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1Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)

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“Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)” Metadata:

  • Title: ➤  Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)
  • Author:
  • Language: English
  • Number of Pages: Median: 307
  • Publisher: ➤  Society of Photo Optical - The Society
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1988
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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2Electron-Beam, X-Ray, and Ion-Beam Technology

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“Electron-Beam, X-Ray, and Ion-Beam Technology” Metadata:

  • Title: ➤  Electron-Beam, X-Ray, and Ion-Beam Technology
  • Author:
  • Language: English
  • Number of Pages: Median: 344
  • Publisher: ➤  SPIE--the International Society for Optical Engineering - SPIE-International Society for Optical Engine
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-Beam, X-Ray, and Ion-Beam Technology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1990
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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3Resists in microlithography and printing

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“Resists in microlithography and printing” Metadata:

  • Title: ➤  Resists in microlithography and printing
  • Author:
  • Language: English
  • Number of Pages: Median: 376
  • Publisher: Elsevier
  • Publish Date:
  • Publish Location: Amsterdam - New York

“Resists in microlithography and printing” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1993
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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4Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV

Book's cover

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV
  • Language: English
  • Number of Pages: Median: 219
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1985
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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5Dry processing for submicrometer lithography

Book's cover

“Dry processing for submicrometer lithography” Metadata:

  • Title: ➤  Dry processing for submicrometer lithography
  • Language: English
  • Number of Pages: Median: 307
  • Publisher: The Society
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Dry processing for submicrometer lithography” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1990
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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6Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II

Book's cover

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II
  • Language: English
  • Number of Pages: Median: 488
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1992
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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7Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV

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“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV
  • Language: English
  • Number of Pages: Median: 420
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1994
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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8Emerging lithographic technologies V

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“Emerging lithographic technologies V” Metadata:

  • Title: ➤  Emerging lithographic technologies V
  • Author:
  • Language: English
  • Number of Pages: Median: 818
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies V” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2001
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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9Emerging lithographic technologies II

Book's cover

“Emerging lithographic technologies II” Metadata:

  • Title: ➤  Emerging lithographic technologies II
  • Language: English
  • Number of Pages: Median: 702
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies II” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1998
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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10Emerging lithographic technologies VIII

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“Emerging lithographic technologies VIII” Metadata:

  • Title: ➤  Emerging lithographic technologies VIII
  • Author:
  • Language: English
  • Number of Pages: Median: 1110
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Emerging lithographic technologies VIII” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2004
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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11Emerging lithographic technologies

Book's cover

“Emerging lithographic technologies” Metadata:

  • Title: ➤  Emerging lithographic technologies
  • Language: English
  • Number of Pages: Median: 412
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1997
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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12Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III

Book's cover

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III
  • Language: English
  • Number of Pages: Median: 136
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1984
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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13Emerging lithographic technologies III

Book's cover

“Emerging lithographic technologies III” Metadata:

  • Title: ➤  Emerging lithographic technologies III
  • Language: English
  • Number of Pages: Median: 864
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging lithographic technologies III” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1999
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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14Electron-beam, X-ray, and ion-beam technology

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Book's cover

“Electron-beam, X-ray, and ion-beam technology” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam technology
  • Author:
  • Language: English
  • Number of Pages: Median: 388
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, and ion-beam technology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1989
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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15Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V

Book's cover

“Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V” Metadata:

  • Title: ➤  Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V
  • Language: English
  • Number of Pages: Median: 272
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1986
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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16Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V

Book's cover

“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V” Metadata:

  • Title: ➤  Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V
  • Language: English
  • Number of Pages: Median: 450
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1995
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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17Emerging Lithographic Technologies VII

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“Emerging Lithographic Technologies VII” Metadata:

  • Title: ➤  Emerging Lithographic Technologies VII
  • Author:
  • Language: English
  • Number of Pages: Median: 1142
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Emerging Lithographic Technologies VII” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2003
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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18Nanofabrication

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“Nanofabrication” Metadata:

  • Title: Nanofabrication
  • Author:
  • Language: English
  • Number of Pages: Median: 700
  • Publisher: ➤  World Scientific Publishing Company - World Scientific Publishing Co Pte Ltd
  • Publish Date:

“Nanofabrication” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 2007
  • Is Full Text Available: No
  • Is The Book Public: No
  • Access Status: No_ebook

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    19Emerging lithographic technologies XI

    “Emerging lithographic technologies XI” Metadata:

    • Title: ➤  Emerging lithographic technologies XI
    • Language: English
    • Publisher: SPIE
    • Publish Date:
    • Publish Location: Bellingham, Wash

    “Emerging lithographic technologies XI” Subjects and Themes:

    Edition Identifiers:

    Access and General Info:

    • First Year Published: 2007
    • Is Full Text Available: No
    • Is The Book Public: No
    • Access Status: No_ebook

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    20Nanofabrication

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    “Nanofabrication” Metadata:

    • Title: Nanofabrication
    • Language: English
    • Number of Pages: Median: 574
    • Publisher: World Scientific
    • Publish Date:
    • Publish Location: Hackensack, N.J - Singapore

    “Nanofabrication” Subjects and Themes:

    Edition Identifiers:

    Access and General Info:

    • First Year Published: 2008
    • Is Full Text Available: No
    • Is The Book Public: No
    • Access Status: No_ebook

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    21Emerging Lithographic Techniques VI

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    “Emerging Lithographic Techniques VI” Metadata:

    • Title: ➤  Emerging Lithographic Techniques VI
    • Author:
    • Number of Pages: Median: 508
    • Publisher: ➤  SPIE Society of Photo-Optical Instrumentation Engi
    • Publish Date:

    “Emerging Lithographic Techniques VI” Subjects and Themes:

    Edition Identifiers:

    Access and General Info:

    • First Year Published: 2002
    • Is Full Text Available: No
    • Is The Book Public: No
    • Access Status: No_ebook

    Online Access

    Downloads Are Not Available:

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      22Emerging Lithographic Technologies 9

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      Book's cover

      “Emerging Lithographic Technologies 9” Metadata:

      • Title: ➤  Emerging Lithographic Technologies 9
      • Author:
      • Language: English
      • Number of Pages: Median: 1286
      • Publisher: ➤  SPIE-International Society for Optical Engine
      • Publish Date:

      “Emerging Lithographic Technologies 9” Subjects and Themes:

      Edition Identifiers:

      Access and General Info:

      • First Year Published: 2005
      • Is Full Text Available: No
      • Is The Book Public: No
      • Access Status: No_ebook

      Online Access

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        23The physics of submicron lithography

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        “The physics of submicron lithography” Metadata:

        • Title: ➤  The physics of submicron lithography
        • Author:
        • Language: English
        • Number of Pages: Median: 493
        • Publisher: Plenum Press
        • Publish Date:
        • Publish Location: New York

        “The physics of submicron lithography” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 1992
        • Is Full Text Available: Yes
        • Is The Book Public: No
        • Access Status: Printdisabled

        Online Access

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          24Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii

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          “Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii” Metadata:

          • Title: ➤  Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii
          • Author:
          • Language: rus
          • Number of Pages: Median: 125
          • Publisher: "Radio i svi͡a︡zʹ"
          • Publish Date:
          • Publish Location: Moskva

          “Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1985
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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          25Metallic structures with reduced dimensions

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          “Metallic structures with reduced dimensions” Metadata:

          • Title: ➤  Metallic structures with reduced dimensions
          • Author:
          • Languages: English - dut
          • Number of Pages: Median: 136
          • Publisher: Sine nomine
          • Publish Date:
          • Publish Location: [s.l.]

          “Metallic structures with reduced dimensions” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1991
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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          26Patterning of material layers in submicron region

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          Book's cover

          “Patterning of material layers in submicron region” Metadata:

          • Title: ➤  Patterning of material layers in submicron region
          • Author:
          • Language: English
          • Number of Pages: Median: 183
          • Publisher: J. Wiley
          • Publish Date:
          • Publish Location: New York

          “Patterning of material layers in submicron region” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1993
          • Is Full Text Available: Yes
          • Is The Book Public: No
          • Access Status: Printdisabled

          Online Access

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            27On electron beam lithography for LSI circuit fabrication

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            “On electron beam lithography for LSI circuit fabrication” Metadata:

            • Title: ➤  On electron beam lithography for LSI circuit fabrication
            • Author:
            • Language: English
            • Number of Pages: Median: 14
            • Publisher: ➤  Royal Institute of Technology, Dept. of Applied Electronics
            • Publish Date:
            • Publish Location: Stockholm

            “On electron beam lithography for LSI circuit fabrication” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 1979
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            28Design technology co-optimization in the era of sub-resolution IC scaling

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            “Design technology co-optimization in the era of sub-resolution IC scaling” Metadata:

            • Title: ➤  Design technology co-optimization in the era of sub-resolution IC scaling
            • Author:
            • Language: English
            • Publisher: SPIE
            • Publish Date:
            • Publish Location: Bellingham, Washington

            “Design technology co-optimization in the era of sub-resolution IC scaling” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 2016
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            29Electron-beam lithography contributions from Jena

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            “Electron-beam lithography contributions from Jena” Metadata:

            • Title: ➤  Electron-beam lithography contributions from Jena
            • Author:
            • Language: English
            • Number of Pages: Median: 167
            • Publisher: Verlag Vopelius
            • Publish Date:
            • Publish Location: Jena

            “Electron-beam lithography contributions from Jena” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 2014
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            30Alternative lithographic technologies IV

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            “Alternative lithographic technologies IV” Metadata:

            • Title: ➤  Alternative lithographic technologies IV
            • Authors:
            • Language: English
            • Publisher: SPIE
            • Publish Date:
            • Publish Location: Bellingham, Washington

            “Alternative lithographic technologies IV” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 2012
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            31Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing

            Book's cover

            “Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing” Metadata:

            • Title: ➤  Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing
            • Language: English
            • Number of Pages: Median: 340
            • Publisher: SPIE
            • Publish Date:
            • Publish Location: Bellingham, Wash

            “Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 1991
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            32Dian zi shu bao guang wei na jia gong ji shu

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            “Dian zi shu bao guang wei na jia gong ji shu” Metadata:

            • Title: ➤  Dian zi shu bao guang wei na jia gong ji shu
            • Author:
            • Language: chi
            • Number of Pages: Median: 310
            • Publisher: ➤  Beijing gong ye da xue chu ban she
            • Publish Date:
            • Publish Location: Beijing

            “Dian zi shu bao guang wei na jia gong ji shu” Subjects and Themes:

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            • First Year Published: 2004
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            33Lithography Asia 2008

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            • Title: Lithography Asia 2008
            • Authors:
            • Language: English
            • Publisher: SPIE
            • Publish Date:
            • Publish Location: Bellingham, Wash

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            • First Year Published: 2008
            • Is Full Text Available: No
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            • Access Status: No_ebook

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            34Emerging lithographic technologies X

            “Emerging lithographic technologies X” Metadata:

            • Title: ➤  Emerging lithographic technologies X
            • Language: English
            • Publisher: SPIE
            • Publish Date:
            • Publish Location: Bellingham, Wash

            “Emerging lithographic technologies X” Subjects and Themes:

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            • First Year Published: 2006
            • Is Full Text Available: No
            • Is The Book Public: No
            • Access Status: No_ebook

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            35Electron-beam technology in microelectronic fabrication

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            “Electron-beam technology in microelectronic fabrication” Metadata:

            • Title: ➤  Electron-beam technology in microelectronic fabrication
            • Author:
            • Language: English
            • Number of Pages: Median: 362
            • Publisher: Academic Press
            • Publish Date:
            • Publish Location: New York

            “Electron-beam technology in microelectronic fabrication” Subjects and Themes:

            Edition Identifiers:

            Access and General Info:

            • First Year Published: 1980
            • Is Full Text Available: Yes
            • Is The Book Public: No
            • Access Status: Printdisabled

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              36Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V

              “Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V” Metadata:

              • Title: ➤  Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V
              • Language: English
              • Number of Pages: Median: 272
              • Publisher: ➤  SPIE--the International Society for Optical Engineering
              • Publish Date:
              • Publish Location: Bellinham, Wash., USA

              “Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V” Subjects and Themes:

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              Access and General Info:

              • First Year Published: 1986
              • Is Full Text Available: No
              • Is The Book Public: No
              • Access Status: No_ebook

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              37Emerging lithographic technologies IV

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              “Emerging lithographic technologies IV” Metadata:

              • Title: ➤  Emerging lithographic technologies IV
              • Author:
              • Language: English
              • Number of Pages: Median: 900
              • Publisher: SPIE
              • Publish Date:
              • Publish Location: Bellingham, Wash

              “Emerging lithographic technologies IV” Subjects and Themes:

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              Access and General Info:

              • First Year Published: 2000
              • Is Full Text Available: Yes
              • Is The Book Public: No
              • Access Status: Printdisabled

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                38Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III

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                “Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Metadata:

                • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III
                • Language: English
                • Number of Pages: Median: 470
                • Publisher: The Society
                • Publish Date:
                • Publish Location: Bellingham, Wash

                “Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Subjects and Themes:

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                • First Year Published: 1993
                • Is Full Text Available: No
                • Is The Book Public: No
                • Access Status: No_ebook

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                39EUV, X-ray, and neutron optics and sources

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                “EUV, X-ray, and neutron optics and sources” Metadata:

                • Title: ➤  EUV, X-ray, and neutron optics and sources
                • Authors:
                • Language: English
                • Number of Pages: Median: 394
                • Publisher: SPIE
                • Publish Date:
                • Publish Location: Bellingham, Wash., USA

                “EUV, X-ray, and neutron optics and sources” Subjects and Themes:

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                Access and General Info:

                • First Year Published: 1999
                • Is Full Text Available: Yes
                • Is The Book Public: No
                • Access Status: Printdisabled

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                  40Alternative lithographic technologies II

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                  “Alternative lithographic technologies II” Metadata:

                  • Title: ➤  Alternative lithographic technologies II
                  • Author:
                  • Language: English
                  • Publisher: SPIE
                  • Publish Date:
                  • Publish Location: Bellingham, Wash

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                  • First Year Published: 2010
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  41Nanometer structure electronics

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                  “Nanometer structure electronics” Metadata:

                  • Title: ➤  Nanometer structure electronics
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 215
                  • Publisher: Ohm
                  • Publish Date:
                  • Publish Location: Tokyo, Japan

                  “Nanometer structure electronics” Subjects and Themes:

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                  • First Year Published: 1985
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  42Microcircuit Engineering 80

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                  “Microcircuit Engineering 80” Metadata:

                  • Title: Microcircuit Engineering 80
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 566
                  • Publisher: The University
                  • Publish Date:
                  • Publish Location: Delft

                  “Microcircuit Engineering 80” Subjects and Themes:

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                  • First Year Published: 1981
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  43Proceedings of the 1983 International Symposium on Electron, Ion, and Photon Beams

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                  • Title: ➤  Proceedings of the 1983 International Symposium on Electron, Ion, and Photon Beams
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 1400
                  • Publisher: ➤  published for the American Vacuum Society by the American Institute of Physics
                  • Publish Date:
                  • Publish Location: New York

                  “Proceedings of the 1983 International Symposium on Electron, Ion, and Photon Beams” Subjects and Themes:

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                  • First Year Published: 1983
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  44Alternative lithographic technologies

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                  • Title: ➤  Alternative lithographic technologies
                  • Authors:
                  • Language: English
                  • Publisher: SPIE
                  • Publish Date:
                  • Publish Location: Bellingham, Wash

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                  • First Year Published: 2009
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  45Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York

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                  “Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York” Metadata:

                  • Title: ➤  Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York
                  • Author: ➤  
                  • Language: English
                  • Number of Pages: Median: 463
                  • Publisher: ➤  Published for the American Vacuum Society by the American Institute of Physics
                  • Publish Date:
                  • Publish Location: New York

                  “Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York” Subjects and Themes:

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                  • First Year Published: 1985
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  46Digest of papers, XEL '1997

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                  “Digest of papers, XEL '1997” Metadata:

                  • Title: Digest of papers, XEL '1997
                  • Author: ➤  
                  • Language: English
                  • Publisher: ➤  Japan Society for the Promotion of Sciences?
                  • Publish Date:
                  • Publish Location: [Tokyo

                  “Digest of papers, XEL '1997” Subjects and Themes:

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                  • First Year Published: 1997
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  47Technology of proximal probe lithography

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                  “Technology of proximal probe lithography” Metadata:

                  • Title: ➤  Technology of proximal probe lithography
                  • Language: English
                  • Number of Pages: Median: 413
                  • Publisher: SPIE Optical Engineering Press
                  • Publish Date:
                  • Publish Location: Bellingham, Wash

                  “Technology of proximal probe lithography” Subjects and Themes:

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                  • First Year Published: 1993
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  48Electron-beam, x-ray, and ion-beam lithographies VI

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                  “Electron-beam, x-ray, and ion-beam lithographies VI” Metadata:

                  • Title: ➤  Electron-beam, x-ray, and ion-beam lithographies VI
                  • Language: English
                  • Number of Pages: Median: 265
                  • Publisher: The Society
                  • Publish Date:
                  • Publish Location: Bellingham, Wash., USA

                  “Electron-beam, x-ray, and ion-beam lithographies VI” Subjects and Themes:

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                  Access and General Info:

                  • First Year Published: 1987
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  49Emerging Lithographic Technologies XII

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                  “Emerging Lithographic Technologies XII” Metadata:

                  • Title: ➤  Emerging Lithographic Technologies XII
                  • Author:
                  • Language: English
                  • Number of Pages: Median: 1144
                  • Publisher: SPIE
                  • Publish Date:

                  “Emerging Lithographic Technologies XII” Subjects and Themes:

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                  Access and General Info:

                  • First Year Published: 2008
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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                  50Alternative lithographic technologies III

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                  “Alternative lithographic technologies III” Metadata:

                  • Title: ➤  Alternative lithographic technologies III
                  • Author:
                  • Language: English
                  • Publisher: SPIE
                  • Publish Date:
                  • Publish Location: Bellingham, Wash

                  “Alternative lithographic technologies III” Subjects and Themes:

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                  • First Year Published: 2011
                  • Is Full Text Available: No
                  • Is The Book Public: No
                  • Access Status: No_ebook

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