number (LCCN): 97065930
- All ISBNs: 0965157717 - 0780338227 - 9780965157711 - 9780780338227
Access and General Info:
- First Year Published: 1997
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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7Dry Etching Technology for Semiconductors
By Kazuo Nojiri
“Dry Etching Technology for Semiconductors” Metadata:
- Title: ➤ Dry Etching Technology for Semiconductors
- Author: Kazuo Nojiri
- Language: English
- Number of Pages: Median: 123
- Publisher: Springer
- Publish Date: 2014 - 2016
“Dry Etching Technology for Semiconductors” Subjects and Themes:
- Subjects: Plasma etching - Semiconductors
Edition Identifiers:
- The Open Library ID: OL34387746M - OL37218464M - OL29792203M
- All ISBNs: ➤ 331910294X - 3319356240 - 9783319102948 - 9783319102955 - 3319102958 - 9783319356242
Access and General Info:
- First Year Published: 2014
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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8Plasma Processing of Semiconductors
By P.F. Williams
“Plasma Processing of Semiconductors” Metadata:
- Title: ➤ Plasma Processing of Semiconductors
- Author: P.F. Williams
- Language: English
- Number of Pages: Median: 628
- Publisher: Kluwer - Springer
- Publish Date: 1997 - 2011
- Publish Location: Boston
“Plasma Processing of Semiconductors” Subjects and Themes:
- Subjects: ➤ Plasma chemistry - Etching - Plasma etching - Plasma engineering - Semiconductors - Industrial applications - Plasma dynamics
Edition Identifiers:
- The Open Library ID: OL30628140M - OL21835027M - OL7808396M
- Online Computer Library Center (OCLC) ID: 36746516
- Library of Congress Control Number (LCCN): 97016609
- All ISBNs: 0792345673 - 9780792345671 - 9789401158855 - 9401158851
Access and General Info:
- First Year Published: 1997
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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9Principles of plasma discharges and materials processing
By M. A. Lieberman
“Principles of plasma discharges and materials processing” Metadata:
- Title: ➤ Principles of plasma discharges and materials processing
- Author: M. A. Lieberman
- Language: English
- Number of Pages: Median: 757
- Publisher: Wiley-Interscience - Wiley
- Publish Date: 1994 - 2004 - 2005
- Publish Location: ➤ Hoboken, N.J - New York - Hoboken, NJ
“Principles of plasma discharges and materials processing” Subjects and Themes:
- Subjects: ➤ Industrial applications - Plasma chemistry - Plasma dynamics - Plasma etching - Surfaces - Thin films - Surfaces (technology)
Edition Identifiers:
- The Open Library ID: OL1103914M - OL3309686M - OL22622469M
- Online Computer Library Center (OCLC) ID: 30896011 - 56752658
- Library of Congress Control Number (LCCN): 94028954 - 2004058503
- All ISBNs: 0471720011 - 0471005770 - 9780471005773 - 9780471720010
Access and General Info:
- First Year Published: 1994
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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10Photons and low energy particles in surface processing
By James H. Brannon and Carol H. Ashby
“Photons and low energy particles in surface processing” Metadata:
- Title: ➤ Photons and low energy particles in surface processing
- Authors: James H. BrannonCarol H. Ashby
- Language: English
- Number of Pages: Median: 552
- Publisher: ➤ University of Cambridge ESOL Examinations - Materials Research Society
- Publish Date: 1992 - 2014
- Publish Location: Pittsburgh, Pa
“Photons and low energy particles in surface processing” Subjects and Themes:
- Subjects: ➤ Surfaces (Technology) - Photon beams - Congresses - Lasers - Plasma etching - Industrial applications - Plasma-enhanced chemical vapor deposition - Science/Mathematics - Physical Properties Of Materials - Optical Engineering - Lasers, industrial applications - Photons - Particle beams - Vapor-plating
Edition Identifiers:
- The Open Library ID: OL29206046M - OL8608793M - OL1706413M
- Online Computer Library Center (OCLC) ID: 25412003
- Library of Congress Control Number (LCCN): 92007821
- All ISBNs: 1107409802 - 9781107409804 - 9781558991309 - 1558991301
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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11Materials modification by energetic atoms and ions
By Materials Research Society. Meeting Symposium., Kenneth S. Grabowski and Scott A. Barnett
“Materials modification by energetic atoms and ions” Metadata:
- Title: ➤ Materials modification by energetic atoms and ions
- Authors: ➤ Materials Research Society. Meeting Symposium.Kenneth S. GrabowskiScott A. Barnett
- Language: English
- Number of Pages: Median: 405
- Publisher: ➤ Materials Research Society - University of Cambridge ESOL Examinations
- Publish Date: 1992 - 2014
- Publish Location: Pittsburgh, PA
“Materials modification by energetic atoms and ions” Subjects and Themes:
- Subjects: ➤ Congresses - Etching - Ion bombardment - Plasma etching - Semiconductors - Thin films - Science/Mathematics - Electronic Circuits - Materials, research
Edition Identifiers:
- The Open Library ID: OL29206109M - OL8608817M - OL1722959M
- Online Computer Library Center (OCLC) ID: 26363830
- Library of Congress Control Number (LCCN): 92026483
- All ISBNs: 1558991638 - 9781558991637 - 1107409675 - 9781107409675
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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12Microstructural characterization of reaction-formed silicon carbide ceramics
By M. Singh
“Microstructural characterization of reaction-formed silicon carbide ceramics” Metadata:
- Title: ➤ Microstructural characterization of reaction-formed silicon carbide ceramics
- Author: M. Singh
- Language: English
- Publisher: ➤ National Aeronautics and Space Administration - National Technical Information Service, distributor
- Publish Date: 1995
- Publish Location: ➤ Springfield, Va - [Washington, D.C
“Microstructural characterization of reaction-formed silicon carbide ceramics” Subjects and Themes:
- Subjects: ➤ Ceramic matrix composites - Disilicides - Electron energy - Imaging techniques - Metallography - Microstructure - Plasma etching - Silicon carbides
Edition Identifiers:
- The Open Library ID: OL17834452M - OL15498251M
- Online Computer Library Center (OCLC) ID: 39648069
Access and General Info:
- First Year Published: 1995
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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13Plasma etching
By M. Sugawara
“Plasma etching” Metadata:
- Title: Plasma etching
- Author: M. Sugawara
- Language: English
- Number of Pages: Median: 347
- Publisher: Oxford University Press
- Publish Date: 1998
- Publish Location: New York
“Plasma etching” Subjects and Themes:
- Subjects: Semiconductors - Etching - Plasma etching
Edition Identifiers:
- The Open Library ID: OL692040M
- Library of Congress Control Number (LCCN): 97039210
- All ISBNs: 019856287X - 9780198562870
Access and General Info:
- First Year Published: 1998
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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14Photon-assisted processing of surfaces and thin films
By Symposium B on Photon-Assisted Processing of Surfaces and Thin Films (1994 Strasbourg, France), J. Dieleman and U. K. P. Biermann
“Photon-assisted processing of surfaces and thin films” Metadata:
- Title: ➤ Photon-assisted processing of surfaces and thin films
- Authors: ➤ Symposium B on Photon-Assisted Processing of Surfaces and Thin Films (1994 Strasbourg, France)J. DielemanU. K. P. Biermann
- Language: English
- Number of Pages: Median: 640
- Publisher: Elsevier - North-Holland
- Publish Date: 1995
- Publish Location: Amsterdam - New York
“Photon-assisted processing of surfaces and thin films” Subjects and Themes:
- Subjects: ➤ Congresses - Industrial applications - Surfaces (Technology) - Photon beams - Lasers - Plasma etching - Plasma-enhanced chemical vapor deposition - Lasers, industrial applications
Edition Identifiers:
- The Open Library ID: OL868859M - OL7532368M
- Online Computer Library Center (OCLC) ID: 32076506
- Library of Congress Control Number (LCCN): 95153619
- All ISBNs: 9780444821621 - 0444821627
Access and General Info:
- First Year Published: 1995
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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15Plasma-surface interactions and processing of materials
By NATO Advanced Study Institute on Plasma-Surface Interactions and Processing of Materials (1988 Alicante, Spain)
“Plasma-surface interactions and processing of materials” Metadata:
- Title: ➤ Plasma-surface interactions and processing of materials
- Author: ➤ NATO Advanced Study Institute on Plasma-Surface Interactions and Processing of Materials (1988 Alicante, Spain)
- Language: English
- Number of Pages: Median: 567
- Publisher: ➤ Springer - Kluwer Academic Publishers
- Publish Date: 1990
- Publish Location: Dordrecht - Boston
“Plasma-surface interactions and processing of materials” Subjects and Themes:
- Subjects: ➤ Congresses - Effect of radiation on - Materials - Microelectronics - Plasma etching - Surfaces (Technology) - Materials, effect of radiation on
Edition Identifiers:
- The Open Library ID: OL7806206M - OL2219466M
- Online Computer Library Center (OCLC) ID: 507245714
- Library of Congress Control Number (LCCN): 89048126
- All ISBNs: 0792305841 - 9780792305842
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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16Plasma synthesis and etching of electronic materials
By B. Abeles
“Plasma synthesis and etching of electronic materials” Metadata:
- Title: ➤ Plasma synthesis and etching of electronic materials
- Author: B. Abeles
- Language: English
- Number of Pages: Median: 531
- Publisher: ➤ University of Cambridge ESOL Examinations - Materials Research Society
- Publish Date: 1985 - 2014
- Publish Location: Pittsburgh, Pa
“Plasma synthesis and etching of electronic materials” Subjects and Themes:
- Subjects: ➤ Plasma engineering - Electronics - Materials - Congresses - Plasma etching - Plasma (ionized gases) - Electronics, materials
Edition Identifiers:
- The Open Library ID: OL3022837M - OL29205806M
- Online Computer Library Center (OCLC) ID: 11784552
- Library of Congress Control Number (LCCN): 85003085
- All ISBNs: 9780931837036 - 110740570X - 9781107405707 - 0931837030
Access and General Info:
- First Year Published: 1985
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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17Feature profile evolution in plasma processing using on-wafer monitoring system
By Seiji Samukawa
“Feature profile evolution in plasma processing using on-wafer monitoring system” Metadata:
- Title: ➤ Feature profile evolution in plasma processing using on-wafer monitoring system
- Author: Seiji Samukawa
- Language: English
- Number of Pages: Median: 40
- Publisher: ➤ Springer - Springer London, Limited
- Publish Date: 2014
- Publish Location: Tokyo
“Feature profile evolution in plasma processing using on-wafer monitoring system” Subjects and Themes:
- Subjects: Plasma engineering - Plasma etching - Integrated circuits
Edition Identifiers:
- The Open Library ID: OL31015755M - OL37192726M
- Online Computer Library Center (OCLC) ID: 866932971
- Library of Congress Control Number (LCCN): 2013958143
- All ISBNs: 9784431547945 - 9784431547952 - 4431547940 - 4431547959
Access and General Info:
- First Year Published: 2014
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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18Photon, beam, and plasma stimulated chemical processes at surfaces
By Irving P. Herman
“Photon, beam, and plasma stimulated chemical processes at surfaces” Metadata:
- Title: ➤ Photon, beam, and plasma stimulated chemical processes at surfaces
- Author: Irving P. Herman
- Language: English
- Number of Pages: Median: 838
- Publisher: ➤ Cambridge University Press - University of Cambridge ESOL Examinations - Materials Research Society
- Publish Date: 1987 - 2014
- Publish Location: Pittsburgh, Pa
“Photon, beam, and plasma stimulated chemical processes at surfaces” Subjects and Themes:
- Subjects: ➤ Photon beams - Plasma etching - Industrial applications - Materials - Congresses - Lasers - Surface chemistry - Effect of radiation on - Chemical processes - Materials, effect of radiation on - Lasers, industrial applications - Particle beams
Edition Identifiers:
- The Open Library ID: OL2389341M - OL29205777M
- Online Computer Library Center (OCLC) ID: 16228272
- Library of Congress Control Number (LCCN): 87018554
- All ISBNs: 9780931837418 - 0931837413 - 1107411173 - 9781107411173
Access and General Info:
- First Year Published: 1987
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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19Plasma processing XIII
By Symposium on Plasma Processing (13th 2000 Toronto, Ont.)
“Plasma processing XIII” Metadata:
- Title: Plasma processing XIII
- Author: ➤ Symposium on Plasma Processing (13th 2000 Toronto, Ont.)
- Language: English
- Number of Pages: Median: 394
- Publisher: ➤ Electrochemical Society - Electrochemical Society.
- Publish Date: 2000
- Publish Location: Pennington, New Jersey
“Plasma processing XIII” Subjects and Themes:
- Subjects: Congresses - Semiconductors - Etching - Plasma etching
Edition Identifiers:
- The Open Library ID: OL12163725M - OL22347492M
- All ISBNs: 1566772710 - 9781566772716
Access and General Info:
- First Year Published: 2000
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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20Thin film materials, processes, and reliability
By International Symposium on Thin Film Materials, Processes, and Reliability (2003 Paris, France), G. Mathad, T. Cale and H. Rathore
“Thin film materials, processes, and reliability” Metadata:
- Title: ➤ Thin film materials, processes, and reliability
- Authors: ➤ International Symposium on Thin Film Materials, Processes, and Reliability (2003 Paris, France)G. MathadT. CaleH. Rathore
- Language: English
- Number of Pages: Median: 424
- Publisher: Electrochemical Society
- Publish Date: 2003
- Publish Location: Pennington, NJ
“Thin film materials, processes, and reliability” Subjects and Themes:
- Subjects: ➤ Congresses - Thin film devices - Thin films - Plasma etching - Design and construction - Science/Mathematics
Edition Identifiers:
- The Open Library ID: OL22523464M - OL9851895M
- Library of Congress Control Number (LCCN): 2003109518
- All ISBNs: 9781566773935 - 1566773938
Access and General Info:
- First Year Published: 2003
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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21Plasma Etching Processes for Interconnect Realization in VLSI
By Nicolas Posseme
“Plasma Etching Processes for Interconnect Realization in VLSI” Metadata:
- Title: ➤ Plasma Etching Processes for Interconnect Realization in VLSI
- Author: Nicolas Posseme
- Language: English
- Number of Pages: Median: 128
- Publisher: ➤ Elsevier - Elsevier Science & Technology Books
- Publish Date: 2015
“Plasma Etching Processes for Interconnect Realization in VLSI” Subjects and Themes:
- Subjects: Plasma etching - Sputtering (physics)
Edition Identifiers:
- The Open Library ID: OL35788274M - OL28573477M
- All ISBNs: 1785480154 - 0081005903 - 9780081005903 - 9781785480157
Access and General Info:
- First Year Published: 2015
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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22Plasma processing and synthesis of materials III
By Diran Apelian and Julian Szekely
“Plasma processing and synthesis of materials III” Metadata:
- Title: ➤ Plasma processing and synthesis of materials III
- Authors: Diran ApelianJulian Szekely
- Language: English
- Number of Pages: Median: 367
- Publisher: ➤ Materials Research Society - University of Cambridge ESOL Examinations
- Publish Date: 1991 - 2014
- Publish Location: Pittsburgh, Pa
“Plasma processing and synthesis of materials III” Subjects and Themes:
- Subjects: ➤ Materials - Congresses - Plasma etching - Plasma spraying - Plasma engineering - Electronics - Composite materials - Plasma chemistry - Plasma (ionized gases) - Plasma jets - Electronics, materials
Edition Identifiers:
- The Open Library ID: OL29205866M - OL1532246M
- Online Computer Library Center (OCLC) ID: 23355565
- Library of Congress Control Number (LCCN): 91009864
- All ISBNs: 110741010X - 9781107410107 - 1558990798 - 9781558990791
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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23Low Pressure Plasmas and Microstructuring Technology
By Gerhard Franz
“Low Pressure Plasmas and Microstructuring Technology” Metadata:
- Title: ➤ Low Pressure Plasmas and Microstructuring Technology
- Author: Gerhard Franz
- Language: English
- Number of Pages: Median: 756
- Publisher: ➤ Springer - Springer-Verlag Berlin Heidelberg
- Publish Date: 2009 - 2010
- Publish Location: Berlin, Heidelberg
“Low Pressure Plasmas and Microstructuring Technology” Subjects and Themes:
- Subjects: ➤ Surfaces (Physics) - Molecular structure - Materials - Electronics - Optical materials - Plasma (ionized gases) - Engineering - Plasma etching - Plasma (Ionized gases) - Industrial applications - Plasma engineering - Ionenstrahlbearbeitung - Niederdruckplasma - Hochfrequenzentladung - PECVD-Verfahren - Sputtern - Plasmaätzen - Plasmadiagnostik
Edition Identifiers:
- The Open Library ID: OL28141003M - OL25554441M
- Online Computer Library Center (OCLC) ID: 277069476
- Library of Congress Control Number (LCCN): 2009921817
- All ISBNs: ➤ 9783540858492 - 9783642099397 - 3540858482 - 3540858490 - 9783540858485 - 3642099394
Access and General Info:
- First Year Published: 2009
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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24Dry etching for VLSI
By A. J. van Roosmalen
“Dry etching for VLSI” Metadata:
- Title: Dry etching for VLSI
- Author: A. J. van Roosmalen
- Language: English
- Number of Pages: Median: 237
- Publisher: Springer - Plenum Press
- Publish Date: 1991 - 2013
- Publish Location: New York
“Dry etching for VLSI” Subjects and Themes:
- Subjects: ➤ Design and construction - Etching - Integrated circuits - Plasma etching - Semiconductors - Very large scale integration - Integrated circuits, very large scale integration
Edition Identifiers:
- The Open Library ID: OL37430984M - OL2030047M
- Online Computer Library Center (OCLC) ID: 23142645
- Library of Congress Control Number (LCCN): 91007385
- All ISBNs: 9781489925664 - 148992566X - 0306438356 - 9780306438356
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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25Etching in microsystem technology
By J. M. Köhler
“Etching in microsystem technology” Metadata:
- Title: ➤ Etching in microsystem technology
- Author: J. M. Köhler
- Language: English
- Number of Pages: Median: 368
- Publisher: Wiley-VCH
- Publish Date: 1999
- Publish Location: Weinheim - New York
“Etching in microsystem technology” Subjects and Themes:
- Subjects: Masks (Electronics) - Microlithography - Plasma etching - Microcomputers, design and construction - Computer engineering
Edition Identifiers:
- The Open Library ID: OL112876M
- Online Computer Library Center (OCLC) ID: 40684553
- Library of Congress Control Number (LCCN): 99233639
- All ISBNs: 3527295615 - 9783527295616
Access and General Info:
- First Year Published: 1999
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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26Handbook of plasma processing technology
By Stephen M. Rossnagel, Jerome J. Cuomo and William D. Westwood
“Handbook of plasma processing technology” Metadata:
- Title: ➤ Handbook of plasma processing technology
- Authors: Stephen M. RossnagelJerome J. CuomoWilliam D. Westwood
- Language: English
- Number of Pages: Median: 523
- Publisher: ➤ Elsevier Science & Technology Books - Noyes Publications
- Publish Date: 1990
“Handbook of plasma processing technology” Subjects and Themes:
- Subjects: Plasma engineering - Semiconductors - Etching - Plasma etching
Edition Identifiers:
- The Open Library ID: OL40375596M - OL8048762M
- All ISBNs: 0815512201 - 9780815517641 - 9780815512202 - 0815517645
First Setence:
"The driving force for the rapid development of plasma based processing over the past 15 years has been the microelectronics industry and in particular, the fabrication of silicon integrated circuits."
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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27Introduction to microlithography
By Larry F. Thompson, Murrae J. Bowden and C. Grant Willson
“Introduction to microlithography” Metadata:
- Title: ➤ Introduction to microlithography
- Authors: Larry F. ThompsonMurrae J. BowdenC. Grant Willson
- Language: English
- Number of Pages: Median: 534
- Publisher: ➤ An American Chemical Society Publication - American Chemical Society
- Publish Date: 1994 - 1998
- Publish Location: Washington, DC
“Introduction to microlithography” Subjects and Themes:
- Subjects: ➤ Congresses - Etching - Plasma etching - Photoresists - Semiconductors - Microlithography
Edition Identifiers:
- The Open Library ID: OL8226822M - OL1430612M
- Online Computer Library Center (OCLC) ID: 29359317
- Library of Congress Control Number (LCCN): 93042023
- All ISBNs: 0841228485 - 9780841228481
First Setence:
"The microelectronics revolution has had a profound impact on our technological society over the latter half of the twentieth century in such diverse fields as automobiles, computers and communications, medicine, energy, and home entertainment."
Access and General Info:
- First Year Published: 1994
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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28Plasma Surface Modification of Polymers
By K. L. Mittal
“Plasma Surface Modification of Polymers” Metadata:
- Title: ➤ Plasma Surface Modification of Polymers
- Author: K. L. Mittal
- Language: English
- Number of Pages: Median: 290
- Publisher: Brill Academic Publishers
- Publish Date: 1994
“Plasma Surface Modification of Polymers” Subjects and Themes:
- Subjects: ➤ Polymers, surfaces - Plasma etching - Adhesion - Surface chemistry - Plasma chemistry - Surfaces (technology) - Polymers - Surfaces - Analysis - Polymères - Gravure par plasma - Adhésion (Physique) - Chimie des surfaces - Plasmachimie - Surfaces (Technologie) - Analyse - Oberflächenbehandlung - Plasma - Polymere - Technique des plasmas - Adhésion - Plasma polymerization
Edition Identifiers:
- The Open Library ID: OL9412820M
- Online Computer Library Center (OCLC) ID: 32335304 - 648345015
- All ISBNs: 9789067641647 - 9067641642
Access and General Info:
- First Year Published: 1994
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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29Proceedings of the Tenth Symposium on Plasma Processing
By G. S. Mathad
“Proceedings of the Tenth Symposium on Plasma Processing” Metadata:
- Title: ➤ Proceedings of the Tenth Symposium on Plasma Processing
- Author: G. S. Mathad
- Language: English
- Number of Pages: Median: 620
- Publisher: ➤ Electrochemical Society, Incorporated
- Publish Date: 1994
“Proceedings of the Tenth Symposium on Plasma Processing” Subjects and Themes:
- Subjects: Semiconductors - Etching - Congresses - Plasma etching
Edition Identifiers:
- The Open Library ID: OL12163703M
- Online Computer Library Center (OCLC) ID: 31600223
- Library of Congress Control Number (LCCN): 94070852
- All ISBNs: 1566770777 - 9781566770774
Access and General Info:
- First Year Published: 1994
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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30Plasma Processing/proceedings on Symposium 11th/1996 (Proceedings (Electrochemical Society))
By Electrochemical Society.
“Plasma Processing/proceedings on Symposium 11th/1996 (Proceedings (Electrochemical Society))” Metadata:
- Title: ➤ Plasma Processing/proceedings on Symposium 11th/1996 (Proceedings (Electrochemical Society))
- Author: Electrochemical Society.
- Language: English
- Number of Pages: Median: 720
- Publisher: Electrochemical Society
- Publish Date: 1996
“Plasma Processing/proceedings on Symposium 11th/1996 (Proceedings (Electrochemical Society))” Subjects and Themes:
- Subjects: Semiconductors - Etching - Congresses - Plasma etching
Edition Identifiers:
- The Open Library ID: OL12163710M
- Online Computer Library Center (OCLC) ID: 36213373
- All ISBNs: 1566771641 - 9781566771641
Access and General Info:
- First Year Published: 1996
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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31Plasma processing
By Symposium on Plasma Etching and Deposition (1980 Hollywood, Fla.)
“Plasma processing” Metadata:
- Title: Plasma processing
- Author: ➤ Symposium on Plasma Etching and Deposition (1980 Hollywood, Fla.)
- Language: English
- Number of Pages: Median: 336
- Publisher: Electrochemical Society
- Publish Date: 1981
- Publish Location: ➤ Pennington, NJ (10 South Main St., Pennington 08534)
“Plasma processing” Subjects and Themes:
- Subjects: Congresses - Etching - Plasma etching - Semiconductors
Edition Identifiers:
- The Open Library ID: OL3788125M
- Library of Congress Control Number (LCCN): 81065237
Access and General Info:
- First Year Published: 1981
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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32Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control
By Symposium on Highly Selective Dry Etching and Damage Control (1993 Honolulu, Hawaii)
“Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control” Metadata:
- Title: ➤ Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control
- Author: ➤ Symposium on Highly Selective Dry Etching and Damage Control (1993 Honolulu, Hawaii)
- Language: English
- Number of Pages: Median: 438
- Publisher: Electrochemical Society
- Publish Date: 1993
- Publish Location: Pennington, NJ
“Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control” Subjects and Themes:
- Subjects: Congresses - Etching - Plasma etching - Semiconductors
Edition Identifiers:
- The Open Library ID: OL1439288M
- Online Computer Library Center (OCLC) ID: 30347131
- Library of Congress Control Number (LCCN): 93070068
- All ISBNs: 9781566770668 - 1566770661
Access and General Info:
- First Year Published: 1993
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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33Plasma assisted processes for microelectronic applications
By Claes Nender
“Plasma assisted processes for microelectronic applications” Metadata:
- Title: ➤ Plasma assisted processes for microelectronic applications
- Author: Claes Nender
- Language: English
- Number of Pages: Median: 21
- Publisher: Uppsala Universitet
- Publish Date: 1988
- Publish Location: Uppsala
“Plasma assisted processes for microelectronic applications” Subjects and Themes:
- Subjects: Plasma etching - Plasma engineering - Microelectronics
Edition Identifiers:
- The Open Library ID: OL53572432M
- Online Computer Library Center (OCLC) ID: 19470321
- All ISBNs: 9155421997 - 9789155421991
Access and General Info:
- First Year Published: 1988
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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34Laser-assisted plasma etching
By William Martin Holber
“Laser-assisted plasma etching” Metadata:
- Title: Laser-assisted plasma etching
- Author: William Martin Holber
- Language: English
- Number of Pages: Median: 152
- Publish Date: 1987
“Laser-assisted plasma etching” Subjects and Themes:
- Subjects: Plasma etching - Lasers in plasma research
Edition Identifiers:
- The Open Library ID: OL52809903M
- Online Computer Library Center (OCLC) ID: 506323005 - 83628779
Access and General Info:
- First Year Published: 1987
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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35Proceedings of the Eighth Symposium on Plasma Processing
By Québec) Symposium on Plasma Processing (8th 1990 Montréal
“Proceedings of the Eighth Symposium on Plasma Processing” Metadata:
- Title: ➤ Proceedings of the Eighth Symposium on Plasma Processing
- Author: ➤ Québec) Symposium on Plasma Processing (8th 1990 Montréal
- Language: English
- Number of Pages: Median: 787
- Publisher: Electrochemical Society
- Publish Date: 1990
- Publish Location: ➤ Pennington, NJ (10 S. Main St., Pennington 08534-2896)
“Proceedings of the Eighth Symposium on Plasma Processing” Subjects and Themes:
- Subjects: Semiconductors - Etching - Congresses - Plasma etching
Edition Identifiers:
- The Open Library ID: OL52670609M
- Online Computer Library Center (OCLC) ID: 22663840
- Library of Congress Control Number (LCCN): 90084188
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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36Proceedings of the Ninth Symposium on Plasma Processing
By Mo.) Symposium on Plasma Processing (9th 1992 Saint Louis
“Proceedings of the Ninth Symposium on Plasma Processing” Metadata:
- Title: ➤ Proceedings of the Ninth Symposium on Plasma Processing
- Author: ➤ Mo.) Symposium on Plasma Processing (9th 1992 Saint Louis
- Language: English
- Number of Pages: Median: 654
- Publisher: Electrochemical Society
- Publish Date: 1992
- Publish Location: Pennington, NJ
“Proceedings of the Ninth Symposium on Plasma Processing” Subjects and Themes:
- Subjects: Semiconductors - Etching - Congresses - Plasma etching
Edition Identifiers:
- The Open Library ID: OL52784487M
- Online Computer Library Center (OCLC) ID: 26886559
- Library of Congress Control Number (LCCN): 92082777
- All ISBNs: 1566770203 - 9781566770200
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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37Oberflächentechnologie mit Niederdruckplasmen
By Franz, Gerhard Dr. rer. nat.
“Oberflächentechnologie mit Niederdruckplasmen” Metadata:
- Title: ➤ Oberflächentechnologie mit Niederdruckplasmen
- Author: Franz, Gerhard Dr. rer. nat.
- Language: ger
- Number of Pages: Median: 434
- Publisher: Springer-Verlag
- Publish Date: 1994
- Publish Location: New York - Berlin
“Oberflächentechnologie mit Niederdruckplasmen” Subjects and Themes:
- Subjects: Industrial applications - Low temperature plasmas - Plasma (Ionized gases) - Plasma engineering - Plasma etching
Edition Identifiers:
- The Open Library ID: OL1236921M
- Library of Congress Control Number (LCCN): 94240497
- All ISBNs: 3540573607 - 0387573607 - 9783540573609 - 9780387573601
Access and General Info:
- First Year Published: 1994
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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38Kalte Plasmen
By Franz, Gerhard Dr. rer. nat.
“Kalte Plasmen” Metadata:
- Title: Kalte Plasmen
- Author: Franz, Gerhard Dr. rer. nat.
- Language: ger
- Number of Pages: Median: 297
- Publisher: Springer-Verlag
- Publish Date: 1990
- Publish Location: New York - Berlin
“Kalte Plasmen” Subjects and Themes:
- Subjects: Industrial applications - Low temperature plasmas - Plasma (Ionized gases) - Plasma engineering - Plasma etching
Edition Identifiers:
- The Open Library ID: OL1601291M
- Library of Congress Control Number (LCCN): 91136472
- All ISBNs: 0387531602 - 9780387531601
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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39Ion bombardment and ion-assisted etching in rf discharges
By Albert Manenschijn
“Ion bombardment and ion-assisted etching in rf discharges” Metadata:
- Title: ➤ Ion bombardment and ion-assisted etching in rf discharges
- Author: Albert Manenschijn
- Language: English
- Number of Pages: Median: 147
- Publisher: Technische Universiteit Delft
- Publish Date: 1991
- Publish Location: Delft, Netherlands
“Ion bombardment and ion-assisted etching in rf discharges” Subjects and Themes:
- Subjects: Etching - Ion bombardment - Plasma etching
Edition Identifiers:
- The Open Library ID: OL50087113M
- Online Computer Library Center (OCLC) ID: 27927680
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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40Proceedings of the Symposium on Dry Process
By Symposium on Dry Process (9th 1987 Honolulu, Hawaii)
“Proceedings of the Symposium on Dry Process” Metadata:
- Title: ➤ Proceedings of the Symposium on Dry Process
- Author: ➤ Symposium on Dry Process (9th 1987 Honolulu, Hawaii)
- Language: English
- Number of Pages: Median: 347
- Publisher: Electrochemical Society
- Publish Date: 1988
- Publish Location: ➤ Pennington, NJ (10 S. Main St., Pennington 08534-2896)
“Proceedings of the Symposium on Dry Process” Subjects and Themes:
- Subjects: ➤ Congresses - Design and construction - Integrated circuits - Plasma etching - Semiconductors - Vapor-plating - Very large scale integration
Edition Identifiers:
- The Open Library ID: OL2068531M
- Online Computer Library Center (OCLC) ID: 19850650
- Library of Congress Control Number (LCCN): 88080690
Access and General Info:
- First Year Published: 1988
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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41Plazmennoe anodirovanie
By V. P. Parkhutik
“Plazmennoe anodirovanie” Metadata:
- Title: Plazmennoe anodirovanie
- Author: V. P. Parkhutik
- Language: rus
- Number of Pages: Median: 279
- Publisher: "Navuka i tėkhnika"
- Publish Date: 1990
- Publish Location: Minsk
“Plazmennoe anodirovanie” Subjects and Themes:
- Subjects: Microelectronics - Plasma etching
Edition Identifiers:
- The Open Library ID: OL1902840M
- Online Computer Library Center (OCLC) ID: 25318493
- Library of Congress Control Number (LCCN): 90104599
- All ISBNs: 9785343005226 - 5343005225
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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42Plasma etching in semiconductor fabrication
By Russ A. Morgan
“Plasma etching in semiconductor fabrication” Metadata:
- Title: ➤ Plasma etching in semiconductor fabrication
- Author: Russ A. Morgan
- Language: English
- Number of Pages: Median: 316
- Publisher: Elsevier
- Publish Date: 1985
- Publish Location: New York - Amsterdam
“Plasma etching in semiconductor fabrication” Subjects and Themes:
- Subjects: Etching - Plasma etching - Semiconductors
Edition Identifiers:
- The Open Library ID: OL3024088M
- Online Computer Library Center (OCLC) ID: 11784503
- Library of Congress Control Number (LCCN): 85004392
- All ISBNs: 9780444424198 - 0444424199
Access and General Info:
- First Year Published: 1985
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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43Studies of thin film plasma processes for microelectronic device manufacturing
By Anna M. Barklund
“Studies of thin film plasma processes for microelectronic device manufacturing” Metadata:
- Title: ➤ Studies of thin film plasma processes for microelectronic device manufacturing
- Author: Anna M. Barklund
- Language: English
- Number of Pages: Median: 43
- Publisher: ➤ Distributor, Almqvist & Wiksell International - Uppsala University
- Publish Date: 1992
- Publish Location: Uppsala - Stockholm, Sweden
“Studies of thin film plasma processes for microelectronic device manufacturing” Subjects and Themes:
- Subjects: ➤ Plasma etching - Vapor-plating - Thin films - Microelectronics - Semiconductors - Etching - Semiconductor doping
Edition Identifiers:
- The Open Library ID: OL57028558M
- Online Computer Library Center (OCLC) ID: 28002939
- All ISBNs: 9789155429942 - 9155429947
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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44Comptes rendus des travaux du CIP G87
By International Colloquium on Plasmas and Sputtering (6th 1987 Antibes, France)
“Comptes rendus des travaux du CIP G87” Metadata:
- Title: ➤ Comptes rendus des travaux du CIP G87
- Author: ➤ International Colloquium on Plasmas and Sputtering (6th 1987 Antibes, France)
- Language: English
- Number of Pages: Median: 280
- Publisher: Société française du vide
- Publish Date: 1987
- Publish Location: Paris
“Comptes rendus des travaux du CIP G87” Subjects and Themes:
- Subjects: ➤ Cathode sputtering (Plating process) - Congresses - Microelectronics - Plasma etching - Thin films
Edition Identifiers:
- The Open Library ID: OL1955125M
- Library of Congress Control Number (LCCN): 90183143
Access and General Info:
- First Year Published: 1987
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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45Modeling, simulation and experimental studies of plasma processing
By Christer Hedlund
“Modeling, simulation and experimental studies of plasma processing” Metadata:
- Title: ➤ Modeling, simulation and experimental studies of plasma processing
- Author: Christer Hedlund
- Language: English
- Number of Pages: Median: 48
- Publisher: Acta Universitatis Upsaliensis
- Publish Date: 1997
- Publish Location: Uppsala
“Modeling, simulation and experimental studies of plasma processing” Subjects and Themes:
- Subjects: Plasma etching - Semiconductors - Etching
Edition Identifiers:
- The Open Library ID: OL57142919M
- Online Computer Library Center (OCLC) ID: 41136677
- All ISBNs: 9155439225 - 9789155439224
Access and General Info:
- First Year Published: 1997
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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46Dry etching for microelectronics
By Ronald A. Powell
“Dry etching for microelectronics” Metadata:
- Title: ➤ Dry etching for microelectronics
- Author: Ronald A. Powell
- Language: English
- Number of Pages: Median: 299
- Publisher: ➤ Distributors for the USA and Canada, Elsevier Science Pub. Co. - North-Holland Physics Pub.
- Publish Date: 1984
- Publish Location: ➤ Amsterdam - New York - New York, N.Y
“Dry etching for microelectronics” Subjects and Themes:
- Subjects: Semiconductors - Etching - Plasma etching
Edition Identifiers:
- The Open Library ID: OL2839348M
- Online Computer Library Center (OCLC) ID: 10913832
- Library of Congress Control Number (LCCN): 84001145
- All ISBNs: 9780444869050 - 0444869050
Access and General Info:
- First Year Published: 1984
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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47Die Glimmentladung in perfluorierten Gasen zum Plasmaätzen und zur Schichtabscheidung
“Die Glimmentladung in perfluorierten Gasen zum Plasmaätzen und zur Schichtabscheidung” Metadata:
- Title: ➤ Die Glimmentladung in perfluorierten Gasen zum Plasmaätzen und zur Schichtabscheidung
- Language: ger
- Number of Pages: Median: 73
- Publisher: ➤ Technische Hochschule Karl-Marx-Stadt, Sektion Physik/Elektronische Bauelemente
- Publish Date: 1985
- Publish Location: [Karl-Marx-Stadt]
“Die Glimmentladung in perfluorierten Gasen zum Plasmaätzen und zur Schichtabscheidung” Subjects and Themes:
- Subjects: Plasma engineering - Plasma etching - Plasma electrodynamics
Edition Identifiers:
- The Open Library ID: OL2776898M
- Library of Congress Control Number (LCCN): 86139805
Access and General Info:
- First Year Published: 1985
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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48Advanced Etch Technology for Nanopatterning VI
By Sebastian Engelmann
“Advanced Etch Technology for Nanopatterning VI” Metadata:
- Title: ➤ Advanced Etch Technology for Nanopatterning VI
- Author: Sebastian Engelmann
- Language: English
- Number of Pages: Median: 196
- Publisher: SPIE
- Publish Date: 2018
“Advanced Etch Technology for Nanopatterning VI” Subjects and Themes:
- Subjects: Plasma etching - Semiconductors - Nanotechnology
Edition Identifiers:
- The Open Library ID: OL30593169M
- All ISBNs: 1510607498 - 9781510607491
Access and General Info:
- First Year Published: 2018
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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49Advanced etch technology for nanopatterning
By Ying Zhang, G. S. Oehrlein and Qinghuang Lin
“Advanced etch technology for nanopatterning” Metadata:
- Title: ➤ Advanced etch technology for nanopatterning
- Authors: Ying ZhangG. S. OehrleinQinghuang Lin
- Language: English
- Publisher: SPIE
- Publish Date: 2012
- Publish Location: Bellingham, Wash
“Advanced etch technology for nanopatterning” Subjects and Themes:
- Subjects: Lithography - Congresses - Plasma etching
Edition Identifiers:
- The Open Library ID: OL30733352M
- Online Computer Library Center (OCLC) ID: 797974369
- Library of Congress Control Number (LCCN): 2012471867
- All ISBNs: 9780819489845 - 0819489840
Access and General Info:
- First Year Published: 2012
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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50In-Situ Patterning : : Volume 158
By Anthony F. Bernhardt, Jerry G. Black and Robert Rosenberg
“In-Situ Patterning : : Volume 158” Metadata:
- Title: ➤ In-Situ Patterning : : Volume 158
- Authors: Anthony F. BernhardtJerry G. BlackRobert Rosenberg
- Language: English
- Number of Pages: Median: 520
- Publisher: ➤ University of Cambridge ESOL Examinations
- Publish Date: 2014
“In-Situ Patterning : : Volume 158” Subjects and Themes:
- Subjects: ➤ Semiconductors - Lasers, industrial applications - Plasma etching
Edition Identifiers:
- The Open Library ID: OL29205812M
- All ISBNs: 9781107410350 - 1107410355
Access and General Info:
- First Year Published: 2014
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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