Materials, technology, and reliability for advanced interconnects and low-k dielectrics--2004 - Info and Reading Options
symposium held April 13-15, 2004, San Francisco, California, U.S.A
By R. J. Carter
"Materials, technology, and reliability for advanced interconnects and low-k dielectrics--2004" was published by Materials Research Society in 2004 - Warrendale, Pa, it has 402 pages and the language of the book is English.
“Materials, technology, and reliability for advanced interconnects and low-k dielectrics--2004” Metadata:
- Title: ➤ Materials, technology, and reliability for advanced interconnects and low-k dielectrics--2004
- Author: R. J. Carter
- Language: English
- Number of Pages: 402
- Publisher: Materials Research Society
- Publish Date: 2004
- Publish Location: Warrendale, Pa
“Materials, technology, and reliability for advanced interconnects and low-k dielectrics--2004” Subjects and Themes:
- Subjects: ➤ Dielectrics - Materials - Electric circuits - Semiconductors - Congresses - Junctions - Dielectric films - Integrated circuits - Reliability - Thin films
Edition Specifications:
- Pagination: xiii, 402 p. :
Edition Identifiers:
- The Open Library ID: OL3329198M - OL8857075W
- Online Computer Library Center (OCLC) ID: 56554790 - 506484438
- Library of Congress Control Number (LCCN): 2004304216
- ISBN-10: 1558997628
- All ISBNs: 1558997628
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