Advances in resist technology and processing XVIII - Info and Reading Options
26-28 February, 2001, Santa Clara, [California] USA
By Francis M. Houlihan
"Advances in resist technology and processing XVIII" was published by SPIE in 2001 - Bellingham, Washington, it has 1084 pages and the language of the book is English.
“Advances in resist technology and processing XVIII” Metadata:
- Title: ➤ Advances in resist technology and processing XVIII
- Author: Francis M. Houlihan
- Language: English
- Number of Pages: 1084
- Publisher: SPIE
- Publish Date: 2001
- Publish Location: Bellingham, Washington
“Advances in resist technology and processing XVIII” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography - Optoelectronics
Edition Specifications:
- Pagination: 2 v. (xxix, 1084 p.) :
Edition Identifiers:
- The Open Library ID: OL3585160M - OL23792368W
- Online Computer Library Center (OCLC) ID: 48152924
- Library of Congress Control Number (LCCN): 2002283519
- ISBN-10: 0819440310
- All ISBNs: 0819440310
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