Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI - Info and Reading Options
11-13 March 1996, Santa Clara, California
"Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI" was published by SPIE in 1996 - Bellingham, Wash, it has 412 pages and the language of the book is English.
“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI” Metadata:
- Title: ➤ Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI
- Language: English
- Number of Pages: 412
- Publisher: SPIE
- Publish Date: 1996
- Publish Location: Bellingham, Wash
“Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI” Subjects and Themes:
- Subjects: ➤ Electron beam Lithography - Congresses - Integrated circuits - Ion beam lithography - X-ray lithography - Masks - Extreme ultraviolet lithography - Masks (electronics) - Lithography, electron beam
Edition Specifications:
- Pagination: vii, 412 p. :
Edition Identifiers:
- The Open Library ID: OL820467M - OL18283158W
- Online Computer Library Center (OCLC) ID: 35192949
- Library of Congress Control Number (LCCN): 95072312
- ISBN-10: 0819420999
- All ISBNs: 0819420999
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