Handbook of plasma processing technology - Info and Reading Options
fundamentals, etching, deposition, and surface interactions
By Stephen M. Rossnagel and William D. Westwood
"Handbook of plasma processing technology" was published by Noyes Publications in 1990 - Park Ridge, N.J., U.S.A, it has 523 pages and the language of the book is English.
“Handbook of plasma processing technology” Metadata:
- Title: ➤ Handbook of plasma processing technology
- Authors: Stephen M. RossnagelWilliam D. Westwood
- Language: English
- Number of Pages: 523
- Publisher: Noyes Publications
- Publish Date: 1990
- Publish Location: Park Ridge, N.J., U.S.A
“Handbook of plasma processing technology” Subjects and Themes:
- Subjects: ➤ Plasma engineering - Semiconductors - Etching - Plasma etching - Plasma dynamics - Plasma (ionized gases) - Technique des plasmas - Semi-conducteurs - Attaque chimique - Gravure par plasma - Mechanical - Materials science - Microelectronics - Metallurgy - Trades & technology -> industrial technology -> materials science - Professional, career & trade -> electronics -> general - Trades & technology -> industrial technology -> metallurgy - Trades & technology -> industrial technology -> mechanical
Edition Specifications:
- Pagination: xxiii, 523 p. :
Edition Identifiers:
- The Open Library ID: OL2201184M - OL19195687W
- Online Computer Library Center (OCLC) ID: 49708585 - 20265048
- Library of Congress Control Number (LCCN): 89022834
- ISBN-10: 0815512201
- All ISBNs: 0815512201
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