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Source: The Open Library
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1Gate stack and silicide issues in silicon processing
By Symposium on Gate Stack and Silicide Issues in Silicon Processing (2000 San Francisco, CA)
“Gate stack and silicide issues in silicon processing” Metadata:
- Title: ➤ Gate stack and silicide issues in silicon processing
- Author: ➤ Symposium on Gate Stack and Silicide Issues in Silicon Processing (2000 San Francisco, CA)
- Language: English
- Number of Pages: Median: 236
- Publisher: Materials Research Society
- Publish Date: 2000 - 2001
- Publish Location: Warrendale, Pa
“Gate stack and silicide issues in silicon processing” Subjects and Themes:
- Subjects: ➤ Congresses - Electric leakage - Gate array circuits - Integrated circuits, Ultra large scale integration - Materials - Silicides - Ultra large scale integration Integrated circuits - Silicon - Integrated circuits - Ultra large scale integration
Edition Identifiers:
- The Open Library ID: OL12091964M - OL22418253M
- Online Computer Library Center (OCLC) ID: 45708210
- Library of Congress Control Number (LCCN): 2001018059
- All ISBNs: 1558995196 - 9781558995192
Access and General Info:
- First Year Published: 2000
- Is Full Text Available: No
- Is The Book Public: No
- Access Status: No_ebook
Online Access
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