15th Annual Symposium on Photomask Technology and Management - Info and Reading Options
20-22 September 1995, Santa Clara, California
By Symposium on Photomask Technology and Management (15th 1995 Santa Clara, Calif.)
"15th Annual Symposium on Photomask Technology and Management" was published by SPIE in 1996 - Bellingham, WA, it has 636 pages and the language of the book is English.
“15th Annual Symposium on Photomask Technology and Management” Metadata:
- Title: ➤ 15th Annual Symposium on Photomask Technology and Management
- Author: ➤ Symposium on Photomask Technology and Management (15th 1995 Santa Clara, Calif.)
- Language: English
- Number of Pages: 636
- Publisher: SPIE
- Publish Date: 1996
- Publish Location: Bellingham, WA
“15th Annual Symposium on Photomask Technology and Management” Subjects and Themes:
- Subjects: Congresses - Photoresists - Integrated circuits - Masks - Microlithography
Edition Specifications:
- Pagination: ix, 636 p. :
Edition Identifiers:
- The Open Library ID: OL819149M - OL2996849W
- Online Computer Library Center (OCLC) ID: 34020090
- Library of Congress Control Number (LCCN): 95069776
- ISBN-10: 0819419850
- All ISBNs: 0819419850
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