DTIC ADA208894: Ultrathin Poly(Methyl Methacrylate) Resist Films For Microlithography - Info and Reading Options
By Defense Technical Information Center
"DTIC ADA208894: Ultrathin Poly(Methyl Methacrylate) Resist Films For Microlithography" and the language of the book is English.
“DTIC ADA208894: Ultrathin Poly(Methyl Methacrylate) Resist Films For Microlithography” Metadata:
- Title: ➤ DTIC ADA208894: Ultrathin Poly(Methyl Methacrylate) Resist Films For Microlithography
- Author: ➤ Defense Technical Information Center
- Language: English
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- Internet Archive ID: DTIC_ADA208894
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"DTIC ADA208894: Ultrathin Poly(Methyl Methacrylate) Resist Films For Microlithography" Description:
The Internet Archive:
To improve pattern fidelity of electron beam lithography in the nanometer regime a new class of ultrathin resist (less than 20 nm) has been investigated. Such films can be exposed with very low energy (less than 1 keV) electrons to virtually eliminate proximity effects or, at conventional energies, to allow easier proximity effect correction. In this paper we have investigated the lithographic performance of LB PMMA films with thicknesses ranging from 0.85 nm (one monolayer) to 7.7 nm (nine monolayer) exposed with different electron beam energies. Two types of defects, with sizes less than 20 nm, have be observed in the films after exposure and pattern transfer into chromium. The first type, observed only in films less than seven layers thick, was uniformly distributed over the sample; the second type was only observed around the exposed regions for films thicker than nine layers. Comparisons are made with Monte Carlo simulation.
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