Principles of plasma discharges and materials processing - Info and Reading Options
By M. A. Lieberman
"Principles of plasma discharges and materials processing" was published by Wiley in 1994 - New York, it has 572 pages and the language of the book is English.
“Principles of plasma discharges and materials processing” Metadata:
- Title: ➤ Principles of plasma discharges and materials processing
- Author: M. A. Lieberman
- Language: English
- Number of Pages: 572
- Publisher: Wiley
- Publish Date: 1994
- Publish Location: New York
“Principles of plasma discharges and materials processing” Subjects and Themes:
- Subjects: ➤ Industrial applications - Plasma chemistry - Plasma dynamics - Plasma etching - Surfaces - Thin films - Surfaces (technology)
Edition Specifications:
- Pagination: xxvi, 572 p. :
Edition Identifiers:
- The Open Library ID: OL1103914M - OL3499771W
- Online Computer Library Center (OCLC) ID: 30896011
- Library of Congress Control Number (LCCN): 94028954
- ISBN-10: 0471005770
- All ISBNs: 0471005770
AI-generated Review of “Principles of plasma discharges and materials processing”:
"Principles of plasma discharges and materials processing" Description:
The Open Library:
Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications - especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.
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