Advances in resist technology and processing XI - Info and Reading Options
28 February-1 March, 1994, San Jose, California
"Advances in resist technology and processing XI" was published by International Society for Optical Engineering in 1994 - Bellingham, Wash, it has 880 pages and the language of the book is English.
“Advances in resist technology and processing XI” Metadata:
- Title: ➤ Advances in resist technology and processing XI
- Language: English
- Number of Pages: 880
- Publisher: ➤ International Society for Optical Engineering
- Publish Date: 1994
- Publish Location: Bellingham, Wash
“Advances in resist technology and processing XI” Subjects and Themes:
- Subjects: Photoresists - Congresses - Optics - Photoresistors
Edition Specifications:
- Pagination: xiii, 880 p. :
Edition Identifiers:
- The Open Library ID: OL19754456M - OL19284210W
- Online Computer Library Center (OCLC) ID: 30641637
- Library of Congress Control Number (LCCN): 94065790
- ISBN-10: 0819414905
- All ISBNs: 0819414905
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