Explore: Ion Beam Lithography
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AI-Generated Overview About “ion-beam-lithography”:
Books Results
Source: The Open Library
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Search results from The Open Library
1Stereolithography and other RP&M technologies
By Paul F. Jacobs
“Stereolithography and other RP&M technologies” Metadata:
- Title: ➤ Stereolithography and other RP&M technologies
- Author: Paul F. Jacobs
- Language: English
- Number of Pages: Median: 392
- Publisher: ➤ ASME Press - Society of Manufacturing Engineers in cooperation with the Rapid Prototyping Association of SME
- Publish Date: 1996
- Publish Location: New York - Dearborn, Mich
“Stereolithography and other RP&M technologies” Subjects and Themes:
- Subjects: ➤ Data processing - Industrial Design - Design, Industrial - Patternmaking - CAD/CAM systems - Ion beam lithography - Rapid prototyping - Rapid tooling - Tasarım, Endüstriyel - Bilgi işlem - Hızlı prototip üretme - Model çıkarma - Rapid Prototyping (Fertigung) - Stereolithographie
Edition Identifiers:
- The Open Library ID: OL819455M
- Online Computer Library Center (OCLC) ID: 34012443
- Library of Congress Control Number (LCCN): 95070369
- All ISBNs: 9780872634671 - 0872634671
Access and General Info:
- First Year Published: 1996
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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2Methods and Materials in Microelectronic Technology
By Joachim Bargon
“Methods and Materials in Microelectronic Technology” Metadata:
- Title: ➤ Methods and Materials in Microelectronic Technology
- Author: Joachim Bargon
- Language: English
- Number of Pages: Median: 376
- Publisher: ➤ Springer - Springer London, Limited
- Publish Date: 1984 - 2012 - 2013
“Methods and Materials in Microelectronic Technology” Subjects and Themes:
- Subjects: ➤ Congresses - Photolithography - Ion beam lithography - X-ray lithography - Very large scale integration - Integrated circuits - Design and construction
Edition Identifiers:
- The Open Library ID: OL10323517M - OL37224921M - OL37161456M
- Online Computer Library Center (OCLC) ID: 10913539
- Library of Congress Control Number (LCCN): 84013352
- All ISBNs: ➤ 9781468448474 - 1468448471 - 0306418037 - 9781468448498 - 1468448498 - 9780306418037
Access and General Info:
- First Year Published: 1984
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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3Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)
By Arnold W. Yanof
“Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)” Metadata:
- Title: ➤ Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)
- Author: Arnold W. Yanof
- Language: English
- Number of Pages: Median: 307
- Publisher: ➤ Society of Photo Optical - The Society
- Publish Date: 1988
- Publish Location: Bellingham, Wash., USA
“Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)” Subjects and Themes:
- Subjects: Electron beam Lithography - Congresses - Ion beam lithography - X-ray lithography
Edition Identifiers:
- The Open Library ID: OL2064539M - OL8231814M
- Online Computer Library Center (OCLC) ID: 18446375
- Library of Congress Control Number (LCCN): 88060782
- All ISBNs: 089252958X - 9780892529582
Access and General Info:
- First Year Published: 1988
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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4Electron-Beam, X-Ray, and Ion-Beam Technology
By Douglas J. Resnick
“Electron-Beam, X-Ray, and Ion-Beam Technology” Metadata:
- Title: ➤ Electron-Beam, X-Ray, and Ion-Beam Technology
- Author: Douglas J. Resnick
- Language: English
- Number of Pages: Median: 344
- Publisher: ➤ SPIE--the International Society for Optical Engineering - SPIE-International Society for Optical Engine
- Publish Date: 1990
- Publish Location: Bellingham, Wash., USA
“Electron-Beam, X-Ray, and Ion-Beam Technology” Subjects and Themes:
- Subjects: Electron beam Lithography - Congresses - X-ray lithography - Ion beam lithography
Edition Identifiers:
- The Open Library ID: OL15302038M - OL11392660M
- Online Computer Library Center (OCLC) ID: 21914564
- Library of Congress Control Number (LCCN): 90060893
- All ISBNs: 0819403105 - 9780819403100
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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5Ion tracks and microtechnology
By Reimar Spohr
“Ion tracks and microtechnology” Metadata:
- Title: Ion tracks and microtechnology
- Author: Reimar Spohr
- Language: English
- Number of Pages: Median: 272
- Publisher: ➤ Springer Vieweg. in Springer Fachmedien Wiesbaden GmbH - Vieweg
- Publish Date: 1990 - 2012
- Publish Location: Braunschweig
“Ion tracks and microtechnology” Subjects and Themes:
- Subjects: ➤ Effect of radiation on - Industrial applications - Ion beam lithography - Ion bombardment - Materials - Ionenspur - Mikrosystemtechnik - Ion - Spur
Edition Identifiers:
- The Open Library ID: OL1982642M - OL36709126M
- Library of Congress Control Number (LCCN): 90229102
- All ISBNs: 9783322831040 - 3322831043 - 3528063300 - 9783528063306
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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6Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV
“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV” Metadata:
- Title: ➤ Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV
- Language: English
- Number of Pages: Median: 219
- Publisher: ➤ SPIE--the International Society for Optical Engineering
- Publish Date: 1985
- Publish Location: Bellingham, Wash., USA
“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV” Subjects and Themes:
- Subjects: Electron beam Lithography - Congresses - Ion beam lithography - X-ray lithography
Edition Identifiers:
- The Open Library ID: OL2555174M
- Library of Congress Control Number (LCCN): 85061233
- All ISBNs: 9780892525720 - 089252572X
Access and General Info:
- First Year Published: 1985
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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7Dry processing for submicrometer lithography
“Dry processing for submicrometer lithography” Metadata:
- Title: ➤ Dry processing for submicrometer lithography
- Language: English
- Number of Pages: Median: 307
- Publisher: The Society
- Publish Date: 1990
- Publish Location: Bellingham, Wash., USA
“Dry processing for submicrometer lithography” Subjects and Themes:
- Subjects: ➤ Electron beam Lithography - Congresses - Etching - Plasma etching - Semiconductors - Ion beam lithography - Microelectronics - Microlithography - Photolithography
Edition Identifiers:
- The Open Library ID: OL2218016M
- Online Computer Library Center (OCLC) ID: 508158041
- Library of Congress Control Number (LCCN): 89043521
- All ISBNs: 9780819402219 - 0819402214
Access and General Info:
- First Year Published: 1990
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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8Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II
“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Metadata:
- Title: ➤ Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II
- Language: English
- Number of Pages: Median: 488
- Publisher: SPIE
- Publish Date: 1992
- Publish Location: Bellingham, Wash
“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Subjects and Themes:
- Subjects: ➤ Electron beam Lithography - Congresses - Etching - Ion beam lithography - X-ray lithography - Semiconductors - Masks (Electronics)
Edition Identifiers:
- The Open Library ID: OL1746392M
- Online Computer Library Center (OCLC) ID: 26466509
- Library of Congress Control Number (LCCN): 92060181
- All ISBNs: 9780819408266 - 0819408263
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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9Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV
“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Metadata:
- Title: ➤ Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV
- Language: English
- Number of Pages: Median: 420
- Publisher: SPIE
- Publish Date: 1994
- Publish Location: Bellingham, Wash
“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Subjects and Themes:
- Subjects: ➤ Electron beam Lithography - Congresses - Etching - Ion beam lithography - X-ray lithography - Semiconductors - Masks (Electronics) - Lithography, electron beam
Edition Identifiers:
- The Open Library ID: OL1124522M
- Online Computer Library Center (OCLC) ID: 30614005
- Library of Congress Control Number (LCCN): 94065789
- All ISBNs: 0819414891 - 9780819414892
Access and General Info:
- First Year Published: 1994
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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10Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III
“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III” Metadata:
- Title: ➤ Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III
- Language: English
- Number of Pages: Median: 136
- Publisher: ➤ SPIE--the International Society for Optical Engineering
- Publish Date: 1984
- Publish Location: Bellingham, Wash., USA
“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III” Subjects and Themes:
- Subjects: Electron beam Lithography - Congresses - Ion beam lithography - X-ray lithography
Edition Identifiers:
- The Open Library ID: OL2870262M
- Library of Congress Control Number (LCCN): 84050821
- All ISBNs: 0892525061 - 9780892525065
Access and General Info:
- First Year Published: 1984
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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11Electron-beam, X-ray, and ion-beam technology
By Arnold W. Yanof
“Electron-beam, X-ray, and ion-beam technology” Metadata:
- Title: ➤ Electron-beam, X-ray, and ion-beam technology
- Author: Arnold W. Yanof
- Language: English
- Number of Pages: Median: 388
- Publisher: SPIE
- Publish Date: 1989
- Publish Location: Bellingham, Wash., USA
“Electron-beam, X-ray, and ion-beam technology” Subjects and Themes:
- Subjects: Electron beam Lithography - Congresses - Ion beam lithography - X-ray lithography
Edition Identifiers:
- The Open Library ID: OL2222711M
- Online Computer Library Center (OCLC) ID: 508208332
- Library of Congress Control Number (LCCN): 89060655
- All ISBNs: 0819401242 - 9780819401243
Access and General Info:
- First Year Published: 1989
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
Online Access
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12Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V
“Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V” Metadata:
- Title: ➤ Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V
- Language: English
- Number of Pages: Median: 272
- Publisher: ➤ SPIE--the International Society for Optical Engineering
- Publish Date: 1986
- Publish Location: Bellingham, Wash., USA
“Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V” Subjects and Themes:
- Subjects: Electron beam Lithography - Congresses - Ion beam lithography - X-ray lithography - Microlithography
Edition Identifiers:
- The Open Library ID: OL2743457M
- Online Computer Library Center (OCLC) ID: 13981354
- Library of Congress Control Number (LCCN): 86061034
- All ISBNs: 089252667X - 9780892526673
Access and General Info:
- First Year Published: 1986
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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13Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V
“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V” Metadata:
- Title: ➤ Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V
- Language: English
- Number of Pages: Median: 450
- Publisher: SPIE
- Publish Date: 1995
- Publish Location: Bellingham, Wash., USA
“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V” Subjects and Themes:
- Subjects: ➤ Electron beam Lithography - Congresses - Integrated circuits - Ion beam lithography - X-ray lithography - Masks - Extreme ultraviolet lithography - Lithography, electron beam - Masks (electronics)
Edition Identifiers:
- The Open Library ID: OL1126867M
- Online Computer Library Center (OCLC) ID: 32644238
- Library of Congress Control Number (LCCN): 94069900
- All ISBNs: 0819417858 - 9780819417855
Access and General Info:
- First Year Published: 1995
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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14Job Pierson family papers
By SPIE
“Job Pierson family papers” Metadata:
- Title: Job Pierson family papers
- Author: SPIE
- Language: English
- Number of Pages: Median: 242
- Publisher: SPIE
- Publish Date: 1983
- Publish Location: Bellingham, Wash., USA
“Job Pierson family papers” Subjects and Themes:
- Subjects: ➤ Politics and government - Social life and customs - Conversion - Williams College - Students - Presbyterian Church - Christianity - Clergy - Real property - Electron beam Lithography - Ion beam lithography - X-ray lithography - Congresses
Edition Identifiers:
- The Open Library ID: OL3190359M
- Online Computer Library Center (OCLC) ID: 10089729
- Library of Congress Control Number (LCCN): 83061531
- All ISBNs: 9780892524280 - 0892524286
Author's Alternative Names:
"Spie", "Society of Photo-optical Instrumentation Engineers", "Society of Photo-Optical Instrumentation Engineers", "Society of Photo-Optical Instrumentation Engineers Staff", "SPIE", "Society of Photo-Optical Instrumentation", "Society of Photo-optical Instrumentation Engineers.", "Spie Society", "SPIE (Society)", "Society of Photographic Instrumentation Engineers" and "SPIE (Society) Staff",Access and General Info:
- First Year Published: 1983
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Borrowable
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15Rapid Prototyping & Manufacturing
By Paul F. Jacobs
“Rapid Prototyping & Manufacturing” Metadata:
- Title: ➤ Rapid Prototyping & Manufacturing
- Author: Paul F. Jacobs
- Language: English
- Number of Pages: Median: 434
- Publisher: ➤ Society of Manufacturing Engineers in cooperation with the Computer and Automated Systems Association of SME - Mcgraw-Hill (Tx)
- Publish Date: 1992 - 1993
- Publish Location: Dearborn, MI
“Rapid Prototyping & Manufacturing” Subjects and Themes:
- Subjects: Rapid prototyping - CAD/CAM systems - Ion beam lithography
Edition Identifiers:
- The Open Library ID: OL9958744M - OL1753246M - OL18625958M
- Library of Congress Control Number (LCCN): 92081454
- All ISBNs: 9780872634251 - 9780070324336 - 0872634256 - 0070324336
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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16The physics of submicron lithography
By Kamilʹ Akhmetovich Valiev
“The physics of submicron lithography” Metadata:
- Title: ➤ The physics of submicron lithography
- Author: Kamilʹ Akhmetovich Valiev
- Language: English
- Number of Pages: Median: 493
- Publisher: Plenum Press
- Publish Date: 1992
- Publish Location: New York
“The physics of submicron lithography” Subjects and Themes:
- Subjects: Electron beam Lithography - Ion beam lithography - Physics - X-ray lithography - Lithography, electron beam
Edition Identifiers:
- The Open Library ID: OL1560032M
- Online Computer Library Center (OCLC) ID: 24845420
- Library of Congress Control Number (LCCN): 91041122
- All ISBNs: 0306435780 - 9780306435782
Access and General Info:
- First Year Published: 1992
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
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17Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii
By V. K. Popov
“Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii” Metadata:
- Title: ➤ Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii
- Author: V. K. Popov
- Language: rus
- Number of Pages: Median: 125
- Publisher: "Radio i svi͡a︡zʹ"
- Publish Date: 1985
- Publish Location: Moskva
“Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii” Subjects and Themes:
- Subjects: Electron beam Lithography - Ion beam lithography - Microelectronics
Edition Identifiers:
- The Open Library ID: OL2650233M
- Library of Congress Control Number (LCCN): 85231530
Access and General Info:
- First Year Published: 1985
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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18Methods and materials in microelectronic technology
By International Symposium on Methods and Materials in Microelectronic Technology (1982 Bad Neuenahr-Ahrweiler, Germany)
“Methods and materials in microelectronic technology” Metadata:
- Title: ➤ Methods and materials in microelectronic technology
- Author: ➤ International Symposium on Methods and Materials in Microelectronic Technology (1982 Bad Neuenahr-Ahrweiler, Germany)
- Language: English
- Number of Pages: Median: 367
- Publisher: Plenum Press
- Publish Date: 1984
- Publish Location: New York
“Methods and materials in microelectronic technology” Subjects and Themes:
- Subjects: ➤ Congresses - Design and construction - Integrated circuits - Ion beam lithography - Photolithography - Very large scale integration - X-ray lithography
Edition Identifiers:
- The Open Library ID: OL2851047M
- Library of Congress Control Number (LCCN): 84013352
- All ISBNs: 9780306418037 - 0306418037
Access and General Info:
- First Year Published: 1984
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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19Patterning of material layers in submicron region
By U. S. Tandon
“Patterning of material layers in submicron region” Metadata:
- Title: ➤ Patterning of material layers in submicron region
- Author: U. S. Tandon
- Language: English
- Number of Pages: Median: 183
- Publisher: J. Wiley
- Publish Date: 1993
- Publish Location: New York
“Patterning of material layers in submicron region” Subjects and Themes:
- Subjects: ➤ Electron beam Lithography - Integrated circuits - Ion beam lithograph - Masks - X-ray lithography - Masks (electronics) - Ion beam lithography
Edition Identifiers:
- The Open Library ID: OL1731542M
- Online Computer Library Center (OCLC) ID: 27036323
- Library of Congress Control Number (LCCN): 92036072
- All ISBNs: 0470220635 - 8122405614 - 9780470220634 - 9788122405613
Access and General Info:
- First Year Published: 1993
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
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20A fast ion beam pattern generator
By Hendrik Nicolaas Slingerland
“A fast ion beam pattern generator” Metadata:
- Title: ➤ A fast ion beam pattern generator
- Author: Hendrik Nicolaas Slingerland
- Language: English
- Number of Pages: Median: 176
- Publisher: Sine nomine
- Publish Date: 1988
- Publish Location: Netherlands
“A fast ion beam pattern generator” Subjects and Themes:
- Subjects: Ion beam lithography - Semiconductor wafers
Edition Identifiers:
- The Open Library ID: OL56991822M
- Online Computer Library Center (OCLC) ID: 20155604
- All ISBNs: 9789090020563 - 909002056X
Access and General Info:
- First Year Published: 1988
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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21Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing
“Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing” Metadata:
- Title: ➤ Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing
- Language: English
- Number of Pages: Median: 340
- Publisher: SPIE
- Publish Date: 1991
- Publish Location: Bellingham, Wash
“Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing” Subjects and Themes:
- Subjects: Electron beam Lithography - Congresses - Ion beam lithography - X-ray lithography
Edition Identifiers:
- The Open Library ID: OL1569586M
- Online Computer Library Center (OCLC) ID: 24449213
- Library of Congress Control Number (LCCN): 91061058
- All ISBNs: 9780819405647 - 0819405647
Access and General Info:
- First Year Published: 1991
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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22Dian zi shu bao guang wei na jia gong ji shu
By Wenqi Gu
“Dian zi shu bao guang wei na jia gong ji shu” Metadata:
- Title: ➤ Dian zi shu bao guang wei na jia gong ji shu
- Author: Wenqi Gu
- Language: chi
- Number of Pages: Median: 310
- Publisher: ➤ Beijing gong ye da xue chu ban she
- Publish Date: 2004
- Publish Location: Beijing
“Dian zi shu bao guang wei na jia gong ji shu” Subjects and Themes:
- Subjects: Electron beam Lithography - Ion beam lithography - Electron beams - Ion bombardment
Edition Identifiers:
- The Open Library ID: OL31313172M
- Online Computer Library Center (OCLC) ID: 57301583
- Library of Congress Control Number (LCCN): 2010406469
- All ISBNs: 7563913009 - 9787563913008
Access and General Info:
- First Year Published: 2004
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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23Ju jiao li zi shu wei na jia gong ji shu
By Wenqi Gu
“Ju jiao li zi shu wei na jia gong ji shu” Metadata:
- Title: ➤ Ju jiao li zi shu wei na jia gong ji shu
- Author: Wenqi Gu
- Language: chi
- Number of Pages: Median: 344
- Publisher: ➤ Beijing gong ye da xue chu ban she
- Publish Date: 2006
- Publish Location: Beijing
“Ju jiao li zi shu wei na jia gong ji shu” Subjects and Themes:
- Subjects: ➤ Ion bombardment - Industrial applications - Ion beam lithography - Nanostructures - Nanotechnology - Microlithography
Edition Identifiers:
- The Open Library ID: OL31311714M
- Online Computer Library Center (OCLC) ID: 170936371
- Library of Congress Control Number (LCCN): 2010405522
- All ISBNs: 9787563916900 - 7563916903
Access and General Info:
- First Year Published: 2006
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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24Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V
“Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V” Metadata:
- Title: ➤ Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V
- Language: English
- Number of Pages: Median: 272
- Publisher: ➤ SPIE--the International Society for Optical Engineering
- Publish Date: 1986
- Publish Location: Bellinham, Wash., USA
“Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V” Subjects and Themes:
- Subjects: Electron beam Lithography - Congresses - Ion beam lithography - X-ray lithography
Edition Identifiers:
- The Open Library ID: OL16429722M
- All ISBNs: 089252667
Access and General Info:
- First Year Published: 1986
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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25Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III
“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Metadata:
- Title: ➤ Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III
- Language: English
- Number of Pages: Median: 470
- Publisher: The Society
- Publish Date: 1993
- Publish Location: Bellingham, Wash
“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Subjects and Themes:
- Subjects: ➤ Electron beam Lithography - Congresses - Etching - Ion beam lithography - X-ray lithography - Semiconductors - Masks (Electronics)
Edition Identifiers:
- The Open Library ID: OL1445670M
- Online Computer Library Center (OCLC) ID: 28538564
- Library of Congress Control Number (LCCN): 93084071
- All ISBNs: 9780819411587 - 0819411582
Access and General Info:
- First Year Published: 1993
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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26EUV, X-ray, and neutron optics and sources
By Carolyn MacDonald, Kenneth Goldberg and Juan Maldonado
“EUV, X-ray, and neutron optics and sources” Metadata:
- Title: ➤ EUV, X-ray, and neutron optics and sources
- Authors: Carolyn MacDonaldKenneth GoldbergJuan Maldonado
- Language: English
- Number of Pages: Median: 394
- Publisher: SPIE
- Publish Date: 1999
- Publish Location: Bellingham, Wash., USA
“EUV, X-ray, and neutron optics and sources” Subjects and Themes:
- Subjects: ➤ Neutron sources - Electron beam Lithography - Congresses - Ion beam lithography - X-ray optics - Extreme ultraviolet lithography - X-rays, industrial applications - Lithography, electron beam - Grenz rays
Edition Identifiers:
- The Open Library ID: OL6900474M
- Online Computer Library Center (OCLC) ID: 43290164
- Library of Congress Control Number (LCCN): 00710730
- All ISBNs: 0819432539 - 9780819432537
Access and General Info:
- First Year Published: 1999
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
Online Access
Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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27Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York
By International Symposium on Electron, Ion, and Photon Beams (2nd 1984 Tarrytown, N.Y.)
“Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York” Metadata:
- Title: ➤ Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York
- Author: ➤ International Symposium on Electron, Ion, and Photon Beams (2nd 1984 Tarrytown, N.Y.)
- Language: English
- Number of Pages: Median: 463
- Publisher: ➤ Published for the American Vacuum Society by the American Institute of Physics
- Publish Date: 1985
- Publish Location: New York
“Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York” Subjects and Themes:
- Subjects: ➤ Congresses - Electron beam Lithography - Etching - Ion beam lithography - Lithography, Electron beam - Photolithography - Semiconductors
Edition Identifiers:
- The Open Library ID: OL14751693M
- Library of Congress Control Number (LCCN): 84073561
- All ISBNs: 0883184648 - 9780883184646
Access and General Info:
- First Year Published: 1985
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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28Dian zi shu sao miao pu guang ji shu
By Kehua Wu
“Dian zi shu sao miao pu guang ji shu” Metadata:
- Title: ➤ Dian zi shu sao miao pu guang ji shu
- Author: Kehua Wu
- Language: chi
- Number of Pages: Median: 425
- Publisher: ➤ Xin hua shu dian Beijing fa xing suo fa xing - Yu hang chu ban she
- Publish Date: 1985
- Publish Location: [Peking]
“Dian zi shu sao miao pu guang ji shu” Subjects and Themes:
- Subjects: Electron Lithography - Electron beams - Ion beam lithography - Ion bombardment - Lithography, Electron
Edition Identifiers:
- The Open Library ID: OL16466083M
- Library of Congress Control Number (LCCN): 86189134
Access and General Info:
- First Year Published: 1985
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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29Electron-beam, x-ray, and ion-beam lithographies VI
“Electron-beam, x-ray, and ion-beam lithographies VI” Metadata:
- Title: ➤ Electron-beam, x-ray, and ion-beam lithographies VI
- Language: English
- Number of Pages: Median: 265
- Publisher: The Society
- Publish Date: 1987
- Publish Location: Bellingham, Wash., USA
“Electron-beam, x-ray, and ion-beam lithographies VI” Subjects and Themes:
- Subjects: Electron beam Lithography - Congresses - Ion beam lithography - X-ray lithography - Microlithography
Edition Identifiers:
- The Open Library ID: OL2410840M
- Online Computer Library Center (OCLC) ID: 506773759
- Library of Congress Control Number (LCCN): 87060741
- All ISBNs: 0892528087 - 9780892528080
Access and General Info:
- First Year Published: 1987
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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30Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI
“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI” Metadata:
- Title: ➤ Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI
- Language: English
- Number of Pages: Median: 412
- Publisher: SPIE
- Publish Date: 1996
- Publish Location: Bellingham, Wash
“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI” Subjects and Themes:
- Subjects: ➤ Electron beam Lithography - Congresses - Integrated circuits - Ion beam lithography - X-ray lithography - Masks - Extreme ultraviolet lithography - Masks (electronics) - Lithography, electron beam
Edition Identifiers:
- The Open Library ID: OL820467M
- Online Computer Library Center (OCLC) ID: 35192949
- Library of Congress Control Number (LCCN): 95072312
- All ISBNs: 0819420999 - 9780819420992
Access and General Info:
- First Year Published: 1996
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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31Stereolithography
By Paulo Bártolo
“Stereolithography” Metadata:
- Title: Stereolithography
- Author: Paulo Bártolo
- Language: English
- Number of Pages: Median: 352
- Publisher: ➤ Springer - Springer Science+Business Media, LLC
- Publish Date: 2011
- Publish Location: Boston, MA
“Stereolithography” Subjects and Themes:
- Subjects: ➤ Engineering - Engineering design - Industrial engineering - Materials - Manufacturing processes - Ion beam lithography
Edition Identifiers:
- The Open Library ID: OL25563715M
- Library of Congress Control Number (LCCN): 2011921342
- All ISBNs: 0387929045 - 9780387929040 - 0387929037 - 9780387929033
Access and General Info:
- First Year Published: 2011
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
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Downloads Are Not Available:
The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.
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Wiki
Source: Wikipedia
Wikipedia Results
Search Results from Wikipedia
Ion beam lithography
Ion-beam lithography is the practice of scanning a focused beam of ions in a patterned fashion across a surface in order to create very small structures
Next-generation lithography
such as X-ray lithography, electron beam lithography, focused ion beam lithography, and nanoimprint lithography. The term may also be used to describe techniques
Patterned media
investigated for creating prototypes was ion beam proximity lithography. This uses stencil masks to produce patterns an ion-sensitive material (resist), which
Electron-beam lithography
Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes
MEMS
writing field in ion-beam lithography is quite small, large area patterns must be created by stitching together the small fields. Ion track technology
Focused ion beam
not be confused with using a beam of focused ions for direct write lithography (such as in proton beam writing). These are generally quite different
Maskless lithography
Currently, the main forms of maskless lithography are electron beam and optical. In addition, focused ion beam (FIB) systems have established an important
Stencil lithography
interference lithography (LIL), electron beam lithography, and focused ion beam lithography. Several process are available using stencil lithography: material
Rare-earth element
computers." RE magnets are also used in Magnetic resonance imaging and Ion beam lithography. Luminescence applications take advantage of the unpaired 4f electrons
Photolithography
electron beam lithography, X-ray lithography, extreme ultraviolet lithography and ion projection lithography. Extreme ultraviolet lithography has entered