Annual Symposium on Photomask Technology and Management - Info and Reading Options
Proceedings
By Symposium on Photomask Technology and Management (15th 1995 Santa Clara, Calif.)
"Annual Symposium on Photomask Technology and Management" was published by SPIE in 1996 - Bellingham, WA, the book is classified in Integrated circuits genre, it has 636 pages and the language of the book is English.
“Annual Symposium on Photomask Technology and Management” Metadata:
- Title: ➤ Annual Symposium on Photomask Technology and Management
- Author: ➤ Symposium on Photomask Technology and Management (15th 1995 Santa Clara, Calif.)
- Language: English
- Number of Pages: 636
- Is Family Friendly: Yes - No Mature Content
- Publisher: SPIE
- Publish Date: 1996
- Publish Location: Bellingham, WA
- Genres: Integrated circuits
“Annual Symposium on Photomask Technology and Management” Subjects and Themes:
- Subjects: Congresses - Photoresists - Integrated circuits - Masks - Microlithography
Edition Specifications:
- Pagination: ix, 636 p. :
Edition Identifiers:
- Google Books ID: nSlTAAAAMAAJ
- The Open Library ID: OL819149M - OL2996849W
- Online Computer Library Center (OCLC) ID: 34020090
- Library of Congress Control Number (LCCN): 95069776
- ISBN-10: 0819419850
- All ISBNs: 0819419850
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