Advances in resist technology and processing XVI - Info and Reading Options
Microlithography 1999 : 15-17 March, 1999, Santa Clara, California
By Will Conley
"Advances in resist technology and processing XVI" was published by SPIE in 1999 - Bellingham, Wash, it has 1402 pages and the language of the book is English.
“Advances in resist technology and processing XVI” Metadata:
- Title: ➤ Advances in resist technology and processing XVI
- Author: Will Conley
- Language: English
- Number of Pages: 1402
- Publisher: SPIE
- Publish Date: 1999
- Publish Location: Bellingham, Wash
“Advances in resist technology and processing XVI” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography - Optics
Edition Specifications:
- Pagination: 2 v. (xv, 1402 p.) :
Edition Identifiers:
- The Open Library ID: OL19568077M - OL9620735W
- Online Computer Library Center (OCLC) ID: 41792054
- ISBN-13: 9780819431523
- ISBN-10: 0819431524
- All ISBNs: 0819431524 - 9780819431523
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