MOS Interface Physics Process and Characterization - Info and Reading Options
By Shengkai Wang and Xiaolei Wang
"MOS Interface Physics Process and Characterization" was published by Taylor & Francis Group in 2021, it has 162 pages and the language of the book is English.
“MOS Interface Physics Process and Characterization” Metadata:
- Title: ➤ MOS Interface Physics Process and Characterization
- Authors: Shengkai WangXiaolei Wang
- Language: English
- Number of Pages: 162
- Publisher: Taylor & Francis Group
- Publish Date: 2021
“MOS Interface Physics Process and Characterization” Subjects and Themes:
- Subjects: ➤ Engineering - Metal oxide semiconductors - Design and construction - Mathematics - Semiconductors - Junctions - Integrated circuits - Research - Solid state physics - Experiments - Semi-conducteurs - Jonctions - Circuits intégrés - Recherche - Physique de l'état solide - Expériences - TECHNOLOGY / General - TECHNOLOGY / Electronics / General - TECHNOLOGY / Electronics / Microelectronics
Edition Identifiers:
- The Open Library ID: OL33920275M - OL25324929W
- Online Computer Library Center (OCLC) ID: 1246675734
- Library of Congress Control Number (LCCN): 2021017024
- ISBN-13: 9781032106274
- All ISBNs: 9781032106274
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