Explore: Ion Beam Lithography

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Source: The Open Library

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1Stereolithography and other RP&M technologies

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“Stereolithography and other RP&M technologies” Metadata:

  • Title: ➤  Stereolithography and other RP&M technologies
  • Author:
  • Language: English
  • Number of Pages: Median: 392
  • Publisher: ➤  ASME Press - Society of Manufacturing Engineers in cooperation with the Rapid Prototyping Association of SME
  • Publish Date:
  • Publish Location: New York - Dearborn, Mich

“Stereolithography and other RP&M technologies” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1996
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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2Methods and Materials in Microelectronic Technology

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“Methods and Materials in Microelectronic Technology” Metadata:

  • Title: ➤  Methods and Materials in Microelectronic Technology
  • Author:
  • Language: English
  • Number of Pages: Median: 376
  • Publisher: ➤  Springer - Springer London, Limited
  • Publish Date:

“Methods and Materials in Microelectronic Technology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1984
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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3Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)

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“Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)” Metadata:

  • Title: ➤  Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)
  • Author:
  • Language: English
  • Number of Pages: Median: 307
  • Publisher: ➤  Society of Photo Optical - The Society
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering)” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1988
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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4Electron-Beam, X-Ray, and Ion-Beam Technology

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“Electron-Beam, X-Ray, and Ion-Beam Technology” Metadata:

  • Title: ➤  Electron-Beam, X-Ray, and Ion-Beam Technology
  • Author:
  • Language: English
  • Number of Pages: Median: 344
  • Publisher: ➤  SPIE--the International Society for Optical Engineering - SPIE-International Society for Optical Engine
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-Beam, X-Ray, and Ion-Beam Technology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1990
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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5Ion tracks and microtechnology

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Book's cover

“Ion tracks and microtechnology” Metadata:

  • Title: Ion tracks and microtechnology
  • Author:
  • Language: English
  • Number of Pages: Median: 272
  • Publisher: ➤  Springer Vieweg. in Springer Fachmedien Wiesbaden GmbH - Vieweg
  • Publish Date:
  • Publish Location: Braunschweig

“Ion tracks and microtechnology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1990
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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6Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV

Book's cover

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV
  • Language: English
  • Number of Pages: Median: 219
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1985
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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7Dry processing for submicrometer lithography

Book's cover

“Dry processing for submicrometer lithography” Metadata:

  • Title: ➤  Dry processing for submicrometer lithography
  • Language: English
  • Number of Pages: Median: 307
  • Publisher: The Society
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Dry processing for submicrometer lithography” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1990
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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8Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II

Book's cover

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II
  • Language: English
  • Number of Pages: Median: 488
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1992
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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9Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV

Book's cover

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV
  • Language: English
  • Number of Pages: Median: 420
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash

“Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1994
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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10Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III

Book's cover

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III
  • Language: English
  • Number of Pages: Median: 136
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1984
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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11Electron-beam, X-ray, and ion-beam technology

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“Electron-beam, X-ray, and ion-beam technology” Metadata:

  • Title: ➤  Electron-beam, X-ray, and ion-beam technology
  • Author:
  • Language: English
  • Number of Pages: Median: 388
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, and ion-beam technology” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1989
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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12Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V

Book's cover

“Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V” Metadata:

  • Title: ➤  Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V
  • Language: English
  • Number of Pages: Median: 272
  • Publisher: ➤  SPIE--the International Society for Optical Engineering
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1986
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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13Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V

Book's cover

“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V” Metadata:

  • Title: ➤  Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V
  • Language: English
  • Number of Pages: Median: 450
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1995
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

Online Access

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14Job Pierson family papers

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“Job Pierson family papers” Metadata:

  • Title: Job Pierson family papers
  • Author:
  • Language: English
  • Number of Pages: Median: 242
  • Publisher: SPIE
  • Publish Date:
  • Publish Location: Bellingham, Wash., USA

“Job Pierson family papers” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1983
  • Is Full Text Available: Yes
  • Is The Book Public: No
  • Access Status: Borrowable

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15Rapid Prototyping & Manufacturing

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“Rapid Prototyping & Manufacturing” Metadata:

  • Title: ➤  Rapid Prototyping & Manufacturing
  • Author:
  • Language: English
  • Number of Pages: Median: 434
  • Publisher: ➤  Society of Manufacturing Engineers in cooperation with the Computer and Automated Systems Association of SME - Mcgraw-Hill (Tx)
  • Publish Date:
  • Publish Location: Dearborn, MI

“Rapid Prototyping & Manufacturing” Subjects and Themes:

Edition Identifiers:

Access and General Info:

  • First Year Published: 1992
  • Is Full Text Available: No
  • Is The Book Public: No
  • Access Status: No_ebook

Online Access

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    16The physics of submicron lithography

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    “The physics of submicron lithography” Metadata:

    • Title: ➤  The physics of submicron lithography
    • Author:
    • Language: English
    • Number of Pages: Median: 493
    • Publisher: Plenum Press
    • Publish Date:
    • Publish Location: New York

    “The physics of submicron lithography” Subjects and Themes:

    Edition Identifiers:

    Access and General Info:

    • First Year Published: 1992
    • Is Full Text Available: Yes
    • Is The Book Public: No
    • Access Status: Printdisabled

    Online Access

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      17Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii

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      “Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii” Metadata:

      • Title: ➤  Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii
      • Author:
      • Language: rus
      • Number of Pages: Median: 125
      • Publisher: "Radio i svi͡a︡zʹ"
      • Publish Date:
      • Publish Location: Moskva

      “Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii” Subjects and Themes:

      Edition Identifiers:

      Access and General Info:

      • First Year Published: 1985
      • Is Full Text Available: No
      • Is The Book Public: No
      • Access Status: No_ebook

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      18Methods and materials in microelectronic technology

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      Book's cover

      “Methods and materials in microelectronic technology” Metadata:

      • Title: ➤  Methods and materials in microelectronic technology
      • Author: ➤  
      • Language: English
      • Number of Pages: Median: 367
      • Publisher: Plenum Press
      • Publish Date:
      • Publish Location: New York

      “Methods and materials in microelectronic technology” Subjects and Themes:

      Edition Identifiers:

      Access and General Info:

      • First Year Published: 1984
      • Is Full Text Available: No
      • Is The Book Public: No
      • Access Status: No_ebook

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      19Patterning of material layers in submicron region

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      Book's cover

      “Patterning of material layers in submicron region” Metadata:

      • Title: ➤  Patterning of material layers in submicron region
      • Author:
      • Language: English
      • Number of Pages: Median: 183
      • Publisher: J. Wiley
      • Publish Date:
      • Publish Location: New York

      “Patterning of material layers in submicron region” Subjects and Themes:

      Edition Identifiers:

      Access and General Info:

      • First Year Published: 1993
      • Is Full Text Available: Yes
      • Is The Book Public: No
      • Access Status: Printdisabled

      Online Access

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      The book is not public therefore the download links will not allow the download of the entire book, however, borrowing the book online is available.

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        20A fast ion beam pattern generator

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        “A fast ion beam pattern generator” Metadata:

        • Title: ➤  A fast ion beam pattern generator
        • Author:
        • Language: English
        • Number of Pages: Median: 176
        • Publisher: Sine nomine
        • Publish Date:
        • Publish Location: Netherlands

        “A fast ion beam pattern generator” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 1988
        • Is Full Text Available: No
        • Is The Book Public: No
        • Access Status: No_ebook

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        21Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing

        Book's cover

        “Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing” Metadata:

        • Title: ➤  Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing
        • Language: English
        • Number of Pages: Median: 340
        • Publisher: SPIE
        • Publish Date:
        • Publish Location: Bellingham, Wash

        “Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 1991
        • Is Full Text Available: No
        • Is The Book Public: No
        • Access Status: No_ebook

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        22Dian zi shu bao guang wei na jia gong ji shu

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        “Dian zi shu bao guang wei na jia gong ji shu” Metadata:

        • Title: ➤  Dian zi shu bao guang wei na jia gong ji shu
        • Author:
        • Language: chi
        • Number of Pages: Median: 310
        • Publisher: ➤  Beijing gong ye da xue chu ban she
        • Publish Date:
        • Publish Location: Beijing

        “Dian zi shu bao guang wei na jia gong ji shu” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 2004
        • Is Full Text Available: No
        • Is The Book Public: No
        • Access Status: No_ebook

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        23Ju jiao li zi shu wei na jia gong ji shu

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        “Ju jiao li zi shu wei na jia gong ji shu” Metadata:

        • Title: ➤  Ju jiao li zi shu wei na jia gong ji shu
        • Author:
        • Language: chi
        • Number of Pages: Median: 344
        • Publisher: ➤  Beijing gong ye da xue chu ban she
        • Publish Date:
        • Publish Location: Beijing

        “Ju jiao li zi shu wei na jia gong ji shu” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 2006
        • Is Full Text Available: No
        • Is The Book Public: No
        • Access Status: No_ebook

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        24Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V

        “Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V” Metadata:

        • Title: ➤  Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V
        • Language: English
        • Number of Pages: Median: 272
        • Publisher: ➤  SPIE--the International Society for Optical Engineering
        • Publish Date:
        • Publish Location: Bellinham, Wash., USA

        “Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 1986
        • Is Full Text Available: No
        • Is The Book Public: No
        • Access Status: No_ebook

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        25Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III

        Book's cover

        “Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Metadata:

        • Title: ➤  Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III
        • Language: English
        • Number of Pages: Median: 470
        • Publisher: The Society
        • Publish Date:
        • Publish Location: Bellingham, Wash

        “Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 1993
        • Is Full Text Available: No
        • Is The Book Public: No
        • Access Status: No_ebook

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        26EUV, X-ray, and neutron optics and sources

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        Book's cover

        “EUV, X-ray, and neutron optics and sources” Metadata:

        • Title: ➤  EUV, X-ray, and neutron optics and sources
        • Authors:
        • Language: English
        • Number of Pages: Median: 394
        • Publisher: SPIE
        • Publish Date:
        • Publish Location: Bellingham, Wash., USA

        “EUV, X-ray, and neutron optics and sources” Subjects and Themes:

        Edition Identifiers:

        Access and General Info:

        • First Year Published: 1999
        • Is Full Text Available: Yes
        • Is The Book Public: No
        • Access Status: Printdisabled

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          27Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York

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          “Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York” Metadata:

          • Title: ➤  Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York
          • Author: ➤  
          • Language: English
          • Number of Pages: Median: 463
          • Publisher: ➤  Published for the American Vacuum Society by the American Institute of Physics
          • Publish Date:
          • Publish Location: New York

          “Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1985
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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          28Dian zi shu sao miao pu guang ji shu

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          “Dian zi shu sao miao pu guang ji shu” Metadata:

          • Title: ➤  Dian zi shu sao miao pu guang ji shu
          • Author:
          • Language: chi
          • Number of Pages: Median: 425
          • Publisher: ➤  Xin hua shu dian Beijing fa xing suo fa xing - Yu hang chu ban she
          • Publish Date:
          • Publish Location: [Peking]

          “Dian zi shu sao miao pu guang ji shu” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1985
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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          29Electron-beam, x-ray, and ion-beam lithographies VI

          Book's cover

          “Electron-beam, x-ray, and ion-beam lithographies VI” Metadata:

          • Title: ➤  Electron-beam, x-ray, and ion-beam lithographies VI
          • Language: English
          • Number of Pages: Median: 265
          • Publisher: The Society
          • Publish Date:
          • Publish Location: Bellingham, Wash., USA

          “Electron-beam, x-ray, and ion-beam lithographies VI” Subjects and Themes:

          Edition Identifiers:

          Access and General Info:

          • First Year Published: 1987
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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          30Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI

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          “Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI” Metadata:

          • Title: ➤  Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI
          • Language: English
          • Number of Pages: Median: 412
          • Publisher: SPIE
          • Publish Date:
          • Publish Location: Bellingham, Wash

          “Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI” Subjects and Themes:

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          Access and General Info:

          • First Year Published: 1996
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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          31Stereolithography

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          “Stereolithography” Metadata:

          • Title: Stereolithography
          • Author:
          • Language: English
          • Number of Pages: Median: 352
          • Publisher: ➤  Springer - Springer Science+Business Media, LLC
          • Publish Date:
          • Publish Location: Boston, MA

          “Stereolithography” Subjects and Themes:

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          Access and General Info:

          • First Year Published: 2011
          • Is Full Text Available: No
          • Is The Book Public: No
          • Access Status: No_ebook

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