Lecture Notes on Principles of Plasma Processing - Info and Reading Options
By Francis F. Chen and Jane P. Chang
"Lecture Notes on Principles of Plasma Processing" is published by Springer in January 31, 2003, it has 208 pages and the language of the book is English.
“Lecture Notes on Principles of Plasma Processing” Metadata:
- Title: ➤ Lecture Notes on Principles of Plasma Processing
- Authors: Francis F. ChenJane P. Chang
- Language: English
- Number of Pages: 208
- Publisher: Springer
- Publish Date: January 31, 2003
“Lecture Notes on Principles of Plasma Processing” Subjects and Themes:
- Subjects: ➤ Plasma chemistry - Plasma engineering - Plasma dynamics - Physics - Chemical engineering - Nuclear physics - Optical materials - Nuclear Physics, Heavy Ions, Hadrons - Optical and Electronic Materials - Industrial Chemistry/Chemical Engineering
Edition Specifications:
- Format: Paperback
- Weight: 1.2 pounds
- Dimensions: 10.8 x 8.3 x 0.5 inches
Edition Identifiers:
- The Open Library ID: OL9379610M - OL18766453W
- Library of Congress Control Number (LCCN): 2002040665
- ISBN-13: 9780306474972
- ISBN-10: 0306474972
- All ISBNs: 0306474972 - 9780306474972
AI-generated Review of “Lecture Notes on Principles of Plasma Processing”:
Snippets and Summary:
Plasma is matter heated beyond its gaseous state, heated to a temperature so high that atoms are stripped of at least one electron in their outer shells, so that what remains are positive ions in a sea of free electrons.
"Lecture Notes on Principles of Plasma Processing" Description:
The Open Library:
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
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