Explore: Vapor Plating
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AI-Generated Overview About “vapor-plating”:
Books Results
Source: The Open Library
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Search results from The Open Library
1Rapid thermal and related processing techniques
“Rapid thermal and related processing techniques” Metadata:
- Title: ➤ Rapid thermal and related processing techniques
- Language: English
- Number of Pages: Median: 422
- Publisher: SPIE
- Publish Date: 1991
- Publish Location: Bellingham, Wash., USA
“Rapid thermal and related processing techniques” Subjects and Themes:
- Subjects: ➤ Semiconductor doping - Heat treatment - Vapor plating - Rapid thermal processing - Congresses - Semiconductors - Integrated circuits - Design and construction - Manufacturing processes
Edition Identifiers:
- The Open Library ID: OL1889213M
- Online Computer Library Center (OCLC) ID: 23606222
- Library of Congress Control Number (LCCN): 90050809
- All ISBNs: 0819404624 - 9780819404626
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
Online Borrowing:
- Borrowing from Open Library: Borrowing link
- Borrowing from Archive.org: Borrowing link
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2Monitoring and control of plasma-enhanced processing of semiconductors
By James E. Griffiths
“Monitoring and control of plasma-enhanced processing of semiconductors” Metadata:
- Title: ➤ Monitoring and control of plasma-enhanced processing of semiconductors
- Author: James E. Griffiths
- Language: English
- Number of Pages: Median: 147
- Publisher: SPIE
- Publish Date: 1989
- Publish Location: Bellingham, Wash., USA
“Monitoring and control of plasma-enhanced processing of semiconductors” Subjects and Themes:
- Subjects: ➤ Plasma engineering - Semiconductors - Congresses - Vapor plating - Epitaxy - Quality control - Optical methods
Edition Identifiers:
- The Open Library ID: OL2066313M
- Online Computer Library Center (OCLC) ID: 507855588
- Library of Congress Control Number (LCCN): 88063652
- All ISBNs: 9780819400727 - 0819400726
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
Online Borrowing:
- Borrowing from Open Library: Borrowing link
- Borrowing from Archive.org: Borrowing link
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3IPAT 77
By IPAT 77 (1977 Edinburgh, Scotland)
“IPAT 77” Metadata:
- Title: IPAT 77
- Author: ➤ IPAT 77 (1977 Edinburgh, Scotland)
- Language: English
- Number of Pages: Median: 248
- Publisher: [CEP Consultants Ltd]
- Publish Date: 1977
- Publish Location: [Edinburgh]
“IPAT 77” Subjects and Themes:
- Subjects: ➤ Cathode sputtering (Plating process) - Congresses - Ion plating - Thin films - Vapor plating
Edition Identifiers:
- The Open Library ID: OL4282376M - OL8292060M
- Library of Congress Control Number (LCCN): 78308674
- All ISBNs: 0905941004 - 9780905941004
Access and General Info:
- First Year Published: 1977
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
Online Borrowing:
Online Marketplaces
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4Materials and processes for surface and interface engineering
By Y. Pauleau
“Materials and processes for surface and interface engineering” Metadata:
- Title: ➤ Materials and processes for surface and interface engineering
- Author: Y. Pauleau
- Language: English
- Number of Pages: Median: 646
- Publisher: ➤ Island Press - Kluwer Academic Publishers
- Publish Date: 1995
- Publish Location: Boston - Dordrecht
“Materials and processes for surface and interface engineering” Subjects and Themes:
- Subjects: ➤ Vapor plating - Thin films - Plasma-enhanced chemical vapor deposition - Surfaces (Technology) - Interfaces (Physical science) - Interfaces (Physical sciences) - Materials, testing - Vapor-plating
Edition Identifiers:
- The Open Library ID: OL1279849M - OL50680764M
- Online Computer Library Center (OCLC) ID: 32203151
- Library of Congress Control Number (LCCN): 95011665
- All ISBNs: 9780792334583 - 9789401100786 - 9401100780 - 0792334582
Access and General Info:
- First Year Published: 1995
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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5Rapid thermal annealing/chemical vapor deposition and integrated processing
By Martin L. Green and Jeffrey C. Gelpey
“Rapid thermal annealing/chemical vapor deposition and integrated processing” Metadata:
- Title: ➤ Rapid thermal annealing/chemical vapor deposition and integrated processing
- Authors: Martin L. GreenJeffrey C. Gelpey
- Language: English
- Number of Pages: Median: 506
- Publisher: ➤ Cambridge University Press - University of Cambridge ESOL Examinations - Materials Research Society
- Publish Date: 1989 - 2014
- Publish Location: Pittsburgh, Pa
“Rapid thermal annealing/chemical vapor deposition and integrated processing” Subjects and Themes:
- Subjects: ➤ Semiconductor doping - Heat treatment - Vapor plating - Rapid thermal processing - Congresses - Semiconductors - Vapor pressure - Vapor-plating - Diffusion
Edition Identifiers:
- The Open Library ID: OL29205976M - OL2215916M
- Online Computer Library Center (OCLC) ID: 20295997
- Library of Congress Control Number (LCCN): 89039134
- All ISBNs: 1107410754 - 9781558990197 - 9781107410756 - 1558990194
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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6Rapid isothermal processing
“Rapid isothermal processing” Metadata:
- Title: Rapid isothermal processing
- Language: English
- Number of Pages: Median: 204
- Publisher: SPIE
- Publish Date: 1989
- Publish Location: Bellingham, Wash., USA
“Rapid isothermal processing” Subjects and Themes:
- Subjects: ➤ Semiconductor doping - Heat treatment - Semiconductors - Congresses - Vapor plating - Metals - Rapid solidification processing - Thermal stresses - Semiconductor wafers
Edition Identifiers:
- The Open Library ID: OL2218019M
- Online Computer Library Center (OCLC) ID: 24702968
- Library of Congress Control Number (LCCN): 89043525
- All ISBNs: 0819402257 - 9780819402257
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
Online Borrowing:
Online Marketplaces
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7CVD-XI
By International Conference on Chemical Vapor Deposition (11th 1990 Seattle, Wash.)
“CVD-XI” Metadata:
- Title: CVD-XI
- Author: ➤ International Conference on Chemical Vapor Deposition (11th 1990 Seattle, Wash.)
- Language: English
- Number of Pages: Median: 734
- Publisher: Electrochemical Society
- Publish Date: 1990
- Publish Location: Pennington, N.J
“CVD-XI” Subjects and Themes:
- Subjects: Congresses - Vapor plating - Vapor-plating
Edition Identifiers:
- The Open Library ID: OL18380319M
- Online Computer Library Center (OCLC) ID: 27181298
- Library of Congress Control Number (LCCN): 90083660
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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8Studies on chemical vapor deposition in the gallium indium arsenide phosphide system
By Chinho Park
“Studies on chemical vapor deposition in the gallium indium arsenide phosphide system” Metadata:
- Title: ➤ Studies on chemical vapor deposition in the gallium indium arsenide phosphide system
- Author: Chinho Park
- Language: English
- Number of Pages: Median: 158
- Publish Date: 1992
“Studies on chemical vapor deposition in the gallium indium arsenide phosphide system” Subjects and Themes:
- Subjects: ➤ Semiconductors - Vapor plating - Indium, gallium, orsenide, phosphide
Edition Identifiers:
- The Open Library ID: OL33215709M
- Online Computer Library Center (OCLC) ID: 27669825
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: Yes
- Is The Book Public: Yes
- Access Status: Public
Online Access
Online Borrowing:
- Borrowing from Open Library: Borrowing link
- Borrowing from Archive.org: Borrowing link
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