Advances in resist technology and processing VII - Info and Reading Options
5-6 March 1990, San Jose, California
By Michael P. C. Watts
"Advances in resist technology and processing VII" was published by SPIE in 1990 - Bellingham, Wash., USA, it has 595 pages and the language of the book is English.
“Advances in resist technology and processing VII” Metadata:
- Title: ➤ Advances in resist technology and processing VII
- Author: Michael P. C. Watts
- Language: English
- Number of Pages: 595
- Publisher: SPIE
- Publish Date: 1990
- Publish Location: Bellingham, Wash., USA
“Advances in resist technology and processing VII” Subjects and Themes:
- Subjects: Congresses - Photoresistors - Photoconductivity - Photolithography - Photoresists
Edition Specifications:
- Pagination: viii, 595 p. :
Edition Identifiers:
- The Open Library ID: OL19567347M - OL9620566W
- Online Computer Library Center (OCLC) ID: 22188466
- Library of Congress Control Number (LCCN): 90060892
- ISBN-13: 9780819403094
- ISBN-10: 0819403091
- All ISBNs: 0819403091 - 9780819403094
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