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Source: The Open Library
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1Pulsed and pulsed bias sputtering
By Edward V. Barnat and Toh-Ming Lu
“Pulsed and pulsed bias sputtering” Metadata:
- Title: ➤ Pulsed and pulsed bias sputtering
- Authors: Edward V. BarnatToh-Ming Lu
- Language: English
- Number of Pages: Median: 165
- Publisher: ➤ Springer - Springer London, Limited - Kluwer Academic
- Publish Date: 2003 - 2011 - 2013 - 2014
- Publish Location: Boston
“Pulsed and pulsed bias sputtering” Subjects and Themes:
- Subjects: ➤ Cathode sputtering (Plating process) - Thin films - Semi-conductors & super-conductors - Physics - Electronics - Semiconductors - Science - Technology & Industrial Arts - Science/Mathematics - Engineering - General - Material Science - Science : Physics - Technology / Engineering / General - Technology / Optics - Technology : Material Science - General - Cathode sputtering (Plating pr
Edition Identifiers:
- The Open Library ID: OL9332149M - OL19290304M - OL34523161M - OL37186337M - OL30619005M
- Library of Congress Control Number (LCCN): 2003054987
- All ISBNs: ➤ 1461504112 - 9781402075438 - 9781461504115 - 9781461350637 - 140207543X - 9781461504122 - 1461504120 - 1461350638
First Setence:
"This monograph is a guide for those interested in improving sputter-based thin film technology through the use of a pulse-based technology."
Access and General Info:
- First Year Published: 2003
- Is Full Text Available: Yes
- Is The Book Public: No
- Access Status: Printdisabled
Online Access
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