Photomask technology 2006 - Info and Reading Options
19-22 September, 2006, Monterey, California, USA
By Symposium on Photomask Technology (26th 2006 Monterey, Calif.), Patrick M. Martin and Robert J. Naber
"Photomask technology 2006" was published by SPIE in 2005 - Bellingham, Wash and the language of the book is English.
“Photomask technology 2006” Metadata:
- Title: Photomask technology 2006
- Authors: ➤ Symposium on Photomask Technology (26th 2006 Monterey, Calif.)Patrick M. MartinRobert J. Naber
- Language: English
- Publisher: SPIE
- Publish Date: 2005
- Publish Location: Bellingham, Wash
“Photomask technology 2006” Subjects and Themes:
- Subjects: Congresses - Integrated circuits - Masks - Microlithography - Applied optics
Edition Specifications:
- Pagination: 2 v. (various pagings) :
Edition Identifiers:
- The Open Library ID: OL17180031M - OL12075462W
- Library of Congress Control Number (LCCN): 2007271488
- ISBN-13: 9780819464446
- ISBN-10: 0819464449
- All ISBNs: 0819464449 - 9780819464446
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