Handbook of Advanced Plasma Processing Techniques
By Randy J. Shul
"Handbook of Advanced Plasma Processing Techniques" was published by Springer Berlin Heidelberg in 2000 - Berlin, Heidelberg, it has 653 pages and the language of the book is English.
“Handbook of Advanced Plasma Processing Techniques” Metadata:
- Title: ➤ Handbook of Advanced Plasma Processing Techniques
- Author: Randy J. Shul
- Language: English
- Number of Pages: 653
- Publisher: Springer Berlin Heidelberg
- Publish Date: 2000
- Publish Location: Berlin, Heidelberg
“Handbook of Advanced Plasma Processing Techniques” Subjects and Themes:
- Subjects: ➤ Atomic & molecular - Manufacturing - General - Materials science - Physical & earth sciences -> physics -> nuclear & subatomic physics - Trades & technology -> industrial technology -> manufacturing - Trades & technology -> technology & engineering -> general - Trades & technology -> industrial technology -> materials science - Scz19000 - Scp24009 - Scz12000 - Sct22050 - Sct00004 - Scz17000 - 4227 - 2928 - 3148 - 3643 - 2887 - 4741 - Suco11644 - 3714
Edition Specifications:
- Format: [electronic resource] /
- Pagination: ➤ 1 online resource (XVI, 653 pages 413 illustrations, 10 illustrations in color.)
Edition Identifiers:
- The Open Library ID: OL27042559M - OL19854256W
- Online Computer Library Center (OCLC) ID: 840292330
- ISBN-13: 9783642569890
- ISBN-10: 3642569897
- All ISBNs: 3642569897 - 9783642569890
AI-generated Review of “Handbook of Advanced Plasma Processing Techniques”:
"Handbook of Advanced Plasma Processing Techniques" Description:
The Open Library:
This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics. The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age. This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling. It provides the reader with a broad array of topics, authored by the leading experts in the field.
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