The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996 - Info and Reading Options
proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface
By International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (3rd 1996 Los Angeles, Calif.)
"The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996" was published by Electrochemical Society in 1996 - Pennington, NJ, it has 780 pages and the language of the book is English.
“The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996” Metadata:
- Title: ➤ The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996
- Author: ➤ International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (3rd 1996 Los Angeles, Calif.)
- Language: English
- Number of Pages: 780
- Publisher: Electrochemical Society
- Publish Date: 1996
- Publish Location: Pennington, NJ
“The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996” Subjects and Themes:
- Subjects: ➤ Congresses - Surfaces - Dielectrics - Silicon dioxide films - Surface chemistry - Silica - Surfaces (Technology)
Edition Specifications:
- Pagination: xv, 780 p. :
Edition Identifiers:
- The Open Library ID: OL825850M - OL3010427W
- Online Computer Library Center (OCLC) ID: 503086509
- Library of Congress Control Number (LCCN): 95083756
- ISBN-10: 156677151X
- All ISBNs: 156677151X
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