Monitoring and control of plasma-enhanced processing of semiconductors - Info and Reading Options
proceedings : 1-2 November 1988, Santa Clara, California
By James E. Griffiths
"Monitoring and control of plasma-enhanced processing of semiconductors" was published by SPIE in 1989 - Bellingham, Wash., USA, it has 147 pages and the language of the book is English.
“Monitoring and control of plasma-enhanced processing of semiconductors” Metadata:
- Title: ➤ Monitoring and control of plasma-enhanced processing of semiconductors
- Author: James E. Griffiths
- Language: English
- Number of Pages: 147
- Publisher: SPIE
- Publish Date: 1989
- Publish Location: Bellingham, Wash., USA
“Monitoring and control of plasma-enhanced processing of semiconductors” Subjects and Themes:
- Subjects: ➤ Plasma engineering - Semiconductors - Congresses - Vapor plating - Epitaxy - Quality control - Optical methods
Edition Specifications:
- Pagination: viii, 147 p. :
Edition Identifiers:
- The Open Library ID: OL2066313M - OL19484599W
- Online Computer Library Center (OCLC) ID: 507855588
- Library of Congress Control Number (LCCN): 88063652
- ISBN-10: 0819400726
- All ISBNs: 0819400726
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