Explore: Photoresists
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AI-Generated Overview About “photoresists”:
Books Results
Source: The Open Library
The Open Library Search Results
Search results from The Open Library
1Optical Laser Microlithography VIII
By Brunner
“Optical Laser Microlithography VIII” Metadata:
- Title: ➤ Optical Laser Microlithography VIII
- Author: Brunner
- Language: English
- Number of Pages: Median: 948
- Publisher: ➤ SPIE - Society of Photo Optical
- Publish Date: 1995
- Publish Location: Bellingham, Wash
“Optical Laser Microlithography VIII” Subjects and Themes:
- Subjects: ➤ Computer simulation - Congresses - Photoresists - Masks (Electronics) - Microlithography - Lenses - Design and construction
Edition Identifiers:
- The Open Library ID: OL15376058M - OL11392955M
- Online Computer Library Center (OCLC) ID: 32689495
- Library of Congress Control Number (LCCN): 94069903
- All ISBNs: 9780819417886 - 0819417882
Access and General Info:
- First Year Published: 1995
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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2Photoresist
By William S. DeForest
“Photoresist” Metadata:
- Title: Photoresist
- Author: William S. DeForest
- Language: English
- Number of Pages: Median: 269
- Publisher: McGraw-Hill
- Publish Date: 1975
- Publish Location: New York
“Photoresist” Subjects and Themes:
- Subjects: Integrated circuits - Photoresists - Printed circuits
Edition Identifiers:
- The Open Library ID: OL5057476M
- Online Computer Library Center (OCLC) ID: 1054407
- Library of Congress Control Number (LCCN): 74020636
- All ISBNs: 0070162301 - 9780070162303
Access and General Info:
- First Year Published: 1975
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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3Microlithography
By David J. Elliott
“Microlithography” Metadata:
- Title: Microlithography
- Author: David J. Elliott
- Language: English
- Number of Pages: Median: 378
- Publisher: McGraw-Hill
- Publish Date: 1986
- Publish Location: New York
“Microlithography” Subjects and Themes:
- Subjects: ➤ Very large scale integration - Design and construction - Microlithography - Integrated circuits - Photoresists - Integrated circuits -- Very large scale integration -- Design and construction
Edition Identifiers:
- The Open Library ID: OL2537323M
- Online Computer Library Center (OCLC) ID: 12418734
- Library of Congress Control Number (LCCN): 85018196
- All ISBNs: 0070193045 - 9780070193048
Access and General Info:
- First Year Published: 1986
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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4Advances in resist technology and processing XXI
By John L. Sturtevant
“Advances in resist technology and processing XXI” Metadata:
- Title: ➤ Advances in resist technology and processing XXI
- Author: John L. Sturtevant
- Language: English
- Number of Pages: Median: 1288
- Publisher: SPIE
- Publish Date: 2004
- Publish Location: Bellingham, Wash., USA
“Advances in resist technology and processing XXI” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography
Edition Identifiers:
- The Open Library ID: OL3328468M
- Online Computer Library Center (OCLC) ID: 55686086
- Library of Congress Control Number (LCCN): 2004303191
- All ISBNs: 9780819452894 - 0819452890
Access and General Info:
- First Year Published: 2004
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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5Photopolymers
By Kenichiro Nakamura
“Photopolymers” Metadata:
- Title: Photopolymers
- Author: Kenichiro Nakamura
- Language: English
- Number of Pages: Median: 189
- Publisher: ➤ CRC Press - Taylor & Francis Group
- Publish Date: 2014 - 2018
“Photopolymers” Subjects and Themes:
- Subjects: ➤ Photopolymers - Polymerization - Microelectronics - Photoresists - Photopolymerization - Industrial applications - Materials - SCIENCE / Chemistry / Industrial & Technical - TECHNOLOGY & ENGINEERING / Lasers & Photonics - TECHNOLOGY & ENGINEERING / Material Science - Microélectronique - Matériaux - Photopolymérisation - Photopolymères - Applications industrielles - Résines photosensibles - TECHNOLOGY & ENGINEERING - Engineering (General) - Reference
Edition Identifiers:
- The Open Library ID: ➤ OL29812253M - OL33526538M - OL29230265M - OL29812250M - OL29407732M - OL28769124M
- Online Computer Library Center (OCLC) ID: 884012539
- Library of Congress Control Number (LCCN): 2014006188
- All ISBNs: ➤ 9781466517318 - 9781351832229 - 9781315216331 - 1351823531 - 9781466517288 - 146651731X - 146651728X - 1322633053 - 9781351823531 - 1351832220 - 1315216337 - 9781322633053
Access and General Info:
- First Year Published: 2014
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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6Advances in Resist Technology and Processing VII
By Michael P. C. Watts
“Advances in Resist Technology and Processing VII” Metadata:
- Title: ➤ Advances in Resist Technology and Processing VII
- Author: Michael P. C. Watts
- Language: English
- Number of Pages: Median: 595
- Publisher: ➤ SPIE - Society of Photo Optical
- Publish Date: 1990
- Publish Location: Bellingham, Wash., USA
“Advances in Resist Technology and Processing VII” Subjects and Themes:
- Subjects: Congresses - Photoresistors - Photoconductivity - Photolithography - Photoresists
Edition Identifiers:
- The Open Library ID: OL19018730M - OL11392659M - OL19567347M
- Online Computer Library Center (OCLC) ID: 508158024 - 22188466
- Library of Congress Control Number (LCCN): 90060892
- All ISBNs: 0819403091 - 9780819403094
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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7Advances in Resist Technology and Processing VIII
By Hiroshi Ito
“Advances in Resist Technology and Processing VIII” Metadata:
- Title: ➤ Advances in Resist Technology and Processing VIII
- Author: Hiroshi Ito
- Language: English
- Number of Pages: Median: 679
- Publisher: ➤ SPIE - SPIE-International Society for Optical Engine
- Publish Date: 1991
- Publish Location: Bellingham, Wash., USA
“Advances in Resist Technology and Processing VIII” Subjects and Themes:
- Subjects: Photoresists - Congresses - Photolithography - Photoresistors
Edition Identifiers:
- The Open Library ID: OL11392712M - OL19567406M - OL19018807M
- Online Computer Library Center (OCLC) ID: 24150723
- Library of Congress Control Number (LCCN): 91061057
- All ISBNs: 0819405655 - 9780819405654
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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8Advances in Resist Technology and Processing IX
By Anthony E. Novembre
“Advances in Resist Technology and Processing IX” Metadata:
- Title: ➤ Advances in Resist Technology and Processing IX
- Author: Anthony E. Novembre
- Language: English
- Number of Pages: Median: 684
- Publisher: ➤ SPIE--the International Society for Optical Engineering - SPIE - SPIE-International Society for Optical Engine
- Publish Date: 1992 - 1993
- Publish Location: Bellingham, Wash., USA
“Advances in Resist Technology and Processing IX” Subjects and Themes:
- Subjects: Photoresists - Congresses - Photoresistors - Strength of materials
Edition Identifiers:
- The Open Library ID: OL11392772M - OL19567474M - OL19567582M
- Online Computer Library Center (OCLC) ID: 28985230 - 29380105
- Library of Congress Control Number (LCCN): 91061057
- All ISBNs: 9780819408273 - 0819408271
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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9Advance in Resist Technology and Processing XIII
By Roderick R. Kunz
“Advance in Resist Technology and Processing XIII” Metadata:
- Title: ➤ Advance in Resist Technology and Processing XIII
- Author: Roderick R. Kunz
- Language: English
- Number of Pages: Median: 774
- Publisher: ➤ International Society for Optical Engineering - SPIE Society of Photo-Optical Instrumentation Engi - Society of Photo-Optical Instrumentation Engineers (SPIE)
- Publish Date: 1996 - 1997
- Publish Location: Bellingham, Wash., USA
“Advance in Resist Technology and Processing XIII” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography
Edition Identifiers:
- The Open Library ID: OL19567846M - OL20738182M - OL11392986M
- Online Computer Library Center (OCLC) ID: 35108651
- Library of Congress Control Number (LCCN): 91061057
- All ISBNs: 0819421006 - 9780819421005
Access and General Info:
- First Year Published: 1996
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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10Advances in Resist Technology and Processing, IV
By Murrae J. Bowden
“Advances in Resist Technology and Processing, IV” Metadata:
- Title: ➤ Advances in Resist Technology and Processing, IV
- Author: Murrae J. Bowden
- Language: English
- Number of Pages: Median: 367
- Publisher: ➤ Society of Photo Optical - SPIE--the International Society for Optical Engineering
- Publish Date: 1987
- Publish Location: Bellingham, Wash., USA
“Advances in Resist Technology and Processing, IV” Subjects and Themes:
- Subjects: Photoresists - Congresses
Edition Identifiers:
- The Open Library ID: OL17918342M - OL11299119M
- Online Computer Library Center (OCLC) ID: 18380883
- Library of Congress Control Number (LCCN): 87060739
- All ISBNs: 0892528060 - 9780892528066
Access and General Info:
- First Year Published: 1987
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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11Advances in Resist Technology and Processing XV
By Will Conley
“Advances in Resist Technology and Processing XV” Metadata:
- Title: ➤ Advances in Resist Technology and Processing XV
- Author: Will Conley
- Language: English
- Number of Pages: Median: 1482
- Publisher: ➤ SPIE - SPIE-International Society for Optical Engine
- Publish Date: 1998
- Publish Location: Bellingham, Washington
“Advances in Resist Technology and Processing XV” Subjects and Themes:
- Subjects: Photoresists - Congresses - Strength of materials - Electric resistance - Optics
Edition Identifiers:
- The Open Library ID: OL19567999M - OL11393073M
- Online Computer Library Center (OCLC) ID: 39634674
- All ISBNs: 9780819427786 - 0819427780
Access and General Info:
- First Year Published: 1998
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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12Microlithography 1999: Advances in Resist Technology and Processing XVI
By Will Conley
“Microlithography 1999: Advances in Resist Technology and Processing XVI” Metadata:
- Title: ➤ Microlithography 1999: Advances in Resist Technology and Processing XVI
- Author: Will Conley
- Language: English
- Number of Pages: Median: 1402
- Publisher: ➤ SPIE - Society of Photo Optical
- Publish Date: 1999
- Publish Location: Bellingham, Wash
“Microlithography 1999: Advances in Resist Technology and Processing XVI” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography - Optics
Edition Identifiers:
- The Open Library ID: OL11393142M - OL19568077M
- Online Computer Library Center (OCLC) ID: 41792054
- All ISBNs: 0819431524 - 9780819431523
Access and General Info:
- First Year Published: 1999
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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13Advances in Resist Technology and Processing XVII (Advances in Resist Technology & Processing)
By Francis M. Houlihan
“Advances in Resist Technology and Processing XVII (Advances in Resist Technology & Processing)” Metadata:
- Title: ➤ Advances in Resist Technology and Processing XVII (Advances in Resist Technology & Processing)
- Author: Francis M. Houlihan
- Language: English
- Number of Pages: Median: 1252
- Publisher: ➤ SPIE - SPIE-International Society for Optical Engine
- Publish Date: 2000
- Publish Location: Bellingham, Washington
“Advances in Resist Technology and Processing XVII (Advances in Resist Technology & Processing)” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography - Optoelectronics
Edition Identifiers:
- The Open Library ID: OL19568161M - OL11393209M
- Online Computer Library Center (OCLC) ID: 44601328
- All ISBNs: 0819436178 - 9780819436177
Access and General Info:
- First Year Published: 2000
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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14Semiconductor Lithography
By Wayne M. Moreau
“Semiconductor Lithography” Metadata:
- Title: Semiconductor Lithography
- Author: Wayne M. Moreau
- Language: English
- Number of Pages: Median: 942
- Publisher: Springer - Plenum Press
- Publish Date: 1987 - 1988
- Publish Location: New York
“Semiconductor Lithography” Subjects and Themes:
- Subjects: Microlithography - Photoresists - Semiconductors
Edition Identifiers:
- The Open Library ID: OL10323677M - OL2399079M
- Online Computer Library Center (OCLC) ID: 16871199
- Library of Congress Control Number (LCCN): 87029077
- All ISBNs: 9780306421853 - 0306421852
Access and General Info:
- First Year Published: 1987
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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15Interface '81
By Eastman Kodak Company
“Interface '81” Metadata:
- Title: Interface '81
- Author: Eastman Kodak Company
- Language: English
- Number of Pages: Median: 117
- Publisher: ➤ Graphics Market Division, Eastman Kodak Co. - Graphics Market Division, Eastman Kodak Co
- Publish Date: 1982
- Publish Location: Rochester, N.Y
“Interface '81” Subjects and Themes:
- Subjects: Congresses - Microelectronics - Photolithography - Photoresists
Edition Identifiers:
- The Open Library ID: OL3105084M - OL8131463M
- Library of Congress Control Number (LCCN): 82211551
- All ISBNs: 0879853077 - 9780879853075
Author's Alternative Names:
"Eastman Kodak Company staff", "Eastman Kodak.", "Kodak.", "Eastman Kodak Company. Radiography Markets Division.", "Kodak EKTA FF", "Eastman Kodak Company. Medical Division", "Canadian Kodak Company.", "Eastman Kodak Company. Graphics Markets Division.", "Kodak Limited.", "Kodak Microelectronics Seminar (1977 Monterey, Calif.)", "KODAK LIMITED.", "Kodak Microelectronics Seminar (1981 Dallas, Tex.)", "The Eastman Kodak Company", "Kodak Ekta AF-1", "Eastman Kodak Staff", "Eastman Kodak Editors", "Kodak Unknown", "Canadian Kodak Company", "Eastman Kodak Company. X-ray Division", "Eastman Kodak Co.", "Kodak Eastman", "Eastman Kodak Company. Professional and Finishing Markets Division.", "Eastman Kodak Company. Motion Picture and Audiovisual Markets Division", "Kodak", "Eastman Kodak Company. Medical Division.", "Eastman Kodak Company. Research Laboratory.", "Eastman Kodak Company. Professional, Commercial, and Industrial Markets Division.", "KODAK.", "Eastman Kodak Company. U.S. Apparatus Division.", "Kodak Limited. Medical Sales Division.", "Eastman Kodak Company. X-ray Division.", "Eastman Kodak Company. Distillation Products Industries.", "Eastman Kodak Company. Motion Picture and Education Markets Division", "Kodak (Firm)", "Kodak. Museum.", "Eastman Kodak Company. Graphic Arts Division.", "Eastman Kodak, Co.", "Eastman Kodak Company.", "Eastman Kodak", "Eastman Kodak Company. Consumer Markets Division.", "Kodak Carousel 4600", "Eastman Kodak Company. professional and Finishing Markets Division.", "Eastman Kodak Co", "EASTMAN KODAK COMPANY.", "Eastman Kodak Company, Rochester, N.Y. Kodak Research Laboratories.", "Eastman Kodak Company. X-ray Sales Division.", "EASTMAN KODAK.", "Eastman Kodak Company. Motion Picture Film Dept.", "KODAK", "Eastman Kodak Company. Motion Picture and Audiovisual Markets Division.", "Kodak Seminar : Aerial Photography as a Planning Tool (1973 Rochester and Ithaca, N.Y.)", "eastman kodak co.", "Eastman Kodak Company. Advertising Information Service.", "Eastman Kodak Company. Professional, Commercial and Industrial Markets Division.", "Eastman Kodak Company Staff", "Eastman Kodak Company. Professional Photography Division",Access and General Info:
- First Year Published: 1982
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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16Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI
By International Symposium on Patterning Science and Technology (2nd 1991 Phoenix, Ariz.)
“Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI” Metadata:
- Title: ➤ Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI
- Author: ➤ International Symposium on Patterning Science and Technology (2nd 1991 Phoenix, Ariz.)
- Language: English
- Number of Pages: Median: 382
- Publisher: Electrochemical Society
- Publish Date: 1992
- Publish Location: Pennington, NJ
“Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI” Subjects and Themes:
- Subjects: ➤ Congresses - Design and construction - Integrated circuits - Lithography - Metallizing - Microelectronic packaging - Ultra large scale integration - Microelectronics - Microlithography - Photoresists - Masks (Electronics) - Large scale integration
Edition Identifiers:
- The Open Library ID: OL8670964M - OL1749210M
- Online Computer Library Center (OCLC) ID: 502605458
- Library of Congress Control Number (LCCN): 92071002
- All ISBNs: 9781566770071 - 1566770076
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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17Advances in resist technology and processing V
“Advances in resist technology and processing V” Metadata:
- Title: ➤ Advances in resist technology and processing V
- Language: English
- Number of Pages: Median: 449
- Publisher: ➤ Society of Photo Optical - International Society for Optical Engineering
- Publish Date: 1988
- Publish Location: Bellingham, Wash., USA
“Advances in resist technology and processing V” Subjects and Themes:
- Subjects: Photoresists - Congresses
Edition Identifiers:
- The Open Library ID: OL21124195M - OL11299149M
- Online Computer Library Center (OCLC) ID: 18524599
- Library of Congress Control Number (LCCN): 88060780
- All ISBNs: 0892529555 - 9780892529551
Access and General Info:
- First Year Published: 1988
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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18Advances in resist materials and processing technology XXIV
By Qinghuang Lin
“Advances in resist materials and processing technology XXIV” Metadata:
- Title: ➤ Advances in resist materials and processing technology XXIV
- Author: Qinghuang Lin
- Language: English
- Number of Pages: Median: 1348
- Publisher: ➤ SPIE - Society of Photo Optical
- Publish Date: 2007
- Publish Location: Bellingham, Wash
“Advances in resist materials and processing technology XXIV” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography
Edition Identifiers:
- The Open Library ID: OL24063277M - OL23945578M
- Library of Congress Control Number (LCCN): 2009284505
- All ISBNs: 9780819466389 - 0819466387
Access and General Info:
- First Year Published: 2007
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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19Dry film photoresist from Japan
By United States International Trade Commission
“Dry film photoresist from Japan” Metadata:
- Title: ➤ Dry film photoresist from Japan
- Author: ➤ United States International Trade Commission
- Language: English
- Publisher: ➤ U.S. International Trade Commission
- Publish Date: 1992 - 1993
- Publish Location: Washington, DC
“Dry film photoresist from Japan” Subjects and Themes:
- Subjects: Microelectronics industry - Photoresists - Materials - Printed circuits
- Places: United States - Japan
Edition Identifiers:
- The Open Library ID: OL14989910M - OL14989901M
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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20Advances in Resist Technology and Processing VI
By Elsa Reichmanis
“Advances in Resist Technology and Processing VI” Metadata:
- Title: ➤ Advances in Resist Technology and Processing VI
- Author: Elsa Reichmanis
- Language: English
- Number of Pages: Median: 620
- Publisher: ➤ Society of Photo Optical - International Society for Optical Engineering
- Publish Date: 1989
- Publish Location: Bellingham, Wash
“Advances in Resist Technology and Processing VI” Subjects and Themes:
- Subjects: Photoresists - Congresses
Edition Identifiers:
- The Open Library ID: OL11392592M - OL19526937M
- Online Computer Library Center (OCLC) ID: 20997219
- Library of Congress Control Number (LCCN): 89060656
- All ISBNs: 9780819401212 - 0819401218
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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21Microelectronics technology
By Elsa Reichmanis and Christopher K. Ober
“Microelectronics technology” Metadata:
- Title: Microelectronics technology
- Authors: Elsa ReichmanisChristopher K. Ober
- Language: English
- Number of Pages: Median: 577
- Publisher: ➤ An American Chemical Society Publication - American Chemical Society
- Publish Date: 1995 - 1998
- Publish Location: Washington, DC
“Microelectronics technology” Subjects and Themes:
- Subjects: ➤ Polymers - Materials - Congresses - Microelectronic packaging - Photoresists - Electronic packaging - Microelectronics
Edition Identifiers:
- The Open Library ID: OL8226902M - OL807958M
- Library of Congress Control Number (LCCN): 95044669
- All ISBNs: 9780841233324 - 0841233322
Access and General Info:
- First Year Published: 1995
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
Online Access
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22Advances in resist technology and processing XIV
“Advances in resist technology and processing XIV” Metadata:
- Title: ➤ Advances in resist technology and processing XIV
- Language: English
- Number of Pages: Median: 1036
- Publisher: ➤ SPIE-International Society for Optical Engine - SPIE--the International Society for Optical Engineering
- Publish Date: 1997
- Publish Location: Bellingham, Washington
“Advances in resist technology and processing XIV” Subjects and Themes:
- Subjects: Photoresists - Congresses - Optics - Electric resistance
Edition Identifiers:
- The Open Library ID: OL19567913M - OL11393035M
- Online Computer Library Center (OCLC) ID: 37380395
- All ISBNs: 9780819424631 - 0819424633
Access and General Info:
- First Year Published: 1997
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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23Advances in Resist Technology and Processing XII
By Robert D. Allen
“Advances in Resist Technology and Processing XII” Metadata:
- Title: ➤ Advances in Resist Technology and Processing XII
- Author: Robert D. Allen
- Language: English
- Number of Pages: Median: 904
- Publisher: ➤ Society of Photo Optical - SPIE
- Publish Date: 1995
- Publish Location: Bellingham, Wash., USA
“Advances in Resist Technology and Processing XII” Subjects and Themes:
- Subjects: Photoresists - Congresses - Photoresistors - Optics
Edition Identifiers:
- The Open Library ID: OL19567790M - OL11392954M
- Online Computer Library Center (OCLC) ID: 32808965
- Library of Congress Control Number (LCCN): 94069901
- All ISBNs: 0819417866 - 9780819417862
Access and General Info:
- First Year Published: 1995
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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24Materials for microlithography
“Materials for microlithography” Metadata:
- Title: Materials for microlithography
- Language: English
- Number of Pages: Median: 494
- Publisher: ➤ The Society - Amer Chemical Society
- Publish Date: 1984 - 1985
- Publish Location: Washington, D.C
“Materials for microlithography” Subjects and Themes:
- Subjects: ➤ Materials - Congresses - Photoresists - Polymers - Microelectronics - Microlithography
Edition Identifiers:
- The Open Library ID: OL8226554M - OL2859045M
- Library of Congress Control Number (LCCN): 84021744
- All ISBNs: 9780841208711 - 0841208719
Access and General Info:
- First Year Published: 1984
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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25Polymers for high technology
By S. Richard Turner
“Polymers for high technology” Metadata:
- Title: Polymers for high technology
- Author: S. Richard Turner
- Language: English
- Number of Pages: Median: 630
- Publisher: ➤ The Society - American Chemical Society - An American Chemical Society Publication
- Publish Date: 1987
- Publish Location: Washington, DC
“Polymers for high technology” Subjects and Themes:
- Subjects: ➤ Materials - Congresses - Photoresists - Polymers - Microelectronics - Microlithography
Edition Identifiers:
- The Open Library ID: OL8226608M - OL2385636M
- Online Computer Library Center (OCLC) ID: 16131613
- Library of Congress Control Number (LCCN): 87014573
- All ISBNs: 9780841214064 - 0841214069
Access and General Info:
- First Year Published: 1987
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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26Polymers in microlithography
By Elsa Reichmanis
“Polymers in microlithography” Metadata:
- Title: Polymers in microlithography
- Author: Elsa Reichmanis
- Language: English
- Number of Pages: Median: 441
- Publisher: ➤ American Chemical Society - An American Chemical Society Publication
- Publish Date: 1989 - 1998
- Publish Location: Washington, DC
“Polymers in microlithography” Subjects and Themes:
- Subjects: ➤ Polymers - Materials - Congresses - Microlithography - Photoresists - Microelectronics
Edition Identifiers:
- The Open Library ID: OL8226667M - OL2198169M
- Library of Congress Control Number (LCCN): 89017931
- All ISBNs: 0841217017 - 9780841217010
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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27Introduction to microlithography
By Larry F. Thompson, Murrae J. Bowden and C. Grant Willson
“Introduction to microlithography” Metadata:
- Title: ➤ Introduction to microlithography
- Authors: Larry F. ThompsonMurrae J. BowdenC. Grant Willson
- Language: English
- Number of Pages: Median: 534
- Publisher: ➤ An American Chemical Society Publication - American Chemical Society
- Publish Date: 1994 - 1998
- Publish Location: Washington, DC
“Introduction to microlithography” Subjects and Themes:
- Subjects: ➤ Congresses - Etching - Plasma etching - Photoresists - Semiconductors - Microlithography
Edition Identifiers:
- The Open Library ID: OL8226822M - OL1430612M
- Online Computer Library Center (OCLC) ID: 29359317
- Library of Congress Control Number (LCCN): 93042023
- All ISBNs: 0841228485 - 9780841228481
First Setence:
"The microelectronics revolution has had a profound impact on our technological society over the latter half of the twentieth century in such diverse fields as automobiles, computers and communications, medicine, energy, and home entertainment."
Access and General Info:
- First Year Published: 1994
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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28Advances in Resist Technology and Processing III (Spie Volume 631)
By C. Grant Willson
“Advances in Resist Technology and Processing III (Spie Volume 631)” Metadata:
- Title: ➤ Advances in Resist Technology and Processing III (Spie Volume 631)
- Author: C. Grant Willson
- Publisher: ➤ SPIE--the International Society for Optical Engineering
- Publish Date: 1986
“Advances in Resist Technology and Processing III (Spie Volume 631)” Subjects and Themes:
- Subjects: Photoresists - Congresses
Edition Identifiers:
- The Open Library ID: OL11299095M
- Online Computer Library Center (OCLC) ID: 14718949
- Library of Congress Control Number (LCCN): 86061032
- All ISBNs: 0892526661 - 9780892526666
Access and General Info:
- First Year Published: 1986
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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29Proceedings
By Interface '72 Microelectronics Seminar (1972 San Diego, Calif.)
“Proceedings” Metadata:
- Title: Proceedings
- Author: ➤ Interface '72 Microelectronics Seminar (1972 San Diego, Calif.)
- Language: English
- Number of Pages: Median: 62
- Publisher: ➤ Graphics Markets Division, Eastman Kodak Co.
- Publish Date: 1973
- Publish Location: [Rochester, N.Y
“Proceedings” Subjects and Themes:
- Subjects: Congresses - Masks (Electronics) - Photoresists
Edition Identifiers:
- The Open Library ID: OL5431457M
- Library of Congress Control Number (LCCN): 73078245
- All ISBNs: 9780879850685 - 087985068X
Access and General Info:
- First Year Published: 1973
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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30Advances in Resist Technology And Processing 22
By John L. Sturtevant
“Advances in Resist Technology And Processing 22” Metadata:
- Title: ➤ Advances in Resist Technology And Processing 22
- Author: John L. Sturtevant
- Language: English
- Number of Pages: Median: 1282
- Publisher: ➤ SPIE-International Society for Optical Engine
- Publish Date: 2005
“Advances in Resist Technology And Processing 22” Subjects and Themes:
- Subjects: Microlithography - Photoresists - Congresses
Edition Identifiers:
- The Open Library ID: OL11393595M
- Library of Congress Control Number (LCCN): 2006295072
- All ISBNs: 0819457337 - 9780819457332
Access and General Info:
- First Year Published: 2005
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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3115th Annual Symposium on Photomask Technology and Management
By Symposium on Photomask Technology and Management (15th 1995 Santa Clara, Calif.)
“15th Annual Symposium on Photomask Technology and Management” Metadata:
- Title: ➤ 15th Annual Symposium on Photomask Technology and Management
- Author: ➤ Symposium on Photomask Technology and Management (15th 1995 Santa Clara, Calif.)
- Language: English
- Number of Pages: Median: 636
- Publisher: SPIE
- Publish Date: 1996
- Publish Location: Bellingham, WA
“15th Annual Symposium on Photomask Technology and Management” Subjects and Themes:
- Subjects: Congresses - Photoresists - Integrated circuits - Masks - Microlithography
Edition Identifiers:
- The Open Library ID: OL819149M
- Online Computer Library Center (OCLC) ID: 34020090
- Library of Congress Control Number (LCCN): 95069776
- All ISBNs: 0819419850 - 9780819419859
Access and General Info:
- First Year Published: 1996
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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32Vsesoi͡uznoe soveshchanie po fotorezistam
By Russia) Vsesoi͡uznoe soveshchanie po fotorezistam (1990 Zvenigorod
“Vsesoi͡uznoe soveshchanie po fotorezistam” Metadata:
- Title: ➤ Vsesoi͡uznoe soveshchanie po fotorezistam
- Author: ➤ Russia) Vsesoi͡uznoe soveshchanie po fotorezistam (1990 Zvenigorod
- Language: rus
- Number of Pages: Median: 93
- Publisher: Sine nomine
- Publish Date: 1990
- Publish Location: Chernogolovka
“Vsesoi͡uznoe soveshchanie po fotorezistam” Subjects and Themes:
- Subjects: Photoresists - Congresses
Edition Identifiers:
- The Open Library ID: OL47969192M
- Online Computer Library Center (OCLC) ID: 32352590
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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33Proceedings of the Symposium on Patterning Science and Technology
By International Symposium on Patterning Science and Technology (1st 1989 Hollywood, Fla.)
“Proceedings of the Symposium on Patterning Science and Technology” Metadata:
- Title: ➤ Proceedings of the Symposium on Patterning Science and Technology
- Author: ➤ International Symposium on Patterning Science and Technology (1st 1989 Hollywood, Fla.)
- Language: English
- Number of Pages: Median: 248
- Publisher: Electrochemical Society
- Publish Date: 1990
- Publish Location: ➤ Pennington, NJ (10 S. Main St., Pennington 08534-2896)
“Proceedings of the Symposium on Patterning Science and Technology” Subjects and Themes:
- Subjects: Congresses - Masks (Electronics) - Microelectronics - Microlithography - Photoresists
Edition Identifiers:
- The Open Library ID: OL1895639M
- Online Computer Library Center (OCLC) ID: 21409932
- Library of Congress Control Number (LCCN): 90080468
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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34Photoreactive polymers
By Arnost Reiser
“Photoreactive polymers” Metadata:
- Title: Photoreactive polymers
- Author: Arnost Reiser
- Language: English
- Number of Pages: Median: 409
- Publisher: Wiley
- Publish Date: 1989
- Publish Location: New York
“Photoreactive polymers” Subjects and Themes:
- Subjects: Imaging systems - Photopolymers - Photoresists - Strength of materials - Polymers
Edition Identifiers:
- The Open Library ID: OL2048783M
- Online Computer Library Center (OCLC) ID: 18378632
- Library of Congress Control Number (LCCN): 88026092
- All ISBNs: 0471855502 - 9780471855507
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
Online Access
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35Pechatnye formy na osnove svetochuvstvitelʹnykh diazosoedineniĭ
By V. A. Kalibabchuk
“Pechatnye formy na osnove svetochuvstvitelʹnykh diazosoedineniĭ” Metadata:
- Title: ➤ Pechatnye formy na osnove svetochuvstvitelʹnykh diazosoedineniĭ
- Author: V. A. Kalibabchuk
- Language: rus
- Number of Pages: Median: 86
- Publisher: "Tekhnika,"
- Publish Date: 1981
- Publish Location: Kiev
“Pechatnye formy na osnove svetochuvstvitelʹnykh diazosoedineniĭ” Subjects and Themes:
- Subjects: Diazo compounds - Equipment and supplies - Offset printing - Photoresists
Edition Identifiers:
- The Open Library ID: OL3057603M
- Library of Congress Control Number (LCCN): 82152765
Access and General Info:
- First Year Published: 1981
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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36Zhidkie fotopolimerizui͡u︡shchiesi͡a︡ kompozit͡s︡ii
By V. K. Grishchenko
“Zhidkie fotopolimerizui͡u︡shchiesi͡a︡ kompozit͡s︡ii” Metadata:
- Title: ➤ Zhidkie fotopolimerizui͡u︡shchiesi͡a︡ kompozit͡s︡ii
- Author: V. K. Grishchenko
- Language: rus
- Number of Pages: Median: 205
- Publisher: Nauk. dumka
- Publish Date: 1985
- Publish Location: Kiev
“Zhidkie fotopolimerizui͡u︡shchiesi͡a︡ kompozit͡s︡ii” Subjects and Themes:
- Subjects: Photoresists - Polymerization - Polymers
Edition Identifiers:
- The Open Library ID: OL2637559M
- Library of Congress Control Number (LCCN): 85212193
Access and General Info:
- First Year Published: 1985
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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37Diazonaphthoquinone-based resists
By Ralph Dammel
“Diazonaphthoquinone-based resists” Metadata:
- Title: ➤ Diazonaphthoquinone-based resists
- Author: Ralph Dammel
- Language: English
- Number of Pages: Median: 203
- Publisher: SPIE Optical Engineering Press
- Publish Date: 1993
- Publish Location: Bellingham, Wash., USA
“Diazonaphthoquinone-based resists” Subjects and Themes:
- Subjects: Masks (Electronics) - Photoresists - Microelectronics
Edition Identifiers:
- The Open Library ID: OL1722267M
- Library of Congress Control Number (LCCN): 92025724
- All ISBNs: 0819410195 - 9780819410191
Access and General Info:
- First Year Published: 1993
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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38Fotolacktechnik
“Fotolacktechnik” Metadata:
- Title: Fotolacktechnik
- Language: ger
- Number of Pages: Median: 83
- Publisher: Leuze
- Publish Date: 1975
- Publish Location: Saulgau/Württ
“Fotolacktechnik” Subjects and Themes:
- Subjects: Photoresists - Photolithography
Edition Identifiers:
- The Open Library ID: OL4626272M
- Library of Congress Control Number (LCCN): 77457428
Access and General Info:
- First Year Published: 1975
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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39Applications of photopolymers
“Applications of photopolymers” Metadata:
- Title: Applications of photopolymers
- Language: English
- Number of Pages: Median: 161
- Publisher: ➤ Society of Photographic Scientists and Engineers
- Publish Date: 1970
- Publish Location: [Washington]
“Applications of photopolymers” Subjects and Themes:
- Subjects: Photopolymers - Photoresists - Congresses - Imaging systems
Edition Identifiers:
- The Open Library ID: OL3911194M
- Library of Congress Control Number (LCCN): 81474359
Access and General Info:
- First Year Published: 1970
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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40Micro- and nanopatterning polymers
By Hiroshi Ito
“Micro- and nanopatterning polymers” Metadata:
- Title: ➤ Micro- and nanopatterning polymers
- Author: Hiroshi Ito
- Language: English
- Number of Pages: Median: 386
- Publisher: ➤ Distributed by Oxford University Press - American Chemical Society
- Publish Date: 1998
- Publish Location: Washington, DC - [New York]
“Micro- and nanopatterning polymers” Subjects and Themes:
- Subjects: Photoresists - Materials - Microelectronics - Polymeric composites - Composite materials
Edition Identifiers:
- The Open Library ID: OL365612M
- Online Computer Library Center (OCLC) ID: 39257282
- Library of Congress Control Number (LCCN): 98025955
- All ISBNs: 9780841235816 - 0841235813
Access and General Info:
- First Year Published: 1998
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
Online Access
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41Advances in resist materials and processing technology XXVI
By Clifford L. Henderson
“Advances in resist materials and processing technology XXVI” Metadata:
- Title: ➤ Advances in resist materials and processing technology XXVI
- Author: Clifford L. Henderson
- Language: English
- Publisher: SPIE
- Publish Date: 2009
- Publish Location: Bellingham, Wash
“Advances in resist materials and processing technology XXVI” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography
Edition Identifiers:
- The Open Library ID: OL31161362M
- Online Computer Library Center (OCLC) ID: 355149683
- Library of Congress Control Number (LCCN): 2010287870
- All ISBNs: 0819475262 - 9780819475268
Access and General Info:
- First Year Published: 2009
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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42Photoresists & ancillaries
By Paul A. Ita and Matthew Bernard Zielinski
“Photoresists & ancillaries” Metadata:
- Title: Photoresists & ancillaries
- Authors: Paul A. ItaMatthew Bernard Zielinski
- Language: English
- Number of Pages: Median: 222
- Publisher: Freedonia Group
- Publish Date: 2003
- Publish Location: Cleveland, Ohio
“Photoresists & ancillaries” Subjects and Themes:
- Subjects: Microelectronics industry - Photoresists - Semiconductor industry - Integrated circuits industry
- Places: United States
Edition Identifiers:
- The Open Library ID: OL31641293M
- Library of Congress Control Number (LCCN): 2005282178
Access and General Info:
- First Year Published: 2003
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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43Advances in resist technology and processing XVIII
By Francis M. Houlihan
“Advances in resist technology and processing XVIII” Metadata:
- Title: ➤ Advances in resist technology and processing XVIII
- Author: Francis M. Houlihan
- Language: English
- Number of Pages: Median: 1084
- Publisher: SPIE
- Publish Date: 2001
- Publish Location: Bellingham, Washington
“Advances in resist technology and processing XVIII” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography - Optoelectronics
Edition Identifiers:
- The Open Library ID: OL3585160M
- Online Computer Library Center (OCLC) ID: 48152924
- Library of Congress Control Number (LCCN): 2002283519
- All ISBNs: 0819440310 - 9780819440310
Access and General Info:
- First Year Published: 2001
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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44The microelectronics market for imaging chemicals
By Judith Harper
“The microelectronics market for imaging chemicals” Metadata:
- Title: ➤ The microelectronics market for imaging chemicals
- Author: Judith Harper
- Language: English
- Number of Pages: Median: 142
- Publisher: Business Communications Co.
- Publish Date: 1999
- Publish Location: Norwalk, CT
“The microelectronics market for imaging chemicals” Subjects and Themes:
- Subjects: ➤ Photographic industry - Microelectronics industry - Photographic chemicals industry - Photolithography - Equipment and supplies - Photoresists - Industrial applications - Market surveys
Edition Identifiers:
- The Open Library ID: OL31591695M
- Library of Congress Control Number (LCCN): 2003265529
- All ISBNs: 9781569655665 - 1569655669
Access and General Info:
- First Year Published: 1999
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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45Advances in resist technology and processing II
“Advances in resist technology and processing II” Metadata:
- Title: ➤ Advances in resist technology and processing II
- Language: English
- Number of Pages: Median: 350
- Publisher: ➤ SPIE--the International Society for Optical Engineering
- Publish Date: 1985
- Publish Location: Bellingham, Wash., USA
“Advances in resist technology and processing II” Subjects and Themes:
- Subjects: Photoresists - Lithography - Congresses - Photolithography
Edition Identifiers:
- The Open Library ID: OL15081338M
- Library of Congress Control Number (LCCN): 85050710
- All ISBNs: 0892525746 - 9780892525744
Access and General Info:
- First Year Published: 1985
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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46Index of the proceedings of Interface microelectronics seminars
By Eastman Kodak Company
“Index of the proceedings of Interface microelectronics seminars” Metadata:
- Title: ➤ Index of the proceedings of Interface microelectronics seminars
- Author: Eastman Kodak Company
- Language: English
- Number of Pages: Median: 51
- Publisher: ➤ Graphics Markets Division, Eastman Kodak Co.]
- Publish Date: 1979
- Publish Location: [Rochester, N.Y
“Index of the proceedings of Interface microelectronics seminars” Subjects and Themes:
- Subjects: Photoresists - Indexes - Congresses - Photolithography - Microelectronics
Edition Identifiers:
- The Open Library ID: OL4129886M
- Online Computer Library Center (OCLC) ID: 6330302
- Library of Congress Control Number (LCCN): 80107035
- All ISBNs: 0879852372 - 9780879852375
Author's Alternative Names:
"Eastman Kodak Company. X-ray Division", "Eastman Kodak Company. Motion Picture and Audiovisual Markets Division", "Eastman Kodak Co", "Kodak.", "KODAK", "Kodak (Firm)", "Eastman Kodak", "Eastman Kodak Company. Medical Division.", "Eastman Kodak.", "Kodak Eastman", "Kodak EKTA FF", "KODAK.", "Eastman Kodak Company. Motion Picture and Education Markets Division", "Eastman Kodak Company. Research Laboratory.", "Eastman Kodak Company. Consumer Markets Division.", "Kodak Ekta AF-1", "Eastman Kodak Company. Graphic Arts Division.", "Eastman Kodak Company. Distillation Products Industries.", "eastman kodak co.", "Canadian Kodak Company.", "Eastman Kodak Company. X-ray Division.", "Eastman Kodak Company staff", "Kodak", "Kodak Seminar : Aerial Photography as a Planning Tool (1973 Rochester and Ithaca, N.Y.)", "Eastman Kodak Company. Professional Photography Division", "Kodak Limited. Medical Sales Division.", "Kodak Microelectronics Seminar (1977 Monterey, Calif.)", "Kodak Unknown", "Eastman Kodak Company. Medical Division", "Canadian Kodak Company", "Eastman Kodak Company. U.S. Apparatus Division.", "Eastman Kodak Company Staff", "Eastman Kodak Company. Motion Picture and Audiovisual Markets Division.", "Eastman Kodak Company.", "The Eastman Kodak Company", "Kodak Limited.", "EASTMAN KODAK.", "Eastman Kodak Company. Professional, Commercial and Industrial Markets Division.", "Eastman Kodak Company. Radiography Markets Division.", "Eastman Kodak Company. Professional and Finishing Markets Division.", "KODAK LIMITED.", "Eastman Kodak Company. professional and Finishing Markets Division.", "EASTMAN KODAK COMPANY.", "Eastman Kodak Company. Graphics Markets Division.", "Eastman Kodak Editors", "Eastman Kodak Staff", "Eastman Kodak Company. Professional, Commercial, and Industrial Markets Division.", "Eastman Kodak Company. Motion Picture Film Dept.", "Kodak Microelectronics Seminar (1981 Dallas, Tex.)", "Kodak Carousel 4600", "Eastman Kodak Company, Rochester, N.Y. Kodak Research Laboratories.", "Kodak. Museum.", "Eastman Kodak Co.", "Eastman Kodak Company. X-ray Sales Division.", "Eastman Kodak, Co.", "Eastman Kodak Company. Advertising Information Service.",Access and General Info:
- First Year Published: 1979
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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47Advances in resist technology and processing XIX
By Theodore H. Fedynyshyn
“Advances in resist technology and processing XIX” Metadata:
- Title: ➤ Advances in resist technology and processing XIX
- Author: Theodore H. Fedynyshyn
- Language: English
- Publisher: SPIE
- Publish Date: 2002
- Publish Location: Bellingham, Washington
“Advances in resist technology and processing XIX” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography
Edition Identifiers:
- The Open Library ID: OL3702114M
- Online Computer Library Center (OCLC) ID: 50554788
- Library of Congress Control Number (LCCN): 2003268664
- All ISBNs: 9780819444363 - 0819444367
Access and General Info:
- First Year Published: 2002
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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48Advances in resist technology and processing XI
“Advances in resist technology and processing XI” Metadata:
- Title: ➤ Advances in resist technology and processing XI
- Language: English
- Number of Pages: Median: 880
- Publisher: ➤ International Society for Optical Engineering
- Publish Date: 1994
- Publish Location: Bellingham, Wash
“Advances in resist technology and processing XI” Subjects and Themes:
- Subjects: Photoresists - Congresses - Optics - Photoresistors
Edition Identifiers:
- The Open Library ID: OL19754456M
- Online Computer Library Center (OCLC) ID: 30641637
- Library of Congress Control Number (LCCN): 94065790
- All ISBNs: 9780819414908 - 0819414905
Access and General Info:
- First Year Published: 1994
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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49Fotorezisty-diffuzanty v poluprovodnikovoĭ tekhnologii
“Fotorezisty-diffuzanty v poluprovodnikovoĭ tekhnologii” Metadata:
- Title: ➤ Fotorezisty-diffuzanty v poluprovodnikovoĭ tekhnologii
- Language: rus
- Number of Pages: Median: 115
- Publisher: "Nauka," Leningradskoe otd-nie
- Publish Date: 1984
- Publish Location: Leningrad
“Fotorezisty-diffuzanty v poluprovodnikovoĭ tekhnologii” Subjects and Themes:
- Subjects: Photoresists - Semiconductors
Edition Identifiers:
- The Open Library ID: OL2931802M
- Online Computer Library Center (OCLC) ID: 22207395
- Library of Congress Control Number (LCCN): 84167844
Access and General Info:
- First Year Published: 1984
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Marketplaces
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50Advances in resist materials and processing technology XXIV
By Qinghuang Lin
“Advances in resist materials and processing technology XXIV” Metadata:
- Title: ➤ Advances in resist materials and processing technology XXIV
- Author: Qinghuang Lin
- Language: English
- Publisher: SPIE
- Publish Date: 2007
- Publish Location: Bellingham, Wash
“Advances in resist materials and processing technology XXIV” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography
Edition Identifiers:
- The Open Library ID: OL24490953M
- Online Computer Library Center (OCLC) ID: 144527843
- Library of Congress Control Number (LCCN): 2009284505
- All ISBNs: 9780819466389 - 0819466387
Access and General Info:
- First Year Published: 2007
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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