Defects and diffusion in silicon processing - Info and Reading Options
symposium held April 1-4, 1997, San Francisco, California, U.S.A.
By S. Coffa
"Defects and diffusion in silicon processing" was published by Materials Research Society in 1997 - Pittsburgh, Pa, it has 541 pages and the language of the book is English.
“Defects and diffusion in silicon processing” Metadata:
- Title: ➤ Defects and diffusion in silicon processing
- Author: S. Coffa
- Language: English
- Number of Pages: 541
- Publisher: Materials Research Society
- Publish Date: 1997
- Publish Location: Pittsburgh, Pa
“Defects and diffusion in silicon processing” Subjects and Themes:
- Subjects: ➤ Semiconductor doping - Silicon crystals - Semiconductors - Congresses - Defects - Materials, research - Silicon
Edition Specifications:
- Pagination: xv, 541 p. :
Edition Identifiers:
- The Open Library ID: OL689118M - OL19464579W
- Online Computer Library Center (OCLC) ID: 37457922
- Library of Congress Control Number (LCCN): 97036151
- ISBN-10: 1558993738
- All ISBNs: 1558993738
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