Advances in resist technology and processing XIX - Info and Reading Options
4-6 March, 2002, Santa Clara, [California] USA
By Theodore H. Fedynyshyn
"Advances in resist technology and processing XIX" was published by SPIE in 2002 - Bellingham, Washington and the language of the book is English.
“Advances in resist technology and processing XIX” Metadata:
- Title: ➤ Advances in resist technology and processing XIX
- Author: Theodore H. Fedynyshyn
- Language: English
- Publisher: SPIE
- Publish Date: 2002
- Publish Location: Bellingham, Washington
“Advances in resist technology and processing XIX” Subjects and Themes:
- Subjects: Photoresists - Congresses - Microlithography
Edition Specifications:
- Pagination: 2 v. :
Edition Identifiers:
- The Open Library ID: OL3702114M - OL19159681W
- Online Computer Library Center (OCLC) ID: 50554788
- Library of Congress Control Number (LCCN): 2003268664
- ISBN-10: 0819444367
- All ISBNs: 0819444367
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