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Partial Contents: The reaction of Si(100) 2 x 1 with NO and NH3: The role of surface dangling bonds; Molecular dynamics simulation of low-energy beam deposition of silicon; Visible laser etching of refractory metals by surface modification; Modulated molecular beam studies of the surface chemistry of silicon reaction with reactive gases; Effects of Ar(+) angle of incidence on the etching of Si with Cl2 and low energy Ar(+) ions; Multiphoton induced desorption of positive ions from barium fluoride; Excited atom production by electron and ion bombardment of alkali halides; Selective area deposition of metals using low energy electron beams; Synchrotron radiation-excited chemical-vapor deposition and etching; Chemiluminescence from F and XeF2 etching reaction with silicon; An in situ infrared study on the interaction of oxygen plasmas with Si and fluorine plasmas with SiO2 surfaces; Ultraviolet-assisted growth of GaAs; Atomic layer growth of GaAs by modulated-continuous-wave laser metal-organic vapor phase epitaxy; Sum-frequency generation on dye-coated surfaces using collinear and noncollinear excitation geometries; Surface diffusion measured by laser-induced desorption: Monte Carlo simulation of effects of surface defects on diffusion; Ion and neutral atomic and cluster sputtering yields of molybdenum; Molecular beam epitaxy growth mechanisms on GaAs (100) surfaces; A study of the mechanism of metal deposition by the laser induced forward transfer process.

The Topical Meeting on Microphysics of Surfaces, Beams, and Adsorbates was organized within the interdisciplinary area of molecule/surface interactions induced, or studied, by laser and ion beam techniques. Especially emphasized was the molecular physics and electro magnetism of beam activated chemical reactions for applications in fabrication of semiconductor devices, in photocatalysis, and in optical recording. Emphasis was on the laser spectroscopy of molecular collision and reaction processes on surfaces, new sensitive or high resolution spectroscopies for studies of adsorbates, and optical methods applied to surface characterization.

The Topical Meeting on Microphysics of Surfaces, Beams, and Adsorbates was organized within the interdisciplinary area of molecule/surface interactions induced, or studied, by laser and ion beam techniques. Especially emphasized was the molecular physics and electro magnetism of beam activated chemical reactions for applications in fabrication of semiconductor devices, in photocatalysis, and in optical recording. Emphasis was on the laser spectroscopy of molecular collision and reaction processes on surfaces, new sensitive or high resolution spectroscopies for studies of adsorbates, and optical methods applied to surface characterization.