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1Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)

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“Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)” Metadata:

  • Title: ➤  Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)
  • Author:
  • Language: English
  • Number of Pages: Median: 307
  • Publisher: ➤  Society of Photo Optical - The Society
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1988
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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2Electron-Beam, X-Ray, and Ion-Beam Technology

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“Electron-Beam, X-Ray, and Ion-Beam Technology” Metadata:

  • Title: ➤  Electron-Beam, X-Ray, and Ion-Beam Technology
  • Author:
  • Language: English
  • Number of Pages: Median: 344
  • Publisher: ➤  SPIE--the International Society for Optical Engineering - SPIE-International Society for Optical Engine
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-Beam, X-Ray, and Ion-Beam Technology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1990
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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3Resists in microlithography and printing

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“Resists in microlithography and printing” Metadata:

  • Title: ➤  Resists in microlithography and printing
  • Author:
  • Language: English
  • Number of Pages: Median: 376
  • Publisher: Elsevier
  • Publish Date:
  • Publish Location: Amsterdam - New York

“Resists in microlithography and printing” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1993
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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4Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV

Book's cover

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV
  • Language: English
  • Number of Pages: Median: 219
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1985
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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5Dry processing for submicrometer lithography

Book's cover

“Dry processing for submicrometer lithography” Metadata:

  • Title: ➤  Dry processing for submicrometer lithography
  • Language: English
  • Number of Pages: Median: 307
  • Publisher: The Society
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Dry processing for submicrometer lithography” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1990
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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6Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II

Book's cover

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II
  • Language: English
  • Number of Pages: Median: 488
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1992
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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7Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV

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“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV
  • Language: English
  • Number of Pages: Median: 420
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1994
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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8Emerging lithographic technologies V

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“Emerging lithographic technologies V” Metadata:

  • Title: ➤  Emerging lithographic technologies V
  • Author:
  • Language: English
  • Number of Pages: Median: 818
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies V” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2001
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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9Emerging lithographic technologies II

Book's cover

“Emerging lithographic technologies II” Metadata:

  • Title: ➤  Emerging lithographic technologies II
  • Language: English
  • Number of Pages: Median: 702
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies II” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1998
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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10Emerging lithographic technologies VIII

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“Emerging lithographic technologies VIII” Metadata:

  • Title: ➤  Emerging lithographic technologies VIII
  • Author:
  • Language: English
  • Number of Pages: Median: 1110
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Emerging lithographic technologies VIII” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2004
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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11Emerging lithographic technologies

Book's cover

“Emerging lithographic technologies” Metadata:

  • Title: ➤  Emerging lithographic technologies
  • Language: English
  • Number of Pages: Median: 412
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1997
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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12Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III

Book's cover

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III
  • Language: English
  • Number of Pages: Median: 136
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1984
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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13Emerging lithographic technologies III

Book's cover

“Emerging lithographic technologies III” Metadata:

  • Title: ➤  Emerging lithographic technologies III
  • Language: English
  • Number of Pages: Median: 864
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies III” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1999
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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14Electron-beam, X-ray, and ion-beam technology

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Book's cover

“Electron-beam, X-ray, and ion-beam technology” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam technology
  • Author:
  • Language: English
  • Number of Pages: Median: 388
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, and ion-beam technology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1989
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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15Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V

Book's cover

“Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V” Metadata:

  • Title: ➤  Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V
  • Language: English
  • Number of Pages: Median: 272
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1986
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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16Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V

Book's cover

“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V” Metadata:

  • Title: ➤  Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V
  • Language: English
  • Number of Pages: Median: 450
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1995
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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17Emerging Lithographic Technologies VII

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“Emerging Lithographic Technologies VII” Metadata:

  • Title: ➤  Emerging Lithographic Technologies VII
  • Author:
  • Language: English
  • Number of Pages: Median: 1142
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging Lithographic Technologies VII” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2003
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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18Nanofabrication

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“Nanofabrication” Metadata:

  • Title: Nanofabrication
  • Author:
  • Language: English
  • Number of Pages: Median: 700
  • Publisher: ➤  World Scientific Publishing Company - World Scientific Publishing Co Pte Ltd
  • Publish Date:

“Nanofabrication” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2007
  • Is Full Text Available: No
  • Is The Book Public: No
  • Access Status: No_ebook

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    19Emerging lithographic technologies XI

    “Emerging lithographic technologies XI” Metadata:

    • Title: ➤  Emerging lithographic technologies XI
    • Language: English
    • Publisher: SPIE
    • Publish Date:
    • Publish Location: Bellingham, Wash

    “Emerging lithographic technologies XI” Subjects and Themes:

    Edition Identifiers:

    Access and General Info:

    • First Year Published: 2007
    • Is Full Text Available: No
    • Is The Book Public: No
    • Access Status: No_ebook

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    20Nanofabrication

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    “Nanofabrication” Metadata:

    • Title: Nanofabrication
    • Language: English
    • Number of Pages: Median: 574
    • Publisher: World Scientific
    • Publish Date:
    • Publish Location: Hackensack, N.J - Singapore

    “Nanofabrication” Subjects and Themes:

    Edition Identifiers:

    Access and General Info:

    • First Year Published: 2008
    • Is Full Text Available: No
    • Is The Book Public: No
    • Access Status: No_ebook

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    21Emerging Lithographic Techniques VI

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    “Emerging Lithographic Techniques VI” Metadata:

    • Title: ➤  Emerging Lithographic Techniques VI
    • Author:
    • Number of Pages: Median: 508
    • Publisher: ➤  SPIE Society of Photo-Optical Instrumentation Engi
    • Publish Date:

    “Emerging Lithographic Techniques VI” Subjects and Themes:

    Edition Identifiers:

    Access and General Info:

    • First Year Published: 2002
    • Is Full Text Available: No
    • Is The Book Public: No
    • Access Status: No_ebook

    Online Access

    Downloads Are Not Available:

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      22Emerging Lithographic Technologies 9

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      Book's cover

      “Emerging Lithographic Technologies 9” Metadata:

      • Title: ➤  Emerging Lithographic Technologies 9
      • Author:
      • Language: English
      • Number of Pages: Median: 1286
      • Publisher: ➤  SPIE-International Society for Optical Engine
      • Publish Date:

      “Emerging Lithographic Technologies 9” Subjects and Themes:

      Edition Identifiers:

      Access and General Info:

      • First Year Published: 2005
      • Is Full Text Available: No
      • Is The Book Public: No
      • Access Status: No_ebook

      Online Access

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        23The physics of submicron lithography

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        “The physics of submicron lithography” Metadata:

        • Title: ➤  The physics of submicron lithography
        • Author:
        • Language: English
        • Number of Pages: Median: 493
        • Publisher: Plenum Press
        • Publish Date:
        • Publish Location: New York

        “The physics of submicron lithography” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 1992
        • Is Full Text Available: Yes
        • Is The Book Public: No
        • Access Status: Printdisabled

        Online Access

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          24Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii

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          “Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii” Metadata:

          • Title: ➤  Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii
          • Author:
          • Language: rus
          • Number of Pages: Median: 125
          • Publisher: "Radio i svi͡a︡zʹ"
          • Publish Date:
          • Publish Location: Moskva

          “Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1985
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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          25Metallic structures with reduced dimensions

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          “Metallic structures with reduced dimensions” Metadata:

          • Title: ➤  Metallic structures with reduced dimensions
          • Author:
          • Languages: English - dut
          • Number of Pages: Median: 136
          • Publisher: Sine nomine
          • Publish Date:
          • Publish Location: [s.l.]

          “Metallic structures with reduced dimensions” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1991
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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          26Patterning of material layers in submicron region

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          Book's cover

          “Patterning of material layers in submicron region” Metadata:

          • Title: ➤  Patterning of material layers in submicron region
          • Author:
          • Language: English
          • Number of Pages: Median: 183
          • Publisher: J. Wiley
          • Publish Date:
          • Publish Location: New York

          “Patterning of material layers in submicron region” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1993
          • Is Full Text Available: Yes
          • Is The Book Public: No
          • Access Status: Printdisabled

          Online Access

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            27On electron beam lithography for LSI circuit fabrication

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            “On electron beam lithography for LSI circuit fabrication” Metadata:

            • Title: ➤  On electron beam lithography for LSI circuit fabrication
            • Author:
            • Language: English
            • Number of Pages: Median: 14
            • Publisher: ➤  Royal Institute of Technology, Dept. of Applied Electronics
            • Publish Date:
            • Publish Location: Stockholm

            “On electron beam lithography for LSI circuit fabrication” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 1979
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            28Design technology co-optimization in the era of sub-resolution IC scaling

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            “Design technology co-optimization in the era of sub-resolution IC scaling” Metadata:

            • Title: ➤  Design technology co-optimization in the era of sub-resolution IC scaling
            • Author:
            • Language: English
            • Publisher: SPIE
            • Publish Date:
            • Publish Location: Bellingham, Washington

            “Design technology co-optimization in the era of sub-resolution IC scaling” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 2016
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            29Electron-beam lithography contributions from Jena

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            “Electron-beam lithography contributions from Jena” Metadata:

            • Title: ➤  Electron-beam lithography contributions from Jena
            • Author:
            • Language: English
            • Number of Pages: Median: 167
            • Publisher: Verlag Vopelius
            • Publish Date:
            • Publish Location: Jena

            “Electron-beam lithography contributions from Jena” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 2014
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            30Alternative lithographic technologies IV

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            “Alternative lithographic technologies IV” Metadata:

            • Title: ➤  Alternative lithographic technologies IV
            • Authors:
            • Language: English
            • Publisher: SPIE
            • Publish Date:
            • Publish Location: Bellingham, Washington

            “Alternative lithographic technologies IV” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 2012
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            31Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing

            Book's cover

            “Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing” Metadata:

            • Title: ➤  Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing
            • Language: English
            • Number of Pages: Median: 340
            • Publisher: SPIE
            • Publish Date:
            • Publish Location: Bellingham, Wash

            “Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 1991
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            32Dian zi shu bao guang wei na jia gong ji shu

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            “Dian zi shu bao guang wei na jia gong ji shu” Metadata:

            • Title: ➤  Dian zi shu bao guang wei na jia gong ji shu
            • Author:
            • Language: chi
            • Number of Pages: Median: 310
            • Publisher: ➤  Beijing gong ye da xue chu ban she
            • Publish Date:
            • Publish Location: Beijing

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            • First Year Published: 2004
            • Is Full Text Available: No
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            33Lithography Asia 2008

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            • Title: Lithography Asia 2008
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            • Language: English
            • Publisher: SPIE
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            • Publish Location: Bellingham, Wash

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            • First Year Published: 2008
            • Is Full Text Available: No
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            34Emerging lithographic technologies X

            “Emerging lithographic technologies X” Metadata:

            • Title: ➤  Emerging lithographic technologies X
            • Language: English
            • Publisher: SPIE
            • Publish Date:
            • Publish Location: Bellingham, Wash

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            • First Year Published: 2006
            • Is Full Text Available: No
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            35Electron-beam technology in microelectronic fabrication

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            “Electron-beam technology in microelectronic fabrication” Metadata:

            • Title: ➤  Electron-beam technology in microelectronic fabrication
            • Author:
            • Language: English
            • Number of Pages: Median: 362
            • Publisher: Academic Press
            • Publish Date:
            • Publish Location: New York

            “Electron-beam technology in microelectronic fabrication” Subjects and Themes:

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            Access and General Info:

            • First Year Published: 1980
            • Is Full Text Available: Yes
            • Is The Book Public: No
            • Access Status: Printdisabled

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              36Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V

              “Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V” Metadata:

              • Title: ➤  Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V
              • Language: English
              • Number of Pages: Median: 272
              • Publisher: ➤  SPIE--the International Society for Optical Engineering
              • Publish Date:
              • Publish Location: Bellinham, Wash., USA

              “Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V” Subjects and Themes:

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              • First Year Published: 1986
              • Is Full Text Available: No
              • Is The Book Public: No
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              37Emerging lithographic technologies IV

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              • Title: ➤  Emerging lithographic technologies IV
              • Author:
              • Language: English
              • Number of Pages: Median: 900
              • Publisher: SPIE
              • Publish Date:
              • Publish Location: Bellingham, Wash

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              • First Year Published: 2000
              • Is Full Text Available: Yes
              • Is The Book Public: No
              • Access Status: Printdisabled

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                38Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III

                Book's cover

                “Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Metadata:

                • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III
                • Language: English
                • Number of Pages: Median: 470
                • Publisher: The Society
                • Publish Date:
                • Publish Location: Bellingham, Wash

                “Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Subjects and Themes:

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                • First Year Published: 1993
                • Is Full Text Available: No
                • Is The Book Public: No
                • Access Status: No_ebook

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                39EUV, X-ray, and neutron optics and sources

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                “EUV, X-ray, and neutron optics and sources” Metadata:

                • Title: ➤  EUV, X-ray, and neutron optics and sources
                • Authors:
                • Language: English
                • Number of Pages: Median: 394
                • Publisher: SPIE
                • Publish Date:
                • Publish Location: Bellingham, Wash., USA

                “EUV, X-ray, and neutron optics and sources” Subjects and Themes:

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                Access and General Info:

                • First Year Published: 1999
                • Is Full Text Available: Yes
                • Is The Book Public: No
                • Access Status: Printdisabled

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                  40Alternative lithographic technologies II

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                  • Title: ➤  Alternative lithographic technologies II
                  • Author:
                  • Language: English
                  • Publisher: SPIE
                  • Publish Date:
                  • Publish Location: Bellingham, Wash

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                  • First Year Published: 2010
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  41Nanometer structure electronics

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                  “Nanometer structure electronics” Metadata:

                  • Title: ➤  Nanometer structure electronics
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 215
                  • Publisher: Ohm
                  • Publish Date:
                  • Publish Location: Tokyo, Japan

                  “Nanometer structure electronics” Subjects and Themes:

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                  • First Year Published: 1985
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  42Microcircuit Engineering 80

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                  “Microcircuit Engineering 80” Metadata:

                  • Title: Microcircuit Engineering 80
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 566
                  • Publisher: The University
                  • Publish Date:
                  • Publish Location: Delft

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                  • First Year Published: 1981
                  • Is Full Text Available: No
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                  • Access Status: No_ebook

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                  43Proceedings of the 1983 International Symposium on Electron, Ion, and Photon Beams

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                  • Title: ➤  Proceedings of the 1983 International Symposium on Electron, Ion, and Photon Beams
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 1400
                  • Publisher: ➤  published for the American Vacuum Society by the American Institute of Physics
                  • Publish Date:
                  • Publish Location: New York

                  “Proceedings of the 1983 International Symposium on Electron, Ion, and Photon Beams” Subjects and Themes:

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                  • First Year Published: 1983
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  44Alternative lithographic technologies

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                  • Title: ➤  Alternative lithographic technologies
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                  • Language: English
                  • Publisher: SPIE
                  • Publish Date:
                  • Publish Location: Bellingham, Wash

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                  • First Year Published: 2009
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  45Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York

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                  • Title: ➤  Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 463
                  • Publisher: ➤  Published for the American Vacuum Society by the American Institute of Physics
                  • Publish Date:
                  • Publish Location: New York

                  “Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York” Subjects and Themes:

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                  • First Year Published: 1985
                  • Is Full Text Available: No
                  • Is The Book Public: No
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                  46Digest of papers, XEL '1997

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                  “Digest of papers, XEL '1997” Metadata:

                  • Title: Digest of papers, XEL '1997
                  • Author: ➤  
                  • Language: English
                  • Publisher: ➤  Japan Society for the Promotion of Sciences?
                  • Publish Date:
                  • Publish Location: [Tokyo

                  “Digest of papers, XEL '1997” Subjects and Themes:

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                  • First Year Published: 1997
                  • Is Full Text Available: No
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                  47Technology of proximal probe lithography

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                  “Technology of proximal probe lithography” Metadata:

                  • Title: ➤  Technology of proximal probe lithography
                  • Language: English
                  • Number of Pages: Median: 413
                  • Publisher: SPIE Optical Engineering Press
                  • Publish Date:
                  • Publish Location: Bellingham, Wash

                  “Technology of proximal probe lithography” Subjects and Themes:

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                  • First Year Published: 1993
                  • Is Full Text Available: No
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                  • Access Status: No_ebook

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                  48Electron-beam, x-ray, and ion-beam lithographies VI

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                  “Electron-beam, x-ray, and ion-beam lithographies VI” Metadata:

                  • Title: ➤  Electron-beam, x-ray, and ion-beam lithographies VI
                  • Language: English
                  • Number of Pages: Median: 265
                  • Publisher: The Society
                  • Publish Date:
                  • Publish Location: Bellingham, Wash., USA

                  “Electron-beam, x-ray, and ion-beam lithographies VI” Subjects and Themes:

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                  • First Year Published: 1987
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  49Emerging Lithographic Technologies XII

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                  • Title: ➤  Emerging Lithographic Technologies XII
                  • Author:
                  • Language: English
                  • Number of Pages: Median: 1144
                  • Publisher: SPIE
                  • Publish Date:

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                  • First Year Published: 2008
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  50Alternative lithographic technologies III

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                  “Alternative lithographic technologies III” Metadata:

                  • Title: ➤  Alternative lithographic technologies III
                  • Author:
                  • Language: English
                  • Publisher: SPIE
                  • Publish Date:
                  • Publish Location: Bellingham, Wash

                  “Alternative lithographic technologies III” Subjects and Themes:

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                  • First Year Published: 2011
                  • Is Full Text Available: No
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                  • Access Status: No_ebook

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                  Wiki

                  Source: Wikipedia

                  Wikipedia Results

                  Search Results from Wikipedia

                  Electron-beam lithography

                  Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes

                  Maskless lithography

                  used form of maskless lithography today is electron beam lithography. Its widespread use is due to the wide range of electron beam systems available accessing

                  Ion beam lithography

                  compared to x-ray and e-beam lithography. Ion-beam lithography, or ion-projection lithography, is similar to Electron beam lithography, but uses much heavier

                  X-ray lithography

                  prints. X-rays generate secondary electrons as in the cases of extreme ultraviolet lithography and electron beam lithography. While the fine pattern definition

                  Next-generation lithography

                  any lithography method which uses a shorter-wavelength light or beam type than the current state of the art, such as X-ray lithography, electron beam lithography

                  Electron

                  materials that would otherwise be considered unsuitable for welding. Electron-beam lithography (EBL) is a method of etching semiconductors at resolutions smaller

                  Proximity effect (electron beam lithography)

                  The proximity effect in electron beam lithography (EBL) is the phenomenon that the exposure dose distribution, and hence the developed pattern, is wider

                  Photolithography

                  as electron beam lithography, X-ray lithography, extreme ultraviolet lithography and ion projection lithography. Extreme ultraviolet lithography has

                  David K. Lam

                  Corporation (Santa Clara, CA), which manufactures complementary electron beam lithography (CEBL) systems. He also heads the David Lam Group, an investor

                  Alec Broers, Baron Broers

                  the National Academy of Engineering for contributions to electronic beam lithography and microscopy and for leadership in microfabrication. Broers was born


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