Advanced etch technology for nanopatterning - Info and Reading Options
13-14 February 2012, San Jose, California, United States
By Ying Zhang, G. S. Oehrlein and Qinghuang Lin
"Advanced etch technology for nanopatterning" was published by SPIE in 2012 - Bellingham, Wash and the language of the book is English.
“Advanced etch technology for nanopatterning” Metadata:
- Title: ➤ Advanced etch technology for nanopatterning
- Authors: Ying ZhangG. S. OehrleinQinghuang Lin
- Language: English
- Publisher: SPIE
- Publish Date: 2012
- Publish Location: Bellingham, Wash
“Advanced etch technology for nanopatterning” Subjects and Themes:
- Subjects: Lithography - Congresses - Plasma etching
Edition Specifications:
- Pagination: 1 v. (various pagings)
Edition Identifiers:
- The Open Library ID: OL30733352M - OL22758547W
- Online Computer Library Center (OCLC) ID: 797974369
- Library of Congress Control Number (LCCN): 2012471867
- ISBN-13: 9780819489845
- ISBN-10: 0819489840
- All ISBNs: 0819489840 - 9780819489845
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